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'
(
T
)
/
'
(
0
C
)
+
bulk
285 nm
20 nm
15 nm
8.7 nm
Fig. 2. Temperature dependence of the normalized permittivity at
100 kHz for bulk-PS and for four lms at various thicknesses from
8.7 nm to 285 nm. For clarity, all curves have been normalized and
vertically shifted by a constant D = n 0.01 (n = 0, 1, 2, 3, 5).
0 20 40 60 80
L [nm]
40
60
80
100
T
g
(
d
i
l
)
[
C
]
M
w
= 1.610
5
M
w
= 1.810
6
[14]
M
w
= 2.810
5
[14]
Fig. 3. Thickness dependence of the dilatometric glass transition temper-
ature T
g
(dil) for ultrathin lms of PS. The two lines represent typical T
g
-
trends compiled from extensive literature referring to freely standing lms
(right line) [38] and supported lms (left line) [28]. Solid symbols show our
T
g
-data for PS of M
w
= 1.6 10
5
g/mol. For comparison, literature data
obtained by capacitive dilatometry [14] are indicated by open symbols.
5596 V. Lupas cu et al. / Journal of Non-Crystalline Solids 352 (2006) 55945600
right line represents the trend for freely standing lms
[1,3,5,20,26,27]. From Fig. 3 we can make two observa-
tions: First, both our T
g
(dil) values and those from Ref.
[26] fall in between the upper limit (supported lms) and
the lower limit (freely-standing lms) despite the fact that
the PS sandwich geometry has no true free surface. Second,
it is obvious that our T
g
reductions are generally lower than
Fukaos [14] values, however, they are still close to the limit
for supported lms [28].
In order to obtain the spectral glass transition temper-
ature T
g
(a) from the dielectric a-process of PS, the follow-
ing strategies were applied. For thick lms showing narrow
loss peaks in the frequency spectra, the dielectric relaxation
time s(T) was determined by a t of the dielectric loss spec-
tra e(x) to the empirical HavriliakNegami (HN) relaxa-
tion function (Eq. (1)) [29]:
e
00
Im
De
1 ixs
a
b
( )
r
e
v
x
1
where De corresponds to the relaxation strength, while the
two shape parameters a and b represent the logarithmic
slope of the low frequency loss tail (a) and the high fre-
quency loss tail (a b). The second term in Eq. (1) ac-
counts for ohmic conduction, more details about the t
procedure for dielectric data are given in [30,31]. The relax-
ation time data for the 285 nm thick PS sample, obtained in
this way, are plotted in the activation diagram, Fig. 4. For
thinner samples, where loss peaks became noisier and
strongly broadened, peak relaxation time data were ob-
tained by analyzing isochronal loss curves e
00
(T) at various
frequencies (cf. open triangles and open circles in Fig. 4).
In a next step, these relaxation time data s(T) were tted
to the VogelFulcherTammann equation
s s
1
exp
E
V
RT T
V
; 2
which typically describes very well the temperature depen-
dence of the structural relaxation time s
a
(T) of glass form-
ing materials. Here, E
V
and T
V
are the Vogel-activation
energy and the Vogel temperature [3234]. The other
parameters R and s
1
have the usual meaning. For the thin-
nest lm (L = 8.7 nm), a two-dimensional t procedure of
the e
00
(f, T) data to a combined HN-VFT-function [30,31]
was applied that yielded the VFT-parameters (rightmost
solid line in Fig. 4) in a direct way.
The knowledge of the VFT-parameter nally allows us
to evaluate two other important quantities that character-
ize the glass transition: The steepness index m (fragility)
according to a denition by Bo hmer et al. [35] (Eq. (3)),
and the operationally dened glass transition temperature
by assuming s(T
g
) = 100 s.
m
d loghsi
dT
g
=T
TTg
E
V
2:303R
T
g
T
g
T
V
2
3
The resulting T
g
(a) values are displayed in Fig. 5 together
with the corresponding dilatometric data T
g
(dil) and the
steepness index (inset gure). All VFT-parameters are sum-
marized in Table 1.
From Figs. 4 and 5 we can make the following
observations:
2.0 2.5 3.0
1000/T [K
-1
]
-8
-6
-4
-2
0
2
l
o
g
(
[
s
]
)
8.7 nm
15 nm
20 nm
286 nm
T
g
(
=100s)
Fig. 4. Activation plot of the relaxation time s
a
determined from the peak
maxima in the dielectric loss e
00
(T) for a-PS lms of various thickness. The
lines represent ts according to the VFT equation. For the thinnest lm
(L = 8.7 nm), a two-dimensional t procedure of the e
00
(f, T) data to a HN-
VFT-function [30,31] was applied that yields the VFT-parameters (shown
as solid line) instead of discrete s
a
values.
5 10 100 500
L [nm]
40
50
60
70
80
90
100
T
[
C
]
T
g
(dil)
T
g
()
5 10 100 500
L [nm]
0
50
100
150
200
s
t
e
e
p
n
e
s
s
in
d
e
x
m
Fig. 5. Thickness dependence of the dilatometric glass transition temper-
ature T
g
(dil) (open circles) in comparison to T
g
(a) (lled triangles),
evaluated from the s
a
(T)-data. The dashed line is only a guide for the eyes.
The inset gure displays the corresponding thickness dependence of the
steepness index m.
V. Lupas cu et al. / Journal of Non-Crystalline Solids 352 (2006) 55945600 5597
1. The dielectric a process, which was detectable even in
the thinnest PS lms, shows a systematic speed-up
towards lower thicknesses.
2. While the entire cooperative dynamics is obviously
aected by a thickness reduction, no substantial changes
in the steepness index as seen from Fig. 5 can be noticed,
a nding which is in contradiction to earlier observa-
tions by other authors [14].
3. Comparing the dilatometric T
g
[T
g
(dil)] with the glass
transition values obtained from the VFT-parameters
[T
g
(a)] reveals a good agreement between the two quan-
tities for thicknesses above 20 nm, while there is an
increasing discrepancy between T
g
(dil) and T
g
(a) for
lms thinner than 20 nm. This discrepancy approaches
is maximum for the thinnest sample (L = 8.7 nm), that
exhibits a dierence by more than 15 C between the
dilatometric T
g
(61 C) and the T
g
(a) being 77 C.
Further inspection of the dielectric spectra of the sample
with the lowest thickness reveals another peculiar feature
that is clearly seen in Fig. 6. Here, the temperature depen-
dences of both the permittivity (left Figure) and the loss
(right gure) are displayed in isochronal representation
for four dierent frequencies between 0.7 Hz and 260 Hz.
Besides the a-relaxation being located around 100 C at
these frequencies, a second relaxation process shows up at
lower temperatures. This second relaxation process is char-
acterized by both a weaker intensity and lower thermal
activation than the a-process as indicated by the remark-
able peak shift within the frequency range displayed in
Fig. 6. In order to classify this new process the data were
analyzed in more detail, again by applying a two-dimen-
sional t procedure as mentioned before, based on loss
data of dierent frequencies and temperatures. The result
is given in Fig. 7 showing the temperature dependence of
Table 1
VFT-parameters and steepness index for all PS lm corresponding to
Fig. 5
L (nm) E
V
(kJ/mol) log s
1
T
V
(K) T
g
(s
a
= 100 s) (C) m
285 10.9 12.0 330.9 95.8 146
20 11.4 12.0 318.3 84.6 136
15 10.2 12.0 320.0 82.2 151
8.7 11.3 12.8 295.8 77.3 111
-50 0 50 100 150
T [C]
2.45
2.50
2.55
2.60
'
(
T
)
260 Hz
16 Hz
2.8 Hz
0.7Hz
-50 0 50 100 150
T [C]
0.00
0.01
0.02
0.03
"
K
K
(
T
)
[
s
]
)
285 nm
8.7 nm
8.7 nm
s
Fig. 7. Activation plot of the relaxation time data s
a
(T) of bulk PS
(L = 285 nm) together with s
a
(T) data obtained for the 8.7 nm thick
sample (cf. Fig. 6). The dashed curve represents a VFT-t to the bulk
data while the two solid curves show the temperature dependence of the a
and a
s
process of the ultrathin lm sample according the VFT or
Arrhenius law.
5598 V. Lupas cu et al. / Journal of Non-Crystalline Solids 352 (2006) 55945600
the a-process together with that of the new sub-T
g
process.
The s
a
(T)-data for the bulk like sample (L = 285 nm) are
given as a reference. As seen from the gure, the new pro-
cess clearly shows Arrhenius behavior (Eq. (4)), i.e. the
relaxation time obeys the equation for simple thermal
activated processes with the activation parameters
E
a
= 71 kJ/mol and s
1
= 10
12
s.
s s
1
exp
E
a
RT
4
4. Discussion
The results described in the previous section have dem-
onstrated the unique strength of dielectric techniques for
the study of ultra-thin PS lms: From a single experiment,
measuring the frequency-and temperature dependent com-
plex permittivity spectra e
*
(f, T), information is gathered
about both volume relaxation (thickness changes) and the
segmental dynamics in a wide frequency range. Though
both the dilatometric and the spectroscopic [s
a
(T)]
response contain specic information on the dynamic glass
transition, the two (sub)-experiments are performed simul-
taneously on the same sample, which is an essential advan-
tage over the common practice to compare experimental
results from dierent samples (geometry, preparation tech-
nique, thermal and solvent history, etc.) and dierent mea-
surement techniques. As a consequence, both the T
g
(dil)
and T
g
(a) values should coincide within the experimental
accuracy for thick, bulk-like PS samples, which is validated
by the results Fig. 5 for L > 20 nm.
Another main nding that deserves further discussion
(cf. Fig. 3) is the observation that the volumetric T
g
-reduc-
tions (from CD) resemble well the behavior known for
truly supported PS lms. Such agreement is not evident,
since both the lower and the upper aluminum electrodes
are in intimate contact with the polymer surface. However,
some authors discussed the possibility of partial delaminat-
ing of the polymermetal interface during the harsh depo-
sition process of the upper electrode onto the polymer lm
[36,37]. We think that the existence of dimensionally stable
blisters, which mimic a free surface on local scale, is
highly unlikely in view of the high polymer mobility above
T
g
and the strength of attractive dispersion forces across
the polymermetal gap. Anyhow, one should realize, that
the roughness of the two polymermetal interfaces within
the Al-polymer-Al sandwich samples might be quite dier-
ent. While the interfacial roughness of the lower alumi-
num electrode is in the range of 1.22 nm rms, the upper
electrode usually forms a much smoother interface
(0.5 nm rms) to the polymer lm, resulting in a priori
asymmetric lm boundary conditions.
Another potential source for asymmetry in the thin
polymer lm samples is the fact, that after spin-casting
onto the lower metal electrode, the lms were annealed
while they had a free upper surface. Subsequent deposition
of a weakly interacting metal like aluminum onto the PS
surface will probably not aect the once formed, specic
surface structure, which might govern the resulting T
g
-
reduction of the nal sandwich sample.
The most striking result of the present study is the appar-
ent divergence of the volumetric glass transition temperature
fromT
g
(a), derived fromthe relaxation time of the dielectric
a-process, for lms below20 nmin thickness. Such behavior
can be rationalized by basically two arguments:
1. Ultra-thin polymer lms exhibit a strong mobility gradi-
ent across the lm thickness that gives rise to a wide dis-
tribution in relaxation times of the cooperative
dynamics as manifested by an increasing peak width of
the a-process as well as in the broadened dilatometric
transition range. Since both responses average over the
mobility gradients in a dierent way, slight shifts in
the characteristic transition temperature are expected.
2. Though T
g
(dil) and T
g
(a) are deduced from the same
experimental data set, the characteristic frequency of
both quantities is dierent. While the equivalent fre-
quency of the CD-experiment is around 10
3
Hz,
depending on the eective sample cooling rate
(0.5 K/min) and the apparent activation energy of
the a-process, reliable dielectric relaxation data were
only available down to 1 Hz. However, to explain an
increasing discrepancy in the T
g
-values one needs to pos-
tulate a qualitative change in the temperature depen-
dence of the glass transition dynamics below 1 Hz, an
assumption that is not in agreement with previous
DRS studies on various ultra-thin polymer lms.
While a qualitative change in the VFT behavior of the
segmental dynamics is not a likely mechanism, we think
that the unusually low dilatometric glass transition temper-
ature, including its tremendous broadening, could be the
eect of a hidden, second relaxation process as we have
found for the 8.7 nm sample (Figs. 6 and 7). From the Acti-
vation parameters it was concluded that this additional
relaxation process refers to a non-cooperative molecular
motions, i.e. some local dynamics that do not involve
entropy uctuations. Since this relaxation process becomes
prominent in the thinnest PS lms, it is a straightforward
idea to assign this a
s
-process to the dynamics of a distinct
surface layer as suggested in recent publication [19]. As a
consequence, this surface layer, which does not contribute
to the cooperative a-process, has a faster dynamics than the
lm core layer at temperatures below the merging temper-
ature with the a-process (cf. Fig. 7).
Given the fact that surface and bulk dynamics manifest
themselves in two separate dielectric relaxation processes, it
is obvious that both dynamic processes should contribute
to the dilatometric response as well. We think that the tre-
mendous broadening and downshift of the expansivity
curves as measured by CD and other dilatometric tech-
niques might largely be the result of a superposition of a
distinct bulk-type dynamics with the specic response of
a structurally and dynamically distinct surface-near region.
V. Lupas cu et al. / Journal of Non-Crystalline Solids 352 (2006) 55945600 5599
5. Conclusions
The eect of lm thickness on the glass transition
dynamics in ultrathin polystyrene lms was investigated
by both dielectric spectroscopy, yielding direct kinetic
information about the segmental dynamics (a-process),
and capacitive dilatometry, probing the volumetric glass
transition upon cooling.
Systematic reductions in the dilatometric glass transition
temperatures, T
g
(dil), were found, which were slightly lar-
ger than those reported in earlier dielectric studies and
which resemble quantitatively T
g
-depressions known for
supported PS lms.
From the dielectric spectra, a systematic speed-up of the
a-process was found towards lower thicknesses, which was
accompanied by increasing broadening of the a-peak.
Despite the substantial shifts in the relaxation time, no
major changes in the fragility (or steepness index) were
found. Comparing the spectroscopic glass transition tem-
perature T
g
(a) = T(s
a
= 100 s) with the dilatometric glass
transition temperature reveals a good agreement between
T
g
(a) and T
g
(dil) for lms thicker than 20 nm, while below
20 nm both quantities diverge increasingly. A likely expla-
nation for this apparent discrepancy between volumetric
response and the temperature dependence of the coopera-
tive dynamics (a-process) is the presence of another, hid-
den, dynamic process as found for the thinnest lm in
this study (L = 8.7 nm). This new dielectric relaxation pro-
cess shows Arrhenius-behavior (E
a
72 kJ/mol), a pre-
exponential factor being typical for non-cooperative
dynamics (log[s
1
] = 12) and might be assigned to a dis-
tinct surface dynamics in polystyrene lms as discussed ear-
lier [14,19].
Acknowledgement
Veronica Lupas cu gratefully acknowledges the Dutch
Organization for Fundamental Research on Matter
(FOM) for founding this research project.
Appendix A. Supplementary data
Supplementary data associated with this article can be
found, in the online version, at doi:10.1016/j.jnoncrysol.
2006.09.004.
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