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Absorption
Fluorescence
Reflectivity
Claudia Gavrilescu
Product Manager
Introducing Rigaku
Since its inception in Japan in 1951, Rigaku has been at
the forefront of analytical and industrial instrumentation
technology. In fact, Rigaku means physical science in
Japanese, the core of instrumentation.
Rigaku Facts:
Over 1100 employees worldwide
Consolidated worldwide sales US$350M
Presence in 57 countries
Explicitly focused on X-ray technologies
Our expertise allows us to provide
complete X-ray analysis solutions we
make everything from X-ray sources, to
optics and detectors.
Rigaku group
Tokyo, Japan Rigaku Group Headquarters
Rigaku Corporation
R&D, Application Research Lab. Sales & Service
Three factories in Japan:
Tokyo for XRD and TA, Osaka for XRF
and Yamanashi for XRD, XRF
manufacturing
Berlin, Germany
Rigaku European Headquarters
Sales & Service
Beijing, China
Major offices
R&D
Manufacturing
Sales & Service
Major distributors
EIT
CCD
R&D and manufacturing
MAKE A
CHOICE....
Product areas
XRD
XRF
Cryogenics
SAXS
Optics
Automation
Detectors
Stress
Analysis
Protein
Crystallography
Small
Molecule
X-ray
Generators
Semiconductor
Ultima IV
SmartLab
Supermini The world's first high-powered bench top wavelength dispersive XRF
ZSX Primus/ZSX Primus II flexible ultra-high-performance
Primus II
Simultix14
CCD systems
- Saturn 724+ is the next generation of CCD camera
for small molecule crystallography
XtaLAB mini
- Mercury 2 affordable compact design, ideal compact CCD for small molecule
crystallography
X-ray generators
stability
Nanohunter
The X-ray absorption spectrum can be divided into near edge and extended fine
structure.
Features:
Both transmission and fluorescence measurements are possible.
Ca to U measurements capabilities for both opaque and transparent
samples with little sample preparations
Horizontal or vertical sample mounting.
Applications:
EXAFS (Extended X-ray absorption fine structure)
Coordination environment
Bond lengths
Local disorder
Valence state
- MFM65 for metal film monitor - Integrates EDXRF & XRR in one tool (300 mm)
WaferX 300 for thickness & composition
WDXRF for high resolution & throughput (300 mm)
X-ray diffraction (XRD) and associated techniques are primary tools for the
nanotechnology researcher.
X-ray reflectometry (XRR) determines layer thickness, roughness, and density for
amorphous and/or crystalline materials.
High-resolution X-ray diffraction can measure layer thickness, roughness, chemical
composition, lattice spacing, relaxation and more (single crystal).
Si
Si (substrate)
TM
Al2O3 : 44%
ZnO : 20%
MgO : 36%
2 (deg.)
XG
DS
SS
RS
Detector
PSA
DS
Detector
Mirror
Sample
Sample
Cause of
Flat sample
systematic errors Axial divergence
Sample absorption
Sample displacement
Calibration
Internal (preferred)
Intensity
High
Good for
Indentification of trace
phases
Axial divergence
External
Medium
Identification of sample with
curvature/rough surface
Structure refinement
In-situ measurements
Sample preparation
12000
5000
10000
4000
Intensity ( CPS )
Intensity ( CPS )
PB
8000
6000
4000
3000
2000
1000
2000
0
30
40
50
2 ( deg. )
60
30
40
50
2 ( deg. )
60
Preferred orientation
PB
Packed
Loose
10000
8000
8000
009
6000
4000
2000
0
Intensity ( CPS )
Intensity ( CPS )
003 006
10000
6000
4000
2000
0
-2000
-2000
-4000
-4000
5
10 15 20 25 30 35 40 45 50
2 ( deg. )
10 15 20 25 30 35 40 45 50
2 ( deg. )
Intensity ( a.u. )
8000
6000
4000
2000
0
10
20
30
22 (deg.)
( deg. )
40
50
60
Multilayer mirror
Sample
Bragg-Brentano focusing geometry (BB)
Sample
Parallel beam geometry (PB)
Optics
Bragg-Brentano focusing
Phase id, crystal structure, etc.
for powders
Parallel beam
Phase id, crystal structure, etc.
for thin films
Ge 2-bounce
Crystal structure, film thickness, etc.
for imperfect crystals
High resolution / triple-axis
Crystal structure, film thickness, etc.
for highly perfect crystals
In-plane geometry
Depth controlled phase id, etc.
for ultra thin films
Nano materials
SAXS with x-ray mirror
Thin films
Triple axis
Ge 4-bounce
Ge 2-bounce
Powder / bulk
Powder
C
B
Bragg-Brentano focusing
USAXS
Challenge for Large Particle Size Determination
U-SAXS (Ultra SAXS)
Light Scattering
Small-Angle
XS
A
X-ray ScatteringS
XS Ultra Small-Angle
A
US
X-ray Scattering
10m
1m
100nm 10nm
1nm
0.1nm
USAXS
Challenge for Large Particle Size Determination
U-SAXS (Ultra SAXS)
USAXS
target
rotating
filament
window
target
USAXS
Challenge for Large Particle Size Determination
U-SAXS (Ultra SAXS)
Slit3
X-ray source
Slit1
Sample
Z axis
Multilayer Ge(220) Height limit slit
mirror
Slit2
Ge(220)
Detector
Attenuator
*Custom-order geometry
USAXS
Small angle resolution
(cps)
3.0x10
2.5x108
SAXS
10 mm HLS
USAXS
2 mm HLS
2.0x108
1.5x108
q=0.0023 nm-1
1.0x108
5.0x107
0
-0.1
0.05
0
q(1/nm)
0.05
0.1
USAXS
Colloidal silica USAXS
(cps)
106
10
103
USAXS Profile
200nm
750nm
104
102
101
100
0.02
sample
0.042
0.062
q(1/nm)
0.082
USAXS
Light scattering
average
average
200nm
193
198
750nm
728
747
In-Plane
XRD
Whats
in-plane XRD ?
In Plane
Diffracted X-ray
Incidence X-ray
Out of Plane
X-ray
In-Plane
XRD3-dimensional
structure analysis
PB/out
Pentacene 50nm
PB/in
Pentacene 50nm
50 x 10
Out-of-plane
90
In-plane
Intensity ( CPS )
Intensity ( CPS )
40
30
20
60
30
10
0
0
5
10 15 20 25 30 35 40 45 50 55 60
2 ( deg. )
10 15 20 25 30 35 40 45 50 55 60
2 ( deg. )
In-Plane
XRD
1
1000
0.1
0.01
100
0.001
10
0.0001
0.0
0.2
0.4
0.6
0.8
1.0
In-Plane
XRD
Example 1
CVD-Al layer for wiring
250
Intensity (cps)
Glancing Angle
0.2 degree
0.5 degree
Al(111)
200
150
Al+Cu
100
Al+Cu
Cu(111)
Cu(200)
50
Al(220)
Al(311)
Cu(220)
Al(222)
Cu
SiO2
Si (substrate)
0
30
40
50
60
70
80
2 / (degree)
+
+ In-Plane
Ta
In-Plane
XRD
Example 2
Ag cap
FePt
Glass sub.
+ In-Plane
In-Plane
XRD
Example 2
Ag 0 nm
Intensity [a.u.]
4500
Ag 0.25 nm
4000
Ag 0.5nm
3500
Ag 1.0nm
3000
2500
2000
There is no specific
observation from Ag
cap layer.
1500
1000
500
0
20
30
40
50
60
70
80
In-Plane
Example
3
XRD
Evaluation of FePt magnetic thin film
FePt expected as a high density magnetic recording
media
Ag cap 1nm
20
FePt (fcc
fct)
Ag(111)
FePt (fct)
with Ag cap
no Ag cap
30
40
50
60
70
80
+ In-Plane
In-Plane
XRD
rotation
axis
Diffraction X-ray
Sample
Sample is inclined so
sample is not kept
horizontally.
axis
In-Plane
XRD
rotation
axis
Path of Incident
optics
Path of
detector
10mm
Incident X-ray
Beam width
1.0mm
Incident X-ray
Diffracted X-ray
2
Receiving slit
2.0mm 20mm or
Parallel Slit Analyzer
Detector
Parallel Slit
Analyzer
Method?
?
Optics ?
?
Crystal structure
Dielectric film
Texture
Compound
semiconductor
Crystallinity
Magnetic film
Thickness
Single crystal
wafer
Particle / pore
size
Crystal structure
Texture
Compound
semiconductor
Crystallinity
Magnetic film
Thickness
Single crystal
wafer
Particle / pore
size
Selecting application
Select application
Sample alignment
SmartLab
5 simple parameters
Sample alignment
SmartLab
5 simple parameters
Manual setting
35 parameters
Maximum flexibility
Marks
Setting up optics
SmartLab
Measurement
Automatic alignment
Source height
Incident beam
direction
Mirror angle
Divergence slit height
Sample height
2 zero point
Detector setting