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..

..


:
D-T

.
W = 60 W
150 /, (S ~ 1 2)
2 /2.

.

.


-

()

ii < L
nLS0
L

=R
nvTi Sm
vTi

R = S0 / Sm = Bm / B0 >>1

:
( 100 )
,

.
D,T .

()

We = 60
, Wn=2
Bm = 15 T
R = 15.
= 300
D T, EINJ = 65 k
2a = 20 cm

Te / EINJ = 10 -2

2XIIB

2XIIB

EINJ /Te

100

100

pi /Bi

120
2.5

a /

ncold /nhot

0.05 - 0.1
0.1 1.0

120 (D)
6.7 (D)

150 (T)
5.4 (T)

0.1
0.6

2XIIB

.
.
, , Te Te ~ 10-2 EINJ

Uoptimal 65 keV

Wn , /2

. .., -
, ,
,
,
,

,
,
< L, ,
R,

(D - D )



. = 60%
, , .

,

, .

( ) .
,

( - ). ,

.

(D-D )

Wn , ..

: D0 - , H -

= 8n(Te+ Ti)/B2

( ,
,
)

Te: D0 - , D -

250

Te,

200
150
100
50
0
0.5
4 4,5 1.5
5

5,5 2.5
6 6,5 3.5
7 7,5 4.5
8 8,5

t,

(
)


:
L=30 , d =70 .
:
B0=2.4 , Bm=5.2
:
, n0 1013 -3,
Te 70 , a =9 .
:

E0=20 , =90,
Pinj 1 ,
inj=4



-
.

AMBIPOLAR PLUGGING OF ION FLUX FROM GDT


DURING NB INJECTION IN COMPACT MIRROR CELL

()

-
.

EXCITATION OF ALFVEN ION CICLOTRON INSTABILITY DURING


ACCUMULATION OF FAST ANISOTROPIC IONS IN COMPACT
MIRROR CELL

nT , 1020m-3keV

UPPER TRACE IS
ENERGY CONTENT
OF FAST IONS.
BELOW
DEMOSTRATION
OF THRESHHOLD
NATURE OF AIC
INSTABILITY

T, s



( !)
..
.
1.
20-65 , 1 1-10 .
2.
Wendelstein 7-X (~1 , 1000, )
3. ,

40-100 2-3.
,
. 1 , 5-10 .

POWERFUL NB SOURCE WITH 1s PULSE LENGTH


,
2IIB ,
,
Wn=2/2.

Wn = 0.5 /2 , .
Wn=2/2
.

Te /EINJ > 10 -2 .