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Stress-Optical Coefficients of
157 nm Materials
John H. Burnett
National Institute of Standards and Technology
Gaithersburg, Maryland
q11
q
12
q12
qij =
0
0
q12
q11
q12
q12
0
0
0
0
q12
0
q11
0
0
q44
0
0
q44
0
0
0
0
0
q44
For uniaxial stress in direction n$ = x"1 sin cos + x"2 sin sin + x"3 cos
( K 1 )1
q11 sin 2 cos 2 + q12 (sin 2 sin 2 + cos 2 )
1
2
2
2
2
2
K
(
)
q
q
sin
sin
(sin
cos
cos
)
+
+
2
12
11
1
2
2
( K )3
1
K
q
(
)
sin
cos
sin
4
44
1
( K )5
2
1
q44 sin sin cos
( K )6
[001]
[010]
[100]
But for stress along cube axes and cube diagonals, index uncouples coefficients:
P
q11
100
q12
q44
100
E
k
111
Stress-Induced Birefringence
motor
aperture filter
paralobic
mirror
Rochon
linear
polarizer
aperture
aperture
sample
shutter
chopper
Rochon
linear
polarizer
crossed
polarized
beam
splitter
paralobic
mirror
ground glass
diffuser plate
stress
apparatus
electrodeless
dischage lamp
(Hg and Xe)
detector
aperture
camera
lens
lock-in amplifier
spherical
collection
mirror
(q11
- q12) = (N/P)2/tn
3
q44 = (N/P)2/tn
[111]
[100]
CCD camera
video
to chopper
-5.00E-012
-4.00E-012
BaF 2
-3.00E-012
MFS
-2.00E-012
CaF 2
-1.00E-012
0.00 E+ 000
60 0
5 00
400
300
Wavelength (nm)
200
100
-1
1.60E-012
1.20E-012
B aF2
1.00E-012
CaF2
8.00E-013
6.00E-013
4.00E-013
2.00E-013
0.00E+000
600
500
400
300
Waveleng th (nm)
200
100
sample
compensator
beam splitter
compensator
electrodeless
dischage lamp Rochon
(Hg and Xe) polarizer shutter filter
stress
apparatus
aperture
interferometer
flat mirror
beam
splitter
flat mirror/
reflection
filter
sample
flat mirror
motor
beam splitter
spherical
columnating
mirror
spherical
focusing
mirror
phospher plate
shutter
or ground glass
diffuser
camera
lens
detector
CCD camera
video
-1
2.80E-012
MFS
2.60E-012
2.40E-012
BaF 2
2.20E-012
2.00E-012
1.80E-012
1.60E-012
1.40E-012
CaF 2
1.20E-012
1.00E-012
600
500
40 0
300
200
100
-1
4 .00E-013
MFS
2 .00E-013
0.00E+000
-2 .00E-013
Ca F2
-4 .00E-013
-6 .00E-013
-8 .00E-013
Ba F2
-1 .00E-012
-1 .20E-012
-1 .40E-012
-1 .60E-012
600
500
400
300
Wavelength (nm)
200
100
Stress-Birefringence Results
Coefficients
(10-12 Pa-1)
CaF2
q11-q12
q11
q12
q44
BaF2
q11-q12
q11
q12
q44
mSiO2
q11-q12
q11
q12
546.38 nm
435.96 nm
365.12 nm
253.73 nm
193.09 nm
156.10 nm
157.63 nm
(linear int.)
1.530.02
0.380.06
1.150.06
0.750.010
1.550.02
0.400.06
1.150.06
0.740.01
1.570.02
0.350.05
1.220.09
0.740.01
1.660.02
0.320.05
1.340.13
0.730.01
1.770.02
extrap. 0.3
extrap. 1.5
0.660.01
1.910.05
extrap. 0.3
extrap. 1.6
0.450.01
1.90
extrap. 0.3
extrap. 1.6
0.46
3.100.03
0.930.10
2.170.10
0.990.02
3.150.03
0.970.10
2.180.10
1.010.02
3.210.03
1.080.15
2.130.15
1.010.02
3.440.03
1.410.20
2.030.20
1.040.02
3.710.04
extrap. 1.7
extrap. 2.0
1.080.02
4.420.04
extrap. 2.4
extrap. 2.0
1.310.02
4.39
extrap. 2.4
extrap. 2.0
1.30
2.340.022
0.330.10
2.670.1.0
2.370.02
0.220.10
2.590.10
2.410.02
0.110.15
2.520.15
2.550.02
0.200.15
2.350.20
2.760.03
extrap. 0.4
extrap. 2.3
3.040.03
extrap. 0.8
extrap. 2.2
3.03
extrap. 0.8
extrap. 2.2
Summary
We have determined the complete set of stress-optical coefficients needed to
determine the effect of stress on the index of CaF2, BaF2, and a form of VUV
fused silica:
(q11-q12) and q44 from the visible through 156 nm
q11 and q12 from the visible through 254 nm
To obtain these we built a Twyman-Green interferometer that operates on
atomic spectral lines from the visible through the fused silica beam splitter
cutoff near 200 nm.
Using our new CaF2 beam splitter will allow measurements down to below
157 nm ( by Jan. 2002.)
To Do:
Measure the absolute coefficients q11 and q12 for CaF2, BaF2, and fused silica
at 157 nm (Jan. 2002)
Measure the stress-optical coefficients for other important VUV materials,
including SrF2, LiF, and possibly mixed crystals