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There is a variety of inductive plasma sources utilized by The l-R plasma source has been described previously.3,4
industry in the last decade. Correspondingly, there are nu- The basic configuration of the recent experimental setup is
merous publications about plasma parameters of the dis- shown in Fig. 1. Both ends of the inductor coil are connected
charges. Mainly, the inductive discharges aimed to produce to the cylindrical grounded copper shield. The reactor dimen-
high-density plasmas at a very low pressure of about sions and positioning of electrostatic probes is indicated. The
1023 – 1024 Torr for etching and deposition microelectronics downstream chamber is made of aluminum. The 0.005–2.25
equipment. Plasma parameters in different plasma sources kW rf power at 26–28 MHz frequency was supplied to the
are essentially determined by the mechanisms of energy resonator by using a 50 V coaxial cable directly from the
deposition. For instance, a conventional source with a cylin- wideband tube amplifier ~IFI-410! with a sign wave signal
drical spiral and helicon sources with nonspiral applicators generator HP-8648A. The rf power absorbed in the resonator
have different configurations of electromagnetic fields1,2 and, was measured with a Bird reflectometer. The plasma source
hence, different distributions of dissipated radio-frequency has energy efficiency up to ;99.9% and operates without
~rf! power. Therefore, it is hardly possible to predict a priori any matching elements. It was directly measured neglecting
all practical features of different plasma sources. heat losses in the coaxial; the resonator itself has a quality
A novel plasma source, a full wave helical resonator or factor Q of 2360. So, high-energy efficiency is typical since
lambda resonator ~l-R!, has been developed and manufac- the plasma is practically the only load absorbing rf power in
tured for damage critical fast plasma processes. The first ap- the resonator. The device responsible for the main losses in
plication is realized as a single 200 mm wafer quasidown- any conventional inductively coupled plasma case is a
stream asher l-Strip 3000. ~l-3000 is a product of MC matching box typically absorbing 20%–60% of the total rf
Electronics Co., Ltd.! However, the explicit plasma physics power.5 A feedback loop control was implemented in order
of the discharge is unknown. to keep the input rf voltage on the plasma source constant to
The discharge has essentially a three-dimensional internal suppress very low-frequency fluctuations of the discharge
inductive/capacitive symmetric/antisymmetric orthogonal parameters brought about by heat-ionization instabilities.
structure. To the best of our knowledge such a structure, A wafer support platen is located at 120-mm-distance be-
having three independent plasma toroids with opposite mag- low the bottom ground end of the coils. Standard discharge
netic momenta connected by capacitive currents,3 had not conditions were: 1.4 Torr O2 pressure; 3 slm gas flow rate;
been reported previously. and 2 kW discharge power at 27 MHz unless otherwise
Here, we present preliminary results on probe diagnostics stated. Argon discharges were examined in several cases as
of the l-R discharge; mainly of its central high plasma den- well.
sity inductive zone. The measurements were carried out un- Several kinds of electrostatic probes, as shown in Fig. 2,
der conditions of relatively high gas pressure and high were used in this study. The cylindrical Langmuir probes
plasma density with very fine probes. The details of the were made of ~1–1.5!-mm-long 20-mm-diam Pt wire. The
probe measuring technique and experimental results are pre- spherical Pt probes are of about 100-mm-diam and have a
sented. short 20-mm-diam leg. The Langmuir probes were inserted
into the discharge tube from the downstream chamber. The
a!
Author to whom all correspondence should be addressed; electronic mail: probes can be moved along the tube radius by way of turning
100510.3707@compuserve.com the probe input shaft having a sealing O ring or using a
1444 J. Vac. Sci. Technol. A 16„3…, May/Jun 1998 0734-2101/98/16„3…/1444/5/$15.00 ©1998 American Vacuum Society 1444
1445 Vinogradov, Menagarishvili, and Yoneyama: Probe diagnostics in a full wave resonator rf discharge 1445
III. RESULTS AND DISCUSSION FIG. 3. Langmuir probe I – Vcharacteristic severely distorted above the
plasma potential and having a ‘‘swan neck’’ shape; the first derivative is
The l-R discharge plasma interacts with the current and also shown.
voltage standing waves distributed along the inductor. Due to
the antiphase voltage half waves, the capacitive current in-
ductor ground at the discharge resonance frequency of 27 plasma toroid of the 2 kW Ar discharge is to be of the order
MHz is canceled in the central plane of the plasma source. of 531012 cm23.
This condition depends on the rf balancing the electrical Since we are using very fine probes typical for the probe
length of the spiral transmission line to the one full wave- diagnostics of 1–5 Torr pressure molecular glow
length. discharges,12 it might not be a problem to use a reference
The remarkable plasma phenomena and the discharge electrode. There is '5000 cm2 area downstream metal
structure including the appearance of ball plasmoids and chamber contacting to a large afterglow plasma. The typical
plasma toroids were described in Refs. 3 and 4 for 10–50- ratio of the chamber area to that of the probe is on the order
Torr-pressure argon discharges. The totally developed l-R of 107 – 108 , which should be quite enough in comparison
argon discharge structure consist of three bright essentially with the recommended ratio for electropositive gas dis-
contracted plasma toroids located at the center and end charges: 103 – 104 , 13 even taking into consideration a large
planes of the inductor and a diffuse capacitive plasma in the difference of the local plasma density in the toroid and
bulk. The capacitive plasma is generated by the currents downstream chamber. The reference electrode for electrone-
flowing between the rf voltage standing-wave maxima. gative gas discharges may be smaller than that for electrop-
There is some interconnection between the inductive and ca- ositive plasmas since it must sink essentially a smaller ion
pacitive currents, which can be even visualized under some current corresponding to the smaller electron saturation cur-
conditions. The central toroid plays a role of a virtual ground rent.
electrode in the discharge. Thus, the l-R discharge plasma However, our chamber could not be used as the reference
represents a large volume rigid three-dimensional structure. electrode in the case of measurements in the central high-
The central plasma toroid absorbs inductive power from a density plasma toroid: the probe I – V characteristics were
half-lambda central part of the coil. The two secondary in- severely distorted, as shown in Fig. 3. The I – V have notice-
ductive toroids can get only half the power in comparison able hysteresis and a local maximum of the probe current
with the central toroid since they are each inductively fed above the plasma potential, which looks like a ‘‘swan neck.’’
from the quarter-wave parts. The 27 MHz, 2 kW-rf-power, The first derivative of the probe current on the probe voltage
1.4 Torr oxygen discharge produces a single inductive is essentially broadened and even looks rather like a second
plasma toroid located at the center of the plasma source. derivative crossing the voltage axis.
Secondary side oxygen plasma toroids can be initiated at an We did not study the detailed mechanism of such strange
essentially higher power of 4–4.5 kW in order to overcome behavior of the I – V characteristic. Certainly, the chamber
very high resistive losses typical for oxygen plasmas. ~reference! sheath itself is not responsible for the ‘‘swan
First probe measurements in the center of a 1 kW 1 Torr neck.’’ If the conductivity of the chamber sheath was too
Ar discharge were carried out using the cylindrical 20 mm Pt low, the probe saturation current would be decreased due to
probe. The electron density at the discharge axis was mea- an additional voltage drop on the reference sheath, but it
sured to be 4.531011 cm23, the electron temperature 1.7 eV, never could be smaller at higher probe potentials than at
and the plasma potential was 11 V. However, it was difficult lower. Another factor affecting the probe I – V is the finite
to measure the electron density in the plasma toroid channel plasma conductance between the probe and the reference.13
because of the probe’s melting. Since the local electron den- This effect, however, cannot create a maximum as well, be-
sity is about directly proportional to the specific discharge cause the plasma impedance between the probe and chamber
power, and the density in the toroid is about four times is constant. Hence, there are some second-order factors in-
higher than on the axis, we assume the electron density in the volved. For example, the shape of the toroidal conductive