Fabrication and Doping Techniques for Optical Fibers

23/10/2011
Fabrication Techniques
Saturday 21st March

Various fabrication technique
Research in solution doping
Fibre fabrication technique
The Flat Fibre
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Thin film deposition process steps

In all steps, process monitoring is essential
Terminology
Thin film, thick film
Bulk sample
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Terminology
Bulk sample
More than 100s m thick
Notice the cracks
Terminology
Thin film, thick film
Core typically 5m, cladding typically 15-20m thick
Silica-on-silicon
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Deposition techniques
Thermal Oxidation
Sol Gel
Plasma Enhanced Chemical Vapour Deposition
Flame Hydrolysis Deposition
The Process
Deposition
Obtain blank sample
Channel
Definition
Incorporate circuitries/
waveguides
Obtain devices
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Channel definition techniques

Photolithography
Ion exchange
Femtosecond laser writing
Direct UV-writing
Thermal Oxidation
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Thermal Oxidation
The oxidation process is achieved by placing silicon wafers into a high
temperature and high pressure oxygen or water vapour environment
Typical operating temperatures vary and are within the regions of 700 1000C
The deposition rate is a function of the substrate temperature, ambient
pressure and reagent flow rate
Thermal Oxidation
The oxidation furnace
Use of silicon wafer stacks
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Thermal Oxidation
The oxidation furnace
Use of silicon wafer stacks
Sol Gel
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Sol Gel
This technique is based on the synthesis of glass via solution chemistry
In this case glass is formed not directly at high temperatures from a melt, but
at low temperatures (< 1200C) from suitable compounds by chemical
polymerisation in a liquid phase
In this way a gel is first formed from which glass may be obtained both by
gradual removal of liquid and densification through thermal treatment
(annealing/sintering)
Sol Gel
Its like making a jelly (yummy)
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Sol Gel
Sol gel mixing
Doesnt look so yummy
Sol Gel
Sol gel processing
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PECVD
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PECVD
PECVD utilises energy provided by RF or microwaves to dissociate the
reactants, creating high energy plasma that would then facilitate thin film
deposition
The main advantage of this technique is that depositions can be carried out at
low temperatures due to the additional energy provided by the plasma
PECVD
when oxygen is used:
SiH4 + O2 SiO2 + 2H2
when nitrous oxide is used as the oxygen source:

SiH4 + 2N2O SiO2 + 2H2 + 2N2; or
SiH4 + 4N2O SiO2 + 4N2 + 2H2O
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FHD
In flame hydrolysis deposition (FHD), vapour precursors are introduced in a
flame where they undergo chemical reactions to form soot particles which
are then collected on a planar substrate to form a low density porous
layer
The vapour precursor in this case is silicon tetrachloride (SiCl4)
The porous layer is then consolidated to form a dense glassy layer
This is achieved by heating the samples at temperatures exceeding 1200C
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FHD
FHD
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FHD
The chemical reactions taking place during FHD are as follow
Flame temperature 1200C (direct oxidation): SiCl4 + O2 SiO2 + 2Cl2
Flame temperature < 1200C (hydrolysis): SiCl4 + 2H2O SiO2 + 4HCl
advantages
Thermal Oxidation
Sol Gel
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disadvantages
Thermal Oxidation
Sol Gel
Research
Solution doping
To incorporate gain medium into standard glass samples
Monolithic integration
Doping = incorporation
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Deposition
FHD
The solution doping process
Semi-consolidate
Porous layer
Solution doping
Rare-earth/Bismuth
Fully consolidate
amplifier
Deposition
FHD
Semi-consolidate
Porous layer
Solution doping
Rare-earth/Bismuth
Fully consolidate
amplifier
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Deposition
FHD
Semi-consolidate
Porous layer
Solution doping
Rare-earth/Bismuth
Fully consolidate
amplifier
Bulk vs. thin film
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Deposition
FHD
The passive solution doping process

printer
Semi-consolidate
Porous layer
Solution doping
Rare-earth/Bismuth
Fully consolidate
amplifier
Deposition
FHD

printer
Semi-consolidate
Porous layer
Solution doping
Rare-earth/Bismuth
Fully consolidate
amplifier
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Deposition
FHD

sauna box
Semi-consolidate
Porous layer
Solution doping
Rare-earth/Bismuth
Fully consolidate
amplifier
We used potassium permanganate (KMNO4)

Visible
How to control the diffusion
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Additional findings
Ring effect
Graded index ring resonators

Photolithography
Ion exchange
Direct UV-writing
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Putting optical circuitries into the samples

Photolithography
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Photolithography
Multi-step process
Photolithography
UV photomask
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Photolithography
UV mask aligner and contact lithography
Photolithography
Plasma etching of glass
Etching = removal
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Ion exchange
Ion Exchange
The formation of a high refractive index region beneath a glass layer by
electrically induced migration of ions
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Ion Exchange
The formation of a high refractive index region beneath a glass layer by
electrically induced migration of ions
Ion Exchange
Actually a) is the waveguide and b) is waveguide with silver mirror
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Femtosecond laser writing is a recently-developed direct writing technique
that relies on ablation of the target substrate, causing the creation of
waveguide structures
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Femtosecond laser system

Femtosecond laser writing ablation profile
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Direct UV-writing
Direct UV writing
Direct UV writing (DUW) is a technique to define wave guiding channels on
photosensitive materials
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Direct UV writing
An illustration of (a) direct UV writing set up; (b) direct grating writing set up; (c) interference
pattern generated by the crossed beam; (d) photo of direct grating writing. (AOM: acoustooptic modulator).
Channel definition techniques advantages

Photolithography
Ion exchange
Direct UV-writing
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Channel definition techniques disadvantages

Photolithography
Ion exchange
Direct UV-writing
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Fabrication and Doping Techniques for Optical Fibers

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Fabrication and Doping Techniques for Optical Fibers

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23/10/2011

Saturday 21st March

Thin film deposition process steps

Channel definition techniques

when oxygen is used:

SiH4 + O2 SiO2 + 2H2

when nitrous oxide is used as the oxygen source:

The solution doping process

The solution doping process

The solution doping process

Bulk vs. thin film

The passive solution doping process

The passive solution doping process

The passive solution doping process

We used potassium permanganate (KMNO4)

Channel definition techniques

Channel definition techniques

Channel definition techniques

Channel definition techniques

Channel definition techniques

Femtosecond laser writing

Femtosecond laser writing

Femtosecond laser writing

Channel definition techniques

Channel definition techniques advantages

Channel definition techniques disadvantages

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