0 оценок0% нашли этот документ полезным (0 голосов)
655 просмотров10 страниц
U.S. patent 6838651: High sensitivity snap shot CMOS image sensor. Granted to Mann on 2005-01-04 (filed 2002-03-28) and assigned to ESS Technology, Inc.. Currently involved in at least 1 patent litigation: Imperium (IP) Holdings, Inc. v. Apple Inc. et. al. (Texas). See http://news.priorsmart.com for more info.
Оригинальное название
High sensitivity snap shot CMOS image sensor (US patent 6838651)
U.S. patent 6838651: High sensitivity snap shot CMOS image sensor. Granted to Mann on 2005-01-04 (filed 2002-03-28) and assigned to ESS Technology, Inc.. Currently involved in at least 1 patent litigation: Imperium (IP) Holdings, Inc. v. Apple Inc. et. al. (Texas). See http://news.priorsmart.com for more info.
Авторское право:
Public Domain
Доступные форматы
Скачайте в формате PDF или читайте онлайн в Scribd
U.S. patent 6838651: High sensitivity snap shot CMOS image sensor. Granted to Mann on 2005-01-04 (filed 2002-03-28) and assigned to ESS Technology, Inc.. Currently involved in at least 1 patent litigation: Imperium (IP) Holdings, Inc. v. Apple Inc. et. al. (Texas). See http://news.priorsmart.com for more info.
Авторское право:
Public Domain
Доступные форматы
Скачайте в формате PDF или читайте онлайн в Scribd
(2 United States Patent
Mann
'S006838651B1
(10) Patent No
45) Date of Patent:
US 6,838,651 BL
Jan, 4, 2005,
os
HIGH SENSITIVITY SNAP SHOT CMOS
IMAGE SENSOR,
(15) taveotor: Richard A. Mann, Torance, CA (US)
(73) Assignee: ESS Technology, Ine, Fremont, CA
Ws)
(*) Notie: Subject to ay dislaimes the term ofthis
patent is extended o adjusted under 35
USC. 154) by O days,
(21) Appl. No. 10/113,545
(22) Filed: Mar. 28, 2002,
G1) mc HOIL 27/00,
(2) US.CL 2807208.1; 250214 DC;
250226
(58) Fle of Search 2507208.1, 14 DC,
2501226, 214 R; 356/416, 419; 341/155;
348.272, 294, 273, 280, 266; 3581474,
482
60) References Cited
US. PATENT DOCUMENTS
BOTLEGS A+ 71976 Bayer 38276
5461425 A+ 101005 Fowler ea: S204
390880 BL + 42002 Bidermann Sass
(611280 BL ° 82013 Yuet al 318265
* cited by examiner
Primary Examiner—Thah X. Law
‘Assistant Examiner—Seung C. Soba
(14) Anorney, Agent, or Firm —Parjami & Farami LLP
on ABSTRACT.
‘The present invention is directed to a solid state imaging
device comprising « red pixel, a blue pixel, a fist green
pixel, a second green pixel, wo analg-to-digital converters,
fand« color interpolation czeuit. The fist analog-o-digital
‘converter converts the output of the red pixel and output of
the blue pixel iato digital signals, The second analog-o-
ligta converter convers the output ofthe fist green pixel
‘and output ofthe second green pixel into digital signals. The
color interpolation cireut combines the digital signals to
| i |
fauna. g S|
aie z 8 oltja 2 |
5 3|
| soa g .
- 8 £ | ae —
ze? 9 i a 2 H a
giz 2 — t ~202
a o| Wa [° 02
z0z - _ 012
49248009 a/v |
{AB HPRHOD |
ae _—
OzUS 6,838,651 BL
Sheet 3 of 3
-——_—, ¢ Old
[ainowio | 90E
nae|odsaqut x
40109 | e
x
va ozs
ove _7foxes3u99 99019
| 8ZE aiqewwesbo1g
| {XS setiantios ara _ 5
‘JeqJOAUOD OY a
fonuco
Jan. 4, 2005
U.S. Patent
*duioa
JOI3
ze?
yno419, | la
11
4e}9nu0D aryUS 6,838,651 BI
1
HIGH SENSITIVITY SNAP SHOT CMOS
IMAGE SENSOR
‘TECHNICAL FIELD
This invention relates generally 1 solidstate imaging
devices such as Complementary Metal Oxide Semiconduc-
tor (*CMOS") solid-state imagers. More particularly the
invention relates toa solid-state imaging device implement-
‘ng multiple analog-o-digital (“A/D”) converters to obtain
high frame rates.
BACKGROUND OF THE INVENTION
Solid-state image sensors (also known as “image
sensors" “imagers,” or “solid-state imagers") have broad
applications in many areas including commercial consumer,
Industral, medical, defense and scientific fields. Solid-state
jmage sensors convert a received image such as from an
object into a signal indicative of the received image
Examples of solidstate image sensors including charge
coupled devices CCD"), photodiode arrays charge injec
tion devices (*C1D"), ybrid foal plane arrays and comple
‘mentary metal oxide semiconductor (°CMOS") imaging
devices.
Solid-state image sensors are fabricated from semicon-
ductor materials (such as silicon or gallium arsenide) and
include imaging arrays of light detecting (i.e..
photosensitive) elements (alo known as photodetectors)
interconnected 10 generate analog signals repesentative of
an image illuminating the device. These imaging arrays are
typically formed from rows and columns of photodetectors
(Gach a5 photodiodes, photoconductors, photocapactars or
phologates), each off which generate photo-charges. The
photo-charges are the reslt of photons striking the surface
of the semiconductor material of the photodetector, which
‘generate free change carriers (electron-hole pairs) ia an
amount linearly proportional to the incident photon radia-
tion
Each photodetector in the imaging array receives por
tion of the light reflected from the object received atthe
solid-state image sensor. Ech portion is known as a picture
element or “pixel.” Each individual pixel provides an output
signal corresponding 1 the radiation intensity falling upon
its detecting area (also known as the photosensitive or
detector ates) defined by the physical dimensions of the
photodetector, The photo-chrges from each pixel are con-
verted to signal (charge signal) or an electrical potential
ropresentatve of the energy level reflected from a respective
portion of he object. The resulting signal or potential isread
and processed by video processing circuitry o create an
clectrcal representation of the image. This sigatl may be
utilized, for example, to display a corresponding image on a
‘monitor or otherwise used fo provide information sbout the
‘optical image
‘CCDs are commonly uilized as solid-state image sensors.
However, CMOS technology hss made sigificant strides in
competing with CCD technology as the solid-state image
sensor of choice for use in various applications such as
stand-alone digital cameras and digital cameras embedded in
other imaging devices (eg. cellular phones and personal
igital assistants). The principal advantages of CMOS tech-
ology are lower power consumption, higher levels of
system integration that enable the creation of “camera-on-
chip” capabilities, the ability to support very high data. 6s
‘ates andthe ease of manufacturing through the utilization of
standaed CMOS wafer fabrication facilites.
s
2
In video systems, CMOS technology is capable of higher
frame rates than CCD technology a the same or lower levels,
of circuit noise bevause many of the elements ean be
‘esigned to operate in parallel. In CCD circuits «single
amplifier ansorms the received charge to voltage and
‘supports the total data rate of the solc-sate image sensor's,
frame rate. In CCD solid-ate image sensor, the amplifier
toise genorally becomes domisant when 30 frames per
second (FPS) is employed for image sizes over several
Fhundced thousand pixels
CMOS solid-state image sensors, on the other hand,
utlize multiple amplifiers that allow a longer seting time
between applications and higher frame rate while maintain-
ing excellent noise rejection, In addition, CMOS solid-state
image sensors may easly be equipped with a precision
analogsto-tigital (“A/D”) converter onthe solid-state image
sensor chip.
In many imaging applications, itis often desirable to take
soap shot of 2 video image (ie, to obtain a sil image).
‘Unfortunately, because video imayes are not generally ofthe
highest quality, the snap shot ofthe still mage will also not
be of the highest quality. Such snap shots are especially
inferior when compared with typical sil images generated
in accordance with any one of a number of sill image
techniques or standards generally known in the ar.
‘Typically, these higher quality sill images are generated
ullizing specialized image generation software
Generally, conventional CCD solid-state imager sensors
provide snap shot capability through an interline transfer
approach. In tbe interline transfer approach, when a short
exposure is required wo frecze the action, the charge is
transfered from the light collection junction to a junction
shielded from light. The information regarding tbe light
level is then stoed on a sorage node in the dark uatl the
fame can be read. This method typically reduces motion
blur and allows motion to be frozen even wea the time to
read the entre frame is much longer than the integration
time for the exposure.
Conventional CMOS solid-state image sensors have also
attempted to solve this soap shot capability problem by
incorporating a storage node in the cell, However, this,
storage node mus allow the transfer ofthe charge from the
Tight collection nodes othe storage nodes, which requires an
additional tansstor ia the cell Such active pixel sears are
often termed fourstansisior culls to distinguish them from
the thre-iansistor ative pixel sensor in CMOS solid-state
mage sensors. Typically, the transfer of charge from the
light collection node to the storage node introdues addi
tional reset or KTIC noise unless a very specialized field
elect transistor (*FET") design is used, Acklitionally, cross
talk may cause the sorage node to contiaue to respond to
light at 10% to 20% of the response of the lighted node
‘Moreover, the area required to implement the siorage node
also reduces the atea available for light collection
Generally, fr small pitch solid-state image Sensor eels, the
installation of a storage node reduces the available area for
light collection by about 30% to 50%. The combined elects,
cof less light collection area, transfer KT/C noise and crass
talk may cause the four-ransistor cul to have a signal-io-
‘noise performance that is about }s that of a conventional
thee-ransistor cell ofthe same pitch. Therefor, there is 3
‘ced for a high performance solid-state image sensor tht
solves the snap shot eapsbiiy problem.
SUMMARY
Auber of technical advances are achieved in the art by
combining multiple A/D converte in a single CMOS