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3/5/2014

Outlines
Automotive Embedded
Systems

Developing Trends of Automotive


Electronic Systems
Emerging In-Vehicle Networks

Automotive Electronic Systems Today

Developing Trends of Automotive


Electronic Systems

Expanding Automotive Electronic


Systems

Expanding Automotive Electronic


Systems
The mature subsystems of automotive
electronic systems
Powertrain/Body controlEMS, ABS,

Themes of current stage


X-by-wirean ongoing revolution in vehicle
electronics architecture

Themes of next stage


Infotainment= Entertainment +
Communication + Information

3/5/2014

Expanding Automotive Electronic


Systems

System Structure of ECU

Analysts estimate that more than 80


percent of all automotive innovation now
stems from electronics
To embedded the electronic systems and
silicon componentssuch as transistors,
microprocessors, and diodesinto motor
vehicles is the developing trend of
automotive electronic systems

Developing Trends of Automotive


Electronic Systems

System Structure of ECU

System requirements

L-Line(13)
K-Line(55)

OXYD(28)
OXYHD(Int.)
OCSC(39)
Knock
(11,30)

PreProcessor

Crankshaft
(49,48)

PreProcessor

CAM(8)
VSpeed(9)
FPM(47)

TLE6230GP
350mA/50V..75V

Extension
Slot
NFP-50A

Passive
Filters
System
Control

EEPROM/
Flash Memory
Am29F040
NM24C04

Micro
Controller
C509L

Output Drivers

Reserved(40)
ACCR(41)
EGRP(50)
TPS(53)
MVM(27)

Signal Conditioners

MAT(44)
CTS(45)
PSS(51)
Reserved(52)
MAF(7)

TPS2814D/
IGBTs

K, L Line
Interface
SI9243EY

Resistive
Sensor

Reserved(42)

Voltage Inputs

Example

TLE6220GP
2A/
60V..80V

TLE6220GP
BTS933

Power Regulators
/Reset Circuit
TLE4266G
TLE4267G

TLE4729G
BSP78
BSP78

SAC1-4(1)
SAC2-3(20)
TSO(43)
FCSO(54)
Reserved(38)
ACCR(25)
CFR(6)
MR(46)
FPR(3)
MFIL(22)
ISV(36)
Reserved(31)
CPV(5)
EGRV(17)
Injector4(34)
Injector3(35)
Injector2(16)
Injector1(23)
OSH(33,15)

Standardization of functional interfaces


Share and reuse the existing components
Comprehensive safety
A high degree of comfort
Low energy consumption, and
Minimal pollutant emission

IAC-A(4),B(26)
-C(21),D(29)
Reserved(32)
EGRP(50)

Developing Trends of Automotive


Electronic Systems
Issues of system development
Integrate and reuse the software and
hardware cores from multiple vendors
Innovative functionality realized through
interaction of formerly autonomous units
(reconfigurable distributed
systems/mechatronics)
Scalability to different vehicle and platform
variants

Developing Trends of Automotive


Electronic Systems
Design Toolkits
Digital Transmission Capability
Transferability of functions throughout
network
Maintainability throughout the whole Product
Life Cycle

3/5/2014

Developing Trends of Automotive


Electronic Systems
Conventional
Sensors

ECU

Transmission Path
Susceptible to
Interference
(analog)

SE

Signal
Conditioning
(Analog)

ECU
A/D (digital)

1st Integration Level


Sensors
Signal
Conditioning
SE
(Analog)

ECU

Transmission Path
Multiple
Tap-off

Resistant to
Interference
(analog)

A/D

ECU
(digital)

referring to: G. Leen and D. Heffernan,Expanding Automotive Electronic Systems

Developing Trends of Automotive


Electronic Systems

Developing Trends of Automotive


Electronic Systems

2nd Integration Level


Sensors
Signal
Conditioning
SE
(Analog)

ECU

Transmission Path

A/D

Immune to
Bus
Interference
Compatible (digital)

Mechatronics

ECU
(digital)

3rd Integration Level


Sensors
Signal
Conditioning
SE
(Analog)

ECU

Transmission Path
Immune to
Interference
Compatible (digital)
Bus
A/D C

ECU
(digital)

Developing Trends of Automotive


Electronic Systems
Issues of hardware development
Exhibit immunity from radio emissions
Reducing the hardware cost and size
With high computing power
Transient faults well be tolerated
Embedded network
A variety of sensor/actuator interface
capabilities

3/5/2014

Developing Trends of Automotive


Electronic Systems
Issues of software development

Developing Trends of Automotive


Electronic Systems
Rise of importance of software in the Car

Real-time operating system


Software component paradigm
Software updates and upgrades over vehicle
lifetime
Minimizing the cost and execution time of
software components
Uniform data format and seamless software
component interface
Refer to:B. Hardung, T. Kolzow, and A. Kruger, Reuse of Software in Distributed Embedded Automotive Systems

Developing Trends of Automotive


Electronic Systems
Example of software cores (components)

Developing Trends of Automotive


Electronic Systems
Standardized systems (Open systems)
Management of automotive electronic
systems complexity associated with growth in
functional scope
Flexibility for product modification, upgrade
and update
Scalability of solutions within and across
product lines
Improved quality and reliability of automotive
electronic systems

Developing Trends of Automotive


Electronic Systems
OSEK/VDX
OSEK/VDX is a joint project of the automotive
industry (1993)
It aims at an industry standard for an openended architecture for distributed control units
in vehicles

Developing Trends of Automotive


Electronic Systems
The term OSEK means Offene Systeme und
deren Schnittstellen fr die Elektronik im
Kraftfahrzeug (Open systems and the
corresponding interfaces for automotive
electronics).
The term VDX means Vehicle Distributed
eXecutive

3/5/2014

Developing Trends of Automotive


Electronic Systems

Developing Trends of Automotive


Electronic Systems

The OSEK/VDX specifies


Real-time operating system
Software interfaces and functions for
communication, and
Software for network management

Application
Communication API
OSEK/COM
Standard API

OSEK/COM
Standard Protocol
OSEK/COM
Device Driver
Interface

Interaction Layer

Network API

OSEK/VDX
Network
Management

Network Layer

Data Link Layer

Bus I/O Driver


Bus Frame

Bus Communication Hardware

Developing Trends of Automotive


Electronic Systems
Automotive Open System Architecture
(AUTOSAR):
Standardization of different APIs to separate
the AUTOSAR software layers
Encapsulation of functional softwarecomponents
Definition of the data types of the softwarecomponents

Developing Trends of Automotive


Electronic Systems

Developing Trends of Automotive


Electronic Systems
Identification of basic software modules of the
software infrastructure and standardize their
interfaces

Developing Trends of Automotive


Electronic Systems

3/5/2014

Developing Trends of Automotive


Electronic Systems
One ECU example

Developing Trends of Automotive


Electronic Systems
Two ECUs example

Functional Applications

Strategic Technical Considerations

Multimedia
Data Rate

MOST

X-by-wire

FlexRay
Safety Bus

InfotainmentControl

Body
Electronics

Requirements

Consumer
Interface

Powertrain and
Vehicle Dynamics

Telematics Applications
1 Mbits/s

CAN
20 Kbits/s

Sub-Bus

LIN
Safety/Reliability

Close-loop Control Systems

Thank you for your attention!

3/5/2014

Brushless DC (BLDC) Motors

BLDC Motor Stator

Brushless DC Motors are a type of


synchronous motor
magnetic fields generated by the stator and
rotor rotate at the same frequency
no slip

Available in single-phase, 2-phase, and


3-phase configurations

BLDC Motor Rotors

Hall-Effect
If a current-carrying conductor is kept in a
magnetic field, the magnetic field exerts a
force on the moving charge carriers,
tending to push them to one side of the
conductor, producing a measurable
voltage difference between the two sides
of the conductor.

3/5/2014

Hall-Effect Sensors

Transverse Sectional View of Rotor

Need 3 sensors to determine the position


of the rotor
When a rotor pole passes a Hall-Effect
sensor, get a high or low signal, indicating
that a North or South pole

Commutation Sequence

Torque-Speed Characteristic

Each sequence has


one winding energized positive (current into
the winding)
one winding energized negative (current out
of the winding)
one winding non-energized

3/5/2014

Six-Step Commutation (4-pole)


Hall-Effect Sensors
spaced 60 electrical
degrees apart
6 steps to complete
one electrical cycle
Phase current
switching updated
every 60 electrical
degrees

3/5/2014

BLDC Control

Essential Elements of a Typical BLDC Motor

CW

CCW



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3/5/2014

Digital Meters - Power Quality


Monitoring and Analysis

Contents
Effects of power quality
Power Quality definitions revisited
What is needed for PQ monitoring ?
GE Multilins solution
PQMII
EPM9000 series

Summary
Monitor and Analyze Power Disturbances, Disruptions & Harmonics

PQ is a Business Problem

Is Power Quality Such a Big Problem?

Power Quality issues cause business problems


such as:
Lost productivity, idle people and equipment
Lost orders, good will, customers and profits
Lost transactions and orders not being
processed
Revenue and accounting problems
Customer and/or management dissatisfaction
Overtime required to make up for lost work time
According to Electric Light and Power Magazine, 30 to 40 Percent of All
Business Downtime Is Related to Power Quality Problems.

Why PQ is such a Big Problem?


The sensitivity of todays electronic equipment
makes it susceptible to power disturbances
For some devices, a momentary disturbance can
cause

scrambled data
interrupted communications
a frozen mouse
system crashes and equipment failure

PQ Problems are Expensive


Berkeley Lab Study Estimates $80 Billion Annual
Cost of Power Interruptions Research News,
Berkeley Lab, February 2, 2005
$50 billon per year in the USA is lost as a results of
power quality breakdowns . Bank of America
Report
A manufacturing company lost more than $3
million one day last summer in Silicon Valley when
the lights went out. New York Times January
2000
A voltage sag in a paper mill can waste a whole
day of production - $250,000 loss Business
Week, June 17,, 1996
Half of all computer problems and one-third of all
data loss can be traced back to the power line
Contingency Planning Research, LAN Times

3/5/2014

Who is Affected?

PQ Definitions Revisited

High Cost Facilities


o Semiconductor plants
o Pharmaceuticals
o Data centers
Medium Cost Facilities
o Automotive manufacturing
o Glass plants
o Plastics & Chemicals
o Textiles

IEEE Categories
Std 1159-1995
Short Duration Variations

Lost production
Scrap
Costs to restart
Labor costs
Equipment damage and repair
Other costs

Typical Duration

Instantaneous Sag

0.5 30 cycles

Momentary Sag

30 cycles 3 sec

Temporary Sag

3 sec 1 min

PQ Definitions Revisited

PQ Definitions Revisited

IEEE Categories
Std 1159-1995

IEEE Categories
Std 1159-1995

Short Duration Variations

Typical Duration

Short Duration Variations

Instantaneous Sag

0.5 30 cycles

Instantaneous Sag

0.5 30 cycles

Momentary Sag

30 cycles 3 sec.

Momentary Sag

30 cycles 3 sec.

Temporary Sag

3 sec 1 min.

Temporary Sag

3 sec 1 min.

Instantaneous Swell

0.5 30 cycles

Instantaneous Swell

0.5 30 cycles

Momentary Swell

30 cycles 3 sec.

Momentary Swell

30 cycles 3 sec.

Temporary Swell

3 sec 1 min.

Temporary Swell

3 sec 1 min.

Momentary Interruptions

0.5 30 cycles

Temporary Interruptions

30 cycles 3 sec.

PQ Definitions Revisited

Typical Duration

PQ Definitions Revisited

IEEE Categories
Std 1159-1995

IEEE Categories
Std 1159-1995

Long Duration Variations

Typical Duration

Long Duration Variations

Typical Duration

Sustained interruptions

> 1 min

Sustained interruptions

> 1 min

Under voltages

> 1 min

Under voltages

> 1 min

Over voltages

> 1 min

Over voltages

> 1 min

Voltage imbalance

Steady state

Waveform Distortion

3/5/2014

PQ Definitions Revisited
Long Duration Variations

SourcesInternal
ofSources
PQ Problems

Utility Sources
Lightning
PF Correction
Equipment
Faults
Switching

IEEE Categories
Std 1159-1995
Typical Duration

Individual Loads Lighting, Elevators, Coolers, HVAC


Uninterruptible Power Supplies

Sustained interruptions

> 1 min

Under voltages

> 1 min

Over voltages

> 1 min

Battery Chargers

Voltage imbalance

Steady state

Large Motors During Startup


Electronic Dimming Systems

Waveform Distortion
DC offset

Variable Frequency Drives

Steady state

Lighting Ballasts (esp. Electronic)

Harmonics

Steady state

Arc Welders, and Other Arc Devices

Inter harmonics

Steady state

Medical Equipment, e.g. MRIs and X-Ray Machines


Office Equipment and Computers
Wiring

For Electric Utilities Control of Voltage and Prevention of Outages is Power Quality

PQ Problems and Possible Causes

PQ Problems and Possible Causes

Typical problems

Disturbance Type

Possible Causes

Typical problems

Disturbance Type

Possible Causes

Overheated neutral
Intermittent lock-ups
Frequency deviations

Steady-state

Shared neutrals
Improper or inadequate wiring
High source impedance
SCR/Rectifiers and notching
Harmonics

Overheated neutral
Intermittent lock-ups
Frequency deviations

Steady-state

Shared neutrals
Improper or inadequate wiring
High source impedance
SCR/Rectifiers and notching
Harmonics

Interruption
Garbled data
Random increase in harmonics levels

PQ Problems and Possible Causes

Utility faults
Inrush currents
Inadequate wiring

PQ Problems and Possible Causes

Typical problems

Disturbance Type

Possible Causes

Typical problems

Disturbance Type

Possible Causes

Overheated neutral
Intermittent lock-ups
Frequency deviations

Steady-state

Shared neutrals
Improper or inadequate wiring
High source impedance
SCR/Rectifiers and notching
Harmonics

Overheated neutral
Intermittent lock-ups
Frequency deviations

Steady-state

Shared neutrals
Improper or inadequate wiring
High source impedance
SCR/Rectifiers and notching
Harmonics

Utility faults
Inrush currents
Inadequate wiring

Interruption
Garbled data
Random increase in harmonics levels

Source voltage variations


Inrush/surge currents
Inadequate wiring

Intermittent lock-ups
Lights flicker
Garbled data

Sags/Swell

Source voltage variations


Inrush/surge currents
Inadequate wiring

Component failure
Dielectric breakdown
Lock-ups
Garbled data
Wavy CRTs

Impulses
EMI/RFI

Lightning
Load switching
Capacitor switching
Static discharge
Hand-held radios
Loose wiring/arcing

Interruption
Garbled data
Random increase in harmonics levels
Intermittent lock-ups
Lights flicker
Garbled data

Sags/Swell

Utility faults
Inrush currents
Inadequate wiring

3/5/2014

PQ Problems and Possible Causes


Typical problems

Disturbance Type

Possible Causes

Overheated neutral
Intermittent lock-ups
Frequency deviations

Steady-state

Shared neutrals
Improper or inadequate wiring
High source impedance
SCR/Rectifiers and notching
Harmonics

Interruption
Garbled data
Random increase in harmonics levels

Major PQ Problems
Outages,
6%
Spikes, 7%

Utility faults
Inrush currents
Inadequate wiring

Intermittent lock-ups
Lights flicker
Garbled data

Sags/Swell

Source voltage variations


Inrush/surge currents
Inadequate wiring

Component failure
Dielectric breakdown
Lock-ups
Garbled data
Wavy CRTs

Impulses
EMI/RFI

Lightning
Load switching
Capacitor switching
Static discharge
Hand-held radios
Loose wiring/arcing

Overheated transformers and motors


Voltage and current distortions
Garbled data
Lock-ups

Harmonics

Swells,
Source: EPRI, 1994

Electronic loads
SCR/rectifier

Swells

Sags (Dips)

System fault conditions

Associated with system faults

Switching on a large capacitor bank

Switching of heavy loads

Switching off a large load

Starting of large motors

Cost of Voltage Sags

Cost of Momentary Outages

Textile Industry
Plastics Industry
Glass Industry
Process Industry
Semiconductors

$1k

$10k

$100k

$1M

Sags, 56%

31%

$10M

Source: EPRI The Economics of Custom Power, IEEE T&D Show 2003

Losses per Voltage Sag Event

Momentary Outages
create problems when
computers and clocks
reset, equipment stalls,
and work stops.

Category
Industrial
Semiconductor Manufacturing
Electronics
Automobile Manufacturing
Pharmaceutical
Glass
Rubber and Plastics
Petrochemical
Food Processing
Textile
Metal Fabrication
Mining
Paper
Printing(Newspapers)

Cost of Momentary Interuption


($/kW Demand)
Minimum Maximum

Commercial
Hospitals, banks, civil service
Communications, information processing
Resturants, bars, hotels
Commercial shops

$20.0
$8.0
$5.0
$5.0
$4.0
$3.0
$3.0
$3.0
$2.0
$2.0
$2.0
$1.5
$1.0

$60.0
$12.0
$7.5
$50.0
$6.0
$4.5
$5.0
$5.0
$4.0
$4.0
$4.0
$2.5
$2.0

$2.0
$1.0
$0.5
$0.1

$3.0
$10.0
$1.0
$0.5

Source: EPRI The Economics of Custom Pow er, IEEE T&D 2003

High Speed Waveform Capture

Benefits of Continuous PQ Monitoring


Power Quality monitoring provides a continuous
Health Check of a facilitys power system for
example:
o

Harmonic interaction between loads and


power conditioning equipment spotted

High Inrush currents from equipment startup


detected

Transients from load switching are seen

It provides data to see, diagnose and avert looming


problems like squeaky brakes on a car
o

Trends can be detected

JIT equipment maintenance programs can


be established

It acts like a Black Box on an airplane to tell you


what, when, and where a Power Quality event
occurred to prevent it from reoccurring

High Speed Waveform Capture Is the Most Important PQ Troubleshooting Tool


Continuous PQ Monitoring Detects, Records, and Leads to the
Prevention of PQ Problems

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Real Time Field Recorded Events


What is needed for PQ Monitoring?
Plus they must

PQ Monitors must detect and record


the 7 types of PQ problems

Source: AGA Brazil

Transients
Interruptions
Sag/Under Voltage
Swell/Over Voltage
Waveform Distortion
Voltage Fluctuations
Frequency Variations

These include Flicker and Compliance to


ITI(CBEMA), IEEE and ISO Standards

Be easy to use
Be Suitable for continuously
monitoring indoors and outdoors
Interface with standard PQ analysis
SoftwarePQDif format
Be fast enough to capture high speed
events that produce equipment
problems
Have enough storage to save the
waveforms you need
Have PQ analysis tools that produce
usable, actionable recommendations

Meter: EPM9650

Period: Jan 2005 Dec 2005

Continuous Monitoring of the Station for PQ Problems

ITI: Information Technology Industry Council (Computer & Business Equipment Manufacturers Association)

PQ Meter ITI Capture

Instantaneous Sag Event

ITI Acceptable Power


Disturbance Envelope
Damage Inducing Voltage
Surges as Recorded

Equipment Interrupting
Voltage Sags as Recorded

ITI: Information Technology Industry Council (Computer & Business Equipment Manufacturers Association)

Instantaneous Swell Event

Harmonic & Interharmonic Spectrum

3/5/2014

Flicker Recording

Flicker Recording

Summary

Finally

GE Multilin provides the necessary tools for a successful PQ disturbance


analysis and allows users to take remedial actions
Symptoms

If You Can Measure it You Can Manage it

Feels the pulse of the power


system network

Examinations

If You Cant Measure it You Cant Manage it

Accurate Measurement to
determine actual state

Diagnosis

High resolution recordings for


longer durations
GE Communicator software

Remedy

Remedial actions

Integrated Circuit Fabrication Process


Do you ever wonder how the processor in your computer was actually fabricated? How is it that engineers can put
hundreds of millions of transistors into one device that measures only a few centimeters on a side (and with so few
errors) so the devices actually function as expected?
Devices such as modern computer processors and semiconductor memories fall into a class known as integrated
circuits (IC). They are so named because all of the components in the circuit (and their wires) are fabricated
simultaneously onto a circuit during the manufacturing process. This is in contrast to circuits where each component
is fabricated separately and then soldered or wired together onto a common board (such as those you probably build
in your lab classes). Integrated circuits were first demonstrated independently by Jack Kilby at Texas Instruments and
Robert Noyce at Fairchild Semiconductor in the late 1950s. Once developed, the ability to manufacture components
and their connections in parallel with good quality control meant that circuits with thousands (then millions, then billions)
of components could be designed and built reliably.

Semiconductor Processing Basics


All mainstream semiconductor integrated-circuit processes start with a thin slice of silicon, known as a substrate or
wafer. This wafer is circular and ranges from 4 to 18 inches in diameter and is approximately 1 mm thick (hence its
name). Each wafer is cut from a single crystal of the element silicon and polished to its final thickness with atomic
smoothness (Fig. TF7-1). Most circuit designs (like your processor) fit into a few square centimeters of silicon area;
each self-contained area is known as a die. After fabrication, the wafer is cut to produce independent, rectangular dies
often known as chips, which are then packaged to produce the final component you buy at the store.

Figure TF7-1: A single 4-inch silicon wafer. Note the


wafers mirror-like surface. (Courtesy of Veljko Milanovic.)

(a) Implantation: High-energy ions are


driven into the silicon. Most become
lodged in the first few nanometers,
with decreasing concentration away
from the surface. In this example,
boron (an electron donor) is implanted
into a silicon substrate.

(b) Deposition: Atoms (or molecules)


impact the surface but do not have the
energy required to penetrate the
surface. They accumulate on the
surface in thin films. In this example,
aluminum is deposited in a conductive
film onto the silicon.

(a) Etching: Chemical, mechanical,


or high-energy plasma methods are
used to remove silicon (or other
material) from the surface. In this
example, silicon is etched away from
the substrate.

Figure TF7-2: Cross-section of basic fabrication processes. The dashed line in each drawing indicates the original surface of
the wafer.

A specific sequence or process of chemical and mechanical modifications is performed on certain areas of the
wafer. Although complex processes employ a variety of techniques, a basic IC process will employ one of the following
three modifications to the wafer:
Implantation: Atoms or molecules are added to the silicon wafer, changing its electronic properties (Fig.TF7-2(a)).
Deposition: Materials such as metals, insulators, or semiconductors are added in thin layers (like painting) onto
the wafer (Fig. TF7-2(b)).
Etching: Material is removed from the wafer through chemical reactions or mechanical motion (Fig. TF7-2(c)).

Lithography
When building a multi-component IC, we need to perform different modifications to differents areas of the wafer. We
may want to etch some areas and add metal to others, for example. The method by which we define which areas will
be modified is known as lithography.
Lithography has evolved much over the last 40 years and will continue to do so. Modern lithography employs all
of the basic principles described below, but uses complex computation, specialized materials, and optical devices to
achieve the very high resolutions required to reach modern feature sizes.
At its heart, lithography is simply a stencil process. In an old-fashioned stencil process, when a plastic sheet with
cut-out letters or numbers is laid on a flat surface and painted, only the cutout areas would be painted. Once the stencil
is removed, the design left behind consists of only the painted areas with clean edges and a uniform surface. With that
in mind, consider Fig. TF7-3. Given a flat wafer, we first apply a thin coating of liquid polymer known as photoresist
(PR). This layer usually is several hundred nanometers thick and is applied by placing a drop in the center of the wafer
and then spinning the wafer very fast (1000 to 5000 rpm) so that the drop spreads out evenly over the surface. Once
coated, the PR is heated (usually between 60 to 100 C) in a process known as baking; this allows the PR to solidify

Dispense

Spin and Bake

Expose

Develop

Figure TF7-3: Basic lithography steps.

slightly to a plastic-like consistency. Once baked and when exposed to ultraviolet (UV) light, the bonds that hold the
PR molecules together are chopped up; this makes it easy to wash away the UV-exposed areas (some varieties of
PR behave in exactly the opposite manner: UV light makes the PR very strong or cross-linked, but we will ignore that
technique here). In lithography, UV light is focused through a glass plate with patterns on it; this is known as exposure.
These patterns act as a light stencil for the PR. Wherever UV light hits the PR, that area subsequently can be washed
away in a process called development. After development, the PR film remains behind with holes in certain areas.
How is this helpful? Lets look at how the modifications presented earlier can be masked with PR to produce
patterned effects (Fig. TF7-4). In each case, we first use lithography to pattern areas onto the wafer (Fig. TF7-4(a))
then we perform one of our three processes (Fig. TF7-4(b)), and finally, we use a strong solvent such as acetone (nail
polish remover) to completely wash away the PR (Fig. TF7-4(c)). The PR allows us to implant, deposit, or etch only in
defined areas.

Fabricating a Diode
In Section 2-7, we discussed the functional performance of the diode as a circuit component. Here, we will examine
briefly how a diode is fabricated. Similar but more complex multi-step processes are used to make transistors and
integrated circuits. Conceptually, the simplest diode is made from two slabs of siliconeach implanted with different
atomspressed together such that they share a boundary (Fig. TF7-5). The n and p areas are pieces of silicon that

Lithography

Implantation

Deposition
Etch

p-type
silicon
p or n type
silicon
area

Metal film
Etched recess

silicon substrate

Figure TF7-4: Lithography used to pattern implantation


areas, deposit metal features, and etch areas.

metal

n-type
silicon
metal

Figure TF7-5: The basic diode (top) circuit symbol and


(bottom) conceptual depiction of the physical structure.

have been implanted with atoms (known as impurities) that increase or decrease the number of electrons capable of
flowing freely through the silicon. This changes the semiconducting properties of the silicon and creates an electrically
active boundary (called a junction) between the n and the p areas of silicon. If both the n and p pieces of silicon are
connected to metal wires, this two-terminal device exhibits the diode iv curve shown in Fig. 2-35(c).
Figure TF7-6 shows the process for making a single diode. Only one step needs further definition: oxidation. During
oxidation, the silicon wafer is heated to > 1000 C in an oxygen atmosphere. At this temperature, the oxygen atoms
and the silicon react and form a layer of SiO2 on the surface (this layer is often called an oxide layer). SiO2 is a type
of glass and is used as an insulator.
Wires are made by depositing metal layers on top of the device; these are called interconnects. Modern ICs have
6 to 7 such interconnect layers (Fig. TF7-7). These layers are used to make electrical connections between all of the
various components in the IC in the same way that macroscopic wires are used to link components on a breadboard.

n-type implant

Lithography + etch oxide

a
f
Grow oxide
Remove PR

b
g
Lithography + etch oxide

Metal deposition

c
h

Remove PR

Lithography + etch metal

d
i
p-type implant

e
Complete diode

Metal

Metal

Figure TF7-6: A simple pn-junction diode fabrication


process.

Figure TF7-7: Colorized scanning electron-microscope


cross section of a 64-bit high-performance microprocessor chip built in IBMs 90-nm Server-Class CMOS
technology. Note that several metal interconnect levels
are used (metal lines are orange, insulator is green); the
transistors lie below this metal on the silicon wafer itself
(dark blue). (Courtesy of International Business Machines
Corporation.)

3/5/2014

Topics Covered

REAL TIME APPLICATION


MOBILE PHONE

Cellular Telephone Systems


Digital Cell Phone Systems

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Cellular Telephone Systems

Cellular Telephone Systems

Wireless refers primarily to the cellular telephone


industry.
The cell phone is the largest-volume consumer
electronics device.
It has changed the way that we communicate.

In 2005, cell phone subscribers numbered more than


wired telephone subscribers.
As the data speed of the newer digital cell phone
transmissions increases, more cell phone applications
are possible, including cameras, Internet access, emails, audio, gaming, and video.

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Cellular Telephone Systems

Cellular Telephone Systems

A cellular radio system provides standard telephone


service by two-way radio at remote locations.
Cellular radios or telephones were originally installed
in cars or trucks, but today most of them are available
in handheld models.
Cellular telephones permit users to link up with the
standard telephone system, which permits calls to any
part of the world.

Cellular radio telephone service is available


worldwide.
The original U.S. cell phone system, known as the
advanced mobile phone system, or AMPS, was
based on analog technologies.
AMPS has been phased out and replaced by secondgeneration (2G) and third-generation (3G) digital cell
phone systems.

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Cellular Telephone Systems

Cellular Telephone Systems

Cellular Concepts

Cellular Concepts

The basic concept behind the cellular radio system is


that rather than serving a given geographical area with
a single transmitter and receiver, the system divides the
service area into many small areas known as cells.
The typical cell covers only several square miles and
contains its own receiver and low-power transmitter.
The coverage of a cell depends upon the density
(number) of users in a given area.

Each cell is connected by telephone lines or a


microwave radio relay link to a master control center
known as the mobile telephone switching office
(MTSO).
The MTSO controls all the cells and provides the
interface between each cell and the main telephone
office.
As the person with the cell phone passes through a cell,
it is served by the cell transceiver.

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Cellular Telephone Systems

10

Cellular Telephone Systems

Cellular Concepts

Cellular Concepts

The telephone call is routed through the MTSO and to


the standard telephone system.
As the person moves, the system automatically
switches from one cell to the next.
The receiver in each cell station continuously monitors
the signal strength of the mobile unit.

When the signal strength drops below a desired level, it


automatically seeks a cell where the signal from the
mobile unit is stronger.
The computer at the MTSO causes the transmission
from the person to be switched from the weaker cell to
the stronger cell. This is called a handoff.

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Cellular Telephone Systems

Cellular Telephone Systems


Frequency Allocation
Cellular radio systems operate in the UHF and
microwave bands as assigned by the Federal
Communications Commission (FCC).
The original frequency assignments were in the 800- to
900-MHz range previously occupied by the mostly
unused UHF TV channels 68 through 83.

Figure 20-1: The area served by a cellular telephone system is divided into small
areas called cells. Note: Cells are shown as ideal hexagons, but in reality they have
circular to other geometric shapes. These areas may overlap, and the cells may be of
different sizes.
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Cellular Telephone Systems

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Cellular Telephone Systems

Frequency Allocation
The frequencies between 824 and 849 MHz are
reserved for the uplink transmissions from the cell
phone to the base station. These are also called the
reverse channels.
The frequencies between 869 and 894 MHz are the
downlink bands from base station to cell phone.
Two blocks of 60 MHz between 1850 and 1990 MHz
are referred to as the personal communications
systems (PCS) channels.

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Figure 20-4: Additional U.S. cell phone spectrum. (a) 890 to 960 MHz and (b) 1850 to
1990 MHz are called the personal communication system PCS band.
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Cellular Telephone Systems

16

Cellular Telephone Systems


Multiple Access: Frequency Reuse

Multiple Access

In frequency reuse, individual frequency bands are


shared by multiple base stations and users.
This is possible by ensuring that one subscriber or base
station does not interfere with any others.
This separation achieved by controlling such factors as
transmission power, base station spacing, and antenna
height and radiation patterns.

Multiple access refers to how the subscribers are


allocated to the assigned frequency spectrum.
Access methods are the ways in which many users
share a limited amount of spectrum.
The techniques include:
Frequency reuse
Frequency-division multiple access (FDMA)
Time-division multiple access (TDMA)
Code-division multiple access (CDMA)
Spatial-division multiple access (SDMA).
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Cellular Telephone Systems


Multiple Access: Frequency-Division Multiple Access
FDMA systems are like frequency-division multiplexing.
They allow many users to share a block of spectrum by
dividing it up into many smaller channels.
Each channel of a band is given an assigned number or
is designated by the center frequency of the channel.
One subscriber is assigned to each channel.

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Cellular Telephone Systems


Multiple Access: Time-Division Multiple Access
TDMA relies on digital signals and operates on a single
channel.
Multiple users use different time slots.
Because the audio signal is sampled at a rapid rate, the
data words can be interleaved into different time slots.

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Cellular Telephone Systems

20

Cellular Telephone Systems

Multiple Access: Code-Division Multiple Access

Multiple Access: Spatial-Division Multiple Access

CDMA is just another name for spread spectrum.


A high percentage of cell phone systems use direct
sequence spread spectrum (DSSS).
Here the digital audio signals are encoded in a circuit
called a vocoder to produce a 13-kbps serial digital
compressed voice signal.
It is then combined with a higher-frequency chipping
signal.
A unique pseudo-random chipping code is used to
identify multiple subscribers who use the same
spectrum.

This form of access is actually an extension of


frequency reuse.
It uses highly directional antennas to pinpoint users and
reject others on the same frequency.
Very narrow antenna beams at the cell site base station
are able to lock in on one subscriber but block another
while both subscribers are using the same frequency.
Modern antenna technology using adaptive phased
arrays makes this possible.

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Cellular Telephone Systems

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Cellular Telephone Systems

Duplexing

Duplexing

Duplexing refers to the ways in which two-way radio or


telephone conversations are handled.
Telephone communications have always been full
duplex, where both parties can simultaneously send
and receive. All cell phone systems are full duplex.
To achieve full duplex operation, frequency-division
duplexing (FDD) or time-division duplexing (TDD)
must be implemented.

In FDD, separate frequency channels are assigned for


the transmit and receive functions.
The transmit and receive channels are spaced so that
they do not interfere with one another inside the cell
phone or base station circuits.
TDD is less common. The system assigns the transmit
and receive data to different time slots, both on the
same frequency.

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Digital Cell Phone Systems

Digital Cell Phone Systems

Digital Cell Phone Circuits


An embedded controller handles all the digital control
and signaling, handoffs, and connection and
identification operations.
The controller also runs the display and keyboard and
all other user functions such as number storage, auto
dialing, and caller ID.

Figure 20-19: Block diagram for a 2G digital cell phone.


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Digital Cell Phone Systems

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Digital Cell Phone Systems

Digital Cell Phone Circuits: Direct Conversion

Digital Cell Phone Circuits: Direct Conversion

The direct-conversion or zero IF design sets the LO


frequency to the incoming signal frequency so that the
translation is made directly to the baseband signal.
Since direct conversion works only with doublesideband suppressed (DSB) AM signals, changes have
been made to accommodate FSK, BPSK, QPSK, and
other forms of digital modulation.

Direct conversion eliminates the need for an expensive


and physically large selective IF filter.
Direct conversion eliminates the imaging problem so
common in superheterodyne designs, especially in the
crowded multiband cellular spectrum.
With direct conversion, baseband filtering can be
accomplished using simple low-pass RC filters and/or
DSP filters.

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Digital Cell Phone Systems

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Digital Cell Phone Systems


Digital Cell Phone Circuits: Low IF
When an IF is used near the baseband frequencies,
filtering is simple and very effective.
Most 2G and later phones are multiband phones that
can operate in three or four bands, thereby permitting
widespread roaming.
The signal passes through one of three SAW filters and
feeds into a mixer.
An image reject mixer uses a technique similar to the
phasing method of generating a single sideband (SSB)
signal.

Figure 20-20: A direct-conversion receiver.


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Digital Cell Phone Systems


Digital Cell Phone Circuits: Low IF
Simple integrated RC low-pass filters are used to
eliminate the sum signals resulting from the conversion.
Programmable gain amplifiers (PGAs) equalize the
signal levels, then the low-IF signals are applied to two
delta-sigma A/D converters.
The digitized signals go to the baseband circuit and are
demodulated by the DSP.
The recovered digital data is then sent to the vocoder,
where the voice signal is recovered.

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Digital Cell Phone Systems


2.5G Cell Phone Systems
The designation 2.5G refers to a generation of cell
phones between the original second-generation (2G)
digital phones and newer third-generation (3G) phones.
2.5G phones bring data transmission capability to 2G
phones in addition to normal voice service.
A 2.5G phone permits subscribers to exchange emails
and access the Internet by cell phone.
The three technologies used in 2.5G systems are
GPRS, EDGE, and CDMA2000.

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Digital Cell Phone Systems

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Digital Cell Phone Systems

2.5G Cell Phone Systems

2.5G Cell Phone Systems: CDMA2000

One popular 2.5G technology is the general packet


radio service (GPRS).
This system is designed to work with GSM phones.
It uses one or more of the eight time slots in a GSM
phone system to transmit data rather than digitized
voice.
A faster 2.5G technology is enhanced data rate for
GSM evolution (EDGE).
It uses 8-PSK modulation instead of GMSK to achieve
data rates up to 384 kbps.

A third, different form of 2.5G digital cell phone is


designated CDMA2000. This standard is an extension
of the widely used IS-95 CDMA standard (cdmaOne).
The basic CDMA2000 data transmission method uses
1.25-MHz-wide channels but changes the modulation
and coding formats to double the voice capacity.
The data capability is packet-based and permits a data
rate of up to 144 kbps which is comparable to EDGE.
The more recent version is called 1EV-DO or
Evolution-Data Optimized. It has a data rate of about
3.1 Mbps downlink and an uplink rate up to 1.8 Mbps.

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Digital Cell Phone Systems

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Digital Cell Phone Systems


UMTS 3G

3G Cell Phone Systems

The ITU recommended one worldwide version known


as wideband CDMA (WCDMA) in implementing 3G.
This system is also known as the Universal Mobile
Telecommunications Service (UMTS).
WCDMA is a direct sequence spread spectrum
technology.
In the most popular configuration, it is designed to use a
3.84-MHz chipping rate in 5-MHz-wide bands.
Duplexing is FDD, requiring the matching of 5-MHz
channels. The modulation is QPSK.
It can achieve a packet data rate up to 2 Mbps.

Third-generation (3G) cell phones are true packet data


phones.
3G phones feature enhanced digital voice and highspeed data transmission capability.
3G applications include fast e-mail and Internet access.
3G phones are being packaged with personal digital
assistants (PDAs).
High speed also permits the transmission of video.

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Digital Cell Phone Systems


UMTS 3G

Digital Cell Phone Systems


UMTS 3G

A key problem in implementing 3G is the need for huge


portions of spectrum.
The exact 3G spectrum varies widely depending on
which part of the world you are in, making it extremely
difficult to design a cell phone that is fully operable
worldwide.
The UMTS 3G standard also defines a TDD version
known as TD-SCDMA for time-division synchronous
code-division multiple access.
The primary benefit of TD-SCDMA is that less spectrum
is needed.
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Because of the need for faster systems, a new system


compatible with WCDMA has been developed.
Known as high-speed downlink packet access
(HSDPA), this so-called 3.5G technology is an add-on
to WCDMA systems.
HSDPA uses an adaptive coding and modulation
scheme with QPSK and 16-QAM.
When a fast uplink is needed, a companion standard
known as high-speed uplink packet access (HSUPA)
is used.
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Digital Cell Phone Systems


Advanced Cell Phones
Handset manufacturers
have built in a wide range
of features that make the
cell phone the most
desired consumer
electronic product ever
developed.
Consider what electronic
circuits and systems are
needed to make these
features work:

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Digital Cell Phone Systems

Color LCD Screens.


Digital Cameras.
E-mail.
Games.
GPS.
Internet Access.
MP3 Players.
Push-to-Talk.
FM Radio.
Wireless Headsets.
Video.
Location-Based Technology.

Advanced Cell Phones: Location-Based Technology


Another feature included in modern phones is
enhanced 911 (E911) capability.
This system is mandated by the U.S. government.
All cell phone carriers must have a system that makes it
possible to locate any cell phone position automatically.
This permits emergency medical services or automobile
towing crews to find the cell phone used to make the
911 emergency call.

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Digital Cell Phone Systems

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Digital Cell Phone Systems

Advanced Cell Phones: Location-Based Technology

Base Stations
The most complex and expensive part of any cellular
telephone system is the network of base stations that
carriers must have to make it all work.
Base stations consist of multiple receivers and
transmitters so that many calls can be handled on many
different channels simultaneously.
The most visible feature of a base station is its antenna
on a tower.
Base station antennas have become directional, which
helps to increase subscriber capacity with minimal cost.

Several different systems have been adopted by the


various carriers.
Most CDMA phones contain a GPS receiver that
transmits its coordinates digitally to the carrier, from
which they can be forwarded to emergency services.
GSM, GPRS, and EDGE phones use a system called
UplinkTime Difference of Arrival (U-TDOA), a method
of triangulation based on cell phone signals being
received at three different cell sites.

2008 The McGraw-Hill Companies

2008 The McGraw-Hill Companies

41

Digital Cell Phone Systems

Figure 20-27: Horizontal radiation and reception pattern of a typical cell site antenna.
2008 The McGraw-Hill Companies

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