EBL writing: 1) 1st select a particle 2) Go to file and click new positionlist.

While selecting there New positionlist a new window will open like this:

3) From Control bar choose Write Field Manager. Automatically there will be a window like this containing different magnification and field size and select one of your desired and to confirm that your chosen write field is selected click the set writefield botton().

4) Once your mask size is selected opening Write field control you will have another window named Scanned Manager. There u shou select 1st Writefield Alignment Procedures and then Manual and selecting * um WF Manual ALWF * um marks u need to drag into the New positionlist.

As a whole you can see up to this. 5) Then scanning the dragged item a window will open to align writefield. Do it for each selected item like say(200X40,200X20,200X5). After dragging one item do writefield alignment then delete it from position list and drag another one if you have Opened window is like this

This ends the basic writefield alignment we do.

Exposure:
Now you need to measure beam current.

1) Click stage Control from control bar 2) Go to its Position and select Faraday Cup on holder there. Then stage will move such a way gun will reach near Faraday cup. 3) Then you should manually place Gun on Faraday cup & zoom so that ur sreen is totally dark (It ensures all electrons are captured by Faraday Cup and hence proper measurement). 4) Next measure current going Exposoure option from control as shown. (It is good practice to save the position before moving stage to faraday cup,so that the position where I did write field alignment is not lost. 5) Now you can set exposure parameters. Like beam current window simultaneously other windows are created like exposure parameter where just clicking the calculator exposure parameter calculation will appear. 6) 7) 8) opens the Exposure Parameter Calculation as said earlier just now. selects which layers in the pattern that is going to be written (exposed). opens a window (called Exposure parameter calculation) with parameters that is sometimes useful to change, e.g. the beam settling time, the FBMS beam width, etc.

9) Entre required Step size & Dose and calculate the dwell time and press ok. Note: 1. Step size - the length the beam is moved between each dwell time, when the beam is still, making the exposure. Usually 5 - 15 nm for W.F. size of 60 - 100 m and 100 - 200 nm for W.F. size of 800 - 1500 m (bonding pads). 2. Dwell time - the time the beam is still at each location. 3. Beam current - the e--current reaching the sample. This should already be correct since the earlier measurement should have put the measured value here. 4. Area dose - the dose required for an area to fully develop that area, i.e. fully remove all resist but not more. Sometimes wrongly referred to as "Sensitivity". It is rather the inverse of sensitivity.

These four parameters are interdependent according to this formula:

Writing:
1) Again open New position list. 2) Open your GDS database from where you can drop the GDS file that you wanna write into the new positionlist. 3) Select properties from Drop down list. Select layers to be written and define boundaries.. You can see these.

If you click edit button as shown here you can find

Then go to property.A new windo will be popped up where you can select the working area and position list.

Learn more to finsh Ref: http://www.nanophys.kth.se/nanophys/facilities/nfl/manual/