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Foil # 1
Agenda
Designing with power and energy limits
Overview of VLSI power
Technology, Scaling, and Power
Review of scaling
A look at the real trends and projections for the future
Active power components, trends, managing active power
Static power components, trends, managing static power
Summary
Foil # 2
package cost (4-5W limit for cheap plastic package, 100W/sq-cm air cooled
limit, 7.5kW 19 rack)
Distribution limits
-
Higher current => lower R, greater dI/dt => more wire, decap
Energy cost
- Energy for IT equipment large fraction of total cost of ownership
Foil # 3
Agenda
Designing with power and energy limits
Overview of VLSI power
Technology, Scaling, and Power
Review of scaling
A look at the real trends and projections for the future
Active power components, trends, managing active power
Static power components, trends, managing active power
Summary
Foil # 4
Foil # 5
Agenda
Designing with power and energy limits
Overview of VLSI power
Technology, Scaling, and Power
Review of scaling
A look at the real trends and projections for the future
Active power components, trends, managing active power
Static power components, trends, managing active power
Summary
Foil # 6
<1
gate
gate
Tox
drain
source
source
Tox
drain
L
L
Parameter
Value
Scaled Value
Dimensions
L, W, Tox
L, W, Tox
Dopant concentrations
Na, Nd
Na/, Nd/
Voltage
Field
Capacitance
Current
Propagation time
(~CV/I)
Power (VI)
2P
Density
d/2
Power density
P/A
P/A
What about
Deltas?
Foil # 7
Agenda
Designing with power and energy limits
Overview of VLSI power
Technology, Scaling, and Power
Review of scaling
A look at the real trends and projections for the future
Active power components, trends, managing active power
Static power components, trends, managing active power
Summary
Foil # 8
Td = kCV/I
= kCV/(Vdd-Vt)
Sakuri -power law model of delay
Foil # 9
Consistent with
C.F. Scaling
Td = kCV/I
= kCV/(Vdd-Vt)
Foil # 10
Microprocessor Frequency
In practice the trend is:
Frequency increasing by 2X (delay decreasing by 50%),
not the 1.4X (30%) for constant field scaling (src: ITRS 01).
Why? decreasing logic/stage and increased pipeline depth.
Intel 32b (after Hrishikesh, et. al)
35
90
30
80
25
60
20
50
40
15
30
10
20
period (ns)
Fo4/cycle
70
cycle in FO4
Period
10
0
0
0.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
0
1.1
technology
Foil # 11
Dynamic Energy
"
"
dVout
dt
dt
Vdd
EVdd = C LVdd
out
Vout = 0
"
Ec =
! dV
= CLVdd
"
iCL (t )Vout dt = ! C L
t =0
dVout
Vout dt
dt
iVdd
Vout
CL
Vdd
Ec = C L
1
2
V
dV
=
C
V
out
out
L dd
!
2
Vout = 0
Foil # 12
2
1.5
1
0.5
0
0.25m
0.18m
0.13m
90nm
65nm
45nm
Foil # 13
Power (W)
250
200
150
100
160
140
120
100
80
60
40
20
Technology
Foil # 14
Voltage minimization
(Dynamic) voltage-scaling
Low swing signaling
SOC/Accelerators
Frequency minimization
(Dynamic) frequency-scaling
SOC/Accelerators
Foil # 15
Capacitance minimization
P = CswVdd V f + IstVdd + IstaticVdd
Only the devices (device width) used in the design
consume active power!
Runs counter to the complexity-for-IPC trend
Runs counter to the SOC trend
Foil # 16
Capacitance minimization
Example of managing design capacitance:
Device sizing for power efficiency is significantly different than
sizing for performance sizing of the gate size multiplier in an
exponential-horn of inverters.
Metric
100
.D
y
rg
e
n
E
10
rg
e
n
E
la
e
D
r
e
n
E
1
0
10
Multiplier k
HOT Chips 2005 Power Tutorial
Foil # 17
Foil # 18
Glitch suppression
P = CswVdd V f + IstVdd + IstaticVdd
Foil # 19
Voltage minimization
P = CswVdd V f + IstVdd + IstaticVdd
Foil # 20
5
4.5
4
3.5
Thresholds tend to be too high at
3
low supply
2.5
2
Voltage Scaling Benefits
1.5
Can be used widely over entire
1
chip
0.5
Complementary CMOS scales well
0
1.2
1
0.8
a-pwr delay
0.6
meas delay
0.4
meas pwr
model pwr
0.2
0
0.7
0.95
1.2
1.45
1.7
Supply Voltage
Foil # 21
400
500
Measured Freq
Measured Power
400
300
300
200
200
100
100
0
1
1.2
1.4
1.6
1.8
Power (mW)
Frequency (MHz)
500
After Nowka,
et.al. ISSCC, Feb 02
Foil # 22
Frequency minimization
P = CswVdd V f + IstVdd + IstaticVdd
Foil # 23
Voltage-Frequency-Scaling Measurements
PowerPC 405LP
Freq
Scaling
Plus DVS
Shoot-through minimization
P = CswVdd V f + IstVdd + IstaticVdd
Foil # 25
Agenda
Designing with power and energy limits
Overview of VLSI power
Technology, Scaling, and Power
Review of scaling
A look at the real trends and projections for the future
Active power components, trends, managing active power
Static power components, trends, managing active power
Summary
Foil # 26
Static Power
P = CswVdd V f + IstVdd + IstaticVdd
Foil # 27
Subthreshold Leakage
P = KVe(Vgs-Vt)q/nkT (1 e Vds q/kT)
Foil # 28
nA/um
1000
100
10
1
2003
2004
2005
2006
2007
2008
2001 prediction
2009
2010
2011
2012
2013
2003 prediction
Foil # 29
Power Density
(W/sq cm)
Leakage trend
1000
10
0.1
0.001
0.00001
1000
100
10
Lpoly (nm)
Src: Nowak, et al.
Foil # 30
Gate Leakage
Reduction techniques:
Lower the field (voltage or oxide thickness)
New gate ox material
Foil # 31
Power (W/cm2)
Lpoly (m)
After Nowak, et al.
Foil # 32
Power (nW)
150
100
50
0
160
140
120
100
80
60
40
20
Technology
Src: ITRS 01
Foil # 33
Foil # 34
Capacitance minimization
Only the devices (device width) used in the design leak!
Runs counter to the complexity-for-IPC trend
Runs counter to the SOC trend
Transistors are not free -- Even though they are not
switched they still leak
Foil # 35
2
Logic leakage w/VCO inactive
1.5
1
0.5
0
0.8
1.2
1.4
1.6
Logic Voltage(V)
1.8
Foil # 36
Supply/Power Gating
Foil # 37
MTCMOS
B
A
Xb
A
Standby
headers/
footers
Xb
Foil # 38
Vt / Tox selection
Xb
Low
threshold/
Thin oxide
Xb
Hi
threshold/
Thicker
oxide
Foil # 39
Device Stacking
Xb
Xb
X
Stacked
devices
Foil # 40
Design tradeoff:
Performance => High supply, low threshold
Active Power => Low supply, low threshold
Standby => Low supply, high threshold
Static
Stack effect minimizing subthreshold thru single fet paths
Multiple thresholds: High Vt and Low Vt transistors
Multiple supplies: high and low Vdd
Foil # 41
Design tradeoff:
Performance => High supply, low threshold
Active Power => Low supply, low threshold
Standby => Low supply, high threshold
Static
Foil # 42
3.3V
GP
GN
Switch
Cell
1.8V
Logic
Vbp
1.8V
VDD
1.8V
GND
0V
Vbn
0V
Switch
Cell
-1.5V
HOT Chips 2005 Power Tutorial
Foil # 43
+
VDD+VB
uP Core
Leakpfet
Vbp
VDD
VDD
VDD
VB
Leaknfet
VSS
0V
GND
0V
Foil # 44
Agenda
Designing with power and energy limits
Overview of VLSI power
Technology, Scaling, and Power
Review of scaling
A look at the real trends and projections for the future
Active power components, trends, managing active power
Static power components, trends, managing active power
Summary
Foil # 45
supporting low V,
Foil # 46
References
Metrics
--
T. Sakurai and A. Newton, Alpha-power law MOSFET model and its applications to CMOS inverter delay
and other formulas, IEEE Journal of Solid State Circuits, v. 25.2, pp. 584-594, Apr. 1990.
R. Gonzalez, B. Gordon, M. Horowitz, Supply and threshold voltage scaling for low power CMOS IEEE
Journal of Solid State Circuits, v. 32, no. 8, pp. 1210-1216, August 2000.
Zyuban and Strenski, Unied Methodology for Resolving Power-Performance Tradeoffs at the
Microarchitectural and Circuit Levels,ISPLED Aug.2002
Brodersen, Horowitz, Markovic, Nikolic, Stojanovic Methods for True Power Minimization, ICCAD Nov.
2002
Stojanovic, Markovic, Nikolic, Horowitz, Brodersen, Energy-Delay Tradoffs in Combinational Logic
using Gate Sizing and Supply Voltage Optimization, ESSCIRC, Sep. 2002
Power/Low Power
Foil # 47
References
E. Vittoz, Low-power design: ways to approach the limits IEEE International Solid State
Circuits Conference Digest of Technical Pap ers, pp. 14-18, 1994.
M. Horowitz, T. Indermaur, R. Gonzalez, Low-power digital design IEEE Symp osium
on Low Power Electronics Digest of Technical Pap ers, pp. 8-11, 1994.
R. Gonzalez, B. Gordon, M. Horowitz, Supply and threshold voltage scaling for low
power CMOS IEEE Journal of Solid State Circuits, v. 32, no. 8, pp. 1210-1216, August
2000.
T. Burd and R. Brodersen, Energy efcient CMOS microprocessor design
Proceedings of the Twenty-Eighth Hawaii International Conference on System Sciences,
v. 1, pp. 288-297, 466, 1995.
K. Suzuki, S. Mita, T. Fujita, F. Yamane, F. Sano, A. Chiba, Y. Watanabe, K. Matsuda, T.
Maeda, T. Kuroda, A 300 MIPS/W RISC core processor with variable supply-voltage
scheme in variable threshold-voltage CMOS Proceedings of the IEEE Conference on
Custom Integrated Circuits Conference , pp. 587 590, 1997
T. Kuroda, K. Suzuki, S. Mita, T. Fujita, F. Yamane, F. Sano, A. Chiba, Y. Watanabe, K.
Matsuda, T. Maeda, T. Sakurai, T. Furuyama, Variable supply-voltage scheme for lowpower high-speed CMOS digital design IEEE Journal of Solid State Circuits, v. 33, no.
3, pp. 454-462, March 1998.
T. Burd, T. Pering, A. Stratakos,
R. Brodersen, A dynamic voltage scaled
microprocessor system IEEE International Solid State Circuits Conference Digest of
Technical Pap ers, pp. 294-295, 466, 2000.
Foil # 48
References
Foil # 49