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IS 15422 (2003): Geometrical Product Specifications (GPS) Surface Texture: Profile Method - Motif Parameters [PGD 25:
Engineering Metrology]

! $ ' +-
Satyanarayan Gangaram Pitroda

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IS 15422:2003
M) 12085:1996

iF51-s$FT
-wG-fa-4mt3m
Indian Standard

GEOIVIETRICAL PRODUCT SPECIFICATIONS


(GPS)SURFACE
TEXTURE: PROFILE lVIETHOD
MOTIF PARAIvIE--I tHS-

ICS

17.040.20

(3 B!S 2003

BUREAU
MANAK

December

2003

OF
BHAVAN,

INDIAN

9 BAHADUR
NEW
DELHI

STANDARDS
SHAH
110002

ZAFAR

MARG

Price Group

Engineering

NATIONAL

Metrology

Sectional Committee,

BP 25

FOREWORD

This Indian Standard which is identical with ISO 12085:1996 Geometrical Product Specification (GPS)
Surface texture: Profile method Motif parameters issued by the International Organization
for
Standardization
(ISO) was adopted by the Bureau of Indian Standards on the recommendations
of the
Engineering Metrology Sectional Committee and approval of the Basic and Production Engineering Division
Council.
This standard defines terms and parameters used for determining surface texture by the motif method. It
also describes the corresponding ideal operator and measuring conditions. The approach described in
this standard facilitates the determining roughness and waviness parameters from the primary profile by
finding those motifs that characterize the surface under consideration.
This method is independent of
any profile filter and results in parameters which are based on the depth and spacing of the motifs.
The text of the ISO Standard has been approved as suitable for publication as an Indian Standard without
deviations.
In this adopted standard certain conventions are, however, not identical to those used in
Indian Standards. Attention is particularly drawn to the following:
a)

Wherever the words International


be read as Indian Standard.

b)

Comma (,) has been used as a decimal marker in the International Standards,
Inaian Standards, the current practice is to use a point (.) as the decimal marker.

Technical Corrigendum

Standard appear referring to this standard,

1 to the above International

they should

while in

Standard has been incorporated.

In this adopted standard, reference appears to certain International Standards for which Indian Standards
also exist. The corresponding
Indian Standards which are to be substituted in their places are listed
below along with their degree of equivalence for the editions indicated:
international

Standard

Corresponding

Indian

Standard

Degree

of

Equivalence

Identical with
ISO 1302:1978

ISO 1302 : 1992 Technical


drawings Method of indicating
surface texture

IS 10719 : 1983 Method of indicating


surface texture on technical drawings

ISO 3274 : 1996 Geometrical


Product Specifications
(GPS)
Surtace texture : Profile method
Nominal
characteristics
of
contact (stylus) instruments

IS 15261 : 2002 Geometrical


Product
Specifications
(GPS) Surface texture :
Profile method Nominal characteristics of
contact (stylus) instruments

Identical

ISO 4287 : 1996 Geometrical


Product Specifications
(GPS)
Surface texture: Profile method
Terms, definitions and parameters
of surface texture

IS 15262 : 2002 Geometrical


Product
Specifications
(GPS) Surface textu~e :
Profile methodTerms,
definitions and
surface texture parameters

do

ISO 4288 : 1996 Geometrical


Product Specifications
(GPS)
Surface texture: Profile method
Rules and procedures
for the
assessment of surface texture

IS 15263 : 2002 Geometrical


Product
Specifications
(GPS) Surface texture :
Profile method Rules and procedures for

do

the assessment

of surface texture

IS 15422:2003
ISO 12085:1996

Scope

This International Standard defines terms and parameters used for determining surface texture by the motif
method. it also describes the corresponding ideal operator and measuring conditions.

Normative

references

The following standards contain provisions which, through reference in this text, constitute provisions of this international Standard. At the time of publication, the editions indicated were valid. All standards are subject to revision,
and parties to agreements based on this International Standard are encouraged to investigate the possibility of applying the most recent editions of the standards indicated below. Members of IEC and ISO maintain registers of
currently valid International Standards.
ISO 1302:1992,

Technical drawings

Method

of indicating

surface texture.

ISO 3274:1996, Geometrical Product Specifications


istics of contact (stylus) instruments.

(GPS) Surface texture: Profile method

iS0 4287:1997,
and parameters

(GPS) Surface texture.. Profile method Terms, definitions

Geometrical
product
of surface texture.

specifications

ISO 4288:1996,
Geometrical Product Specifications
cedtires for the assessment of surface texture.

(GPS) Surface

texture:

Definitions

For the purposes of this International

3.1
3.1.1

Standard the following

General definitions
surface profile: (See ISO 4287.)

3.1.2 primary profile

(See ISO 3274.)

definitions

apply.

Profile

Nominal

character-

method Rules and pro-

IS 15422 :200~
ISO 12085:1996
local peak of profile: A part of a profile between

3.1.3

two adjacent minima of the profile (see figure 1).


-

Local peak of the profile

Figure 1 Local peak of profile

local valley of profile: A part of a profile between

3.1.4

two adjacent maxima of the profile (see figure 2).

Local valley of the profile

Figure 2 Local valley of profile


3.1.5 motif: A portion of the primary profile between
are not necessarily adjacent.
A motif is characterized

the highest points of two local peaks of the profile, which

by (see figures 3 and 5):

its length, ARi or AWi, measured parallel to the general direction of the profile;

its two depths, Hi and Hi+ 1, or HWj and HWj+ I, measured perpendicular

to the 9eneral direction

profile;

its T characteristic,

that is the smallest depth between

the two depths.

T= MINIH,:H,.,1
here: T = H,. ,

Figure 3 Roughness motif

3.1.6 roughness motif: Motif derived by using the ideal operator with limit value A (see figure 3).
NOTE

By this definition,

a roughness

motif

has a length

Al/j

smaller

than

or equal

to

A.

of the PrimarY

IS
ISO

15422:2003
12085:1996

3.1.7 upper envelope line of the primary profi-le(waviness profile): Straight lines joining the highest points of
peaks of the primary profile, after conventional discrimination of peaks (see figure 4),
Upper enve[ope line

Figure 4 Upper envelope line

3.1.8 waviness motif Motif derived on the upper envelope


figure 5).

..

line by using the ideal operator with limit value B (see

Upper envelope

line
?

.
(J

A W,

T =MINIHw,:
Hw, .,]
here: T = Hwj. ,

Figure 5 Waviness motif

3.2 Parameter definitions


3.2.1 mean spacing of roughness motifs, AR: The arithmetical
tifs, within the evaluation length (see figure 6), i.e.

mean value of the lengths ARi of roughness

mo-

AR=~~ARi
n, ,=1
where n is the number of roughness

motifs (equal to the number of ARi values).

3.2.2 mean depth of roughness motifs, R: The arithmetical


within the evaluation length (see figure 6), i.e.

mean value of the depths Hj of roughness

motifs,

R.+Hj
m

j=l

where m is the number of Hj values


NOTE

3.2.3

The number

of Hj values

is twice

the number

of ARi values

(m = 2n)

maximum depth of profileirregularity, Rx: The largest depth, Hj, within the evaluation

length.

EXAMPLE
On figure 6: Rx = H3,

IS 15422:2003
ISO 12085:1996

Figure 6 Roughness parameters

3.2.4 mean spacing of waviness motifs, AIW The arithmetical


tifs, within the evaluation length (see figure 7), i.e.
AW=~~AWi
n
where

mean value of the lengths AWi of waviness

mo-

id

n is the number of waviness

motifs (equal to the number of AWi values).

3.2.5
mean depth of waviness motifs, w The arithmetical
within the evaluation length (see figure 7), i.e.

W=~~

mean value of the depths HWj of waviness motifs,

Hwj

j=l

where m is the number of Hwj values:


NOTE 3 The number of Hwj values is twice the number of AWi values (m = 2rz).
3.2.6

maximum depth of waviness, Wx: The largest depth Hwj, within the evaluation

length (see figure 7)

3.2.7 total depth of waviness, Wte: The distance, measured in a direction perpendicular to the general direction
of the primary profile, between the highest point and the lowest point of the upper envelope line of the primary
profile (see figure 7).

z
2,5 @

L-.---x

S00pm

Figure 7 Waviness parameters

IS
ISO

Theoretically

4.1

12085:1996

exact operator of the motif method

Generai

This clause describes


process for calculating

4.2

15422:2003

the identification
conditions of motifs
roughness and waviness parameters.

(length and depth

discrimination)

and presents

the

Conventions! limits of motifs


values for limits A and B as described in figure 8 are given under clause 5.

The recommended
0.

spacing s ,4
L4

b) Waviness motifs

.a) Roughness mctlfs

Figure 8 Conventional limits of motifs

4.3

Depth discrimination

The depth discri,nination


4.3.1

applies to the primary profile for the assessment

of surface roughness.

Discrimination based on minimum depth

Divide the primary profile into sections of width A/2, and take the height of each rectangle.
The local peaks taken into account
tangles (see figure 9).

~Local
peak retained
{example)

are those whose

L--

depth is larger than 5 % of the mean height

Local peak reJected

L-

Height Of

of these

rec-

this rectan91e

(example)

!-

Figure 9 Depth discrimination

IS 15422:2003
ISO 12085:1996
4.3.2

Discrimination

based on maximum

depth

For the roughness motifs the depths of which are Hjt the value ~j

(mean value of Hj) and ~Hj (standard devi-

ation) are calculated. Any depth of local peak or valley the value of which is larger than H = Hj + 1,65 ~Hj, is levelled equal to the H value (see figure 10).
NOTE 4 If the distribution of Hj is Gaussian, this condition concerns 5
the risk of high isolated peaks Interfering with the envelope line,

V.

of the peaks and valleys, This discrimination obviates

~-
1
f
I
!
1
t

Figure 10 Discrimination

based on maximum

depth

IS
!S0

(Blank page)

15422:2003
12085:1996

IS 15422:2003
ISO 12085:
1996
4.4

Identification of roughness and waviness motifs through the combination of motifs

(These four conditions

are related to figure 11.) In figure 11, R stands for roughness

and W for waviness.

Envelope condition

The first condition

II

retains peaks, which are higher than one of the adjacent peaks.

Length condition

The second condition limits the length of motif to the A value (conventional limit between roughness
or the B value (conventional limit between waviness and residual form!, as defined in 4.2 and 5.2.

Ill

and waviness)

Enlargement condition

The third condition

eliminates

the smallest peaks, by trying to find the largest motif possible.

It does not allow the combining of two motifs into one motif, longer than the two original ones, if it results in a motif the T characteristic of which is smaller than one of the two original motifs.
(It eliminates small peaks which are inserted between large peaks.)

IV

Similar depth condition

The fourth condition


(It avoids eliminating

The combination

limits combination of motifs with similar depths, particularly for periodical surfaces.
peaks the depth of which is similar to adjacent peaks.)

algorithm

shall be applied until no further combination

can be accomplished

IS

15422:2003

ISO

NOcombination

Condltlons

Possible combination

P,

II

Examination of motif i and


motif i + 1

P?
PJ

Condltlon I
I--_______;

P,.

P2and

P3

.
I

Aor

,---_______J

Common peak z one of


the adjacent peaks

P,5P70r

, Aor

AR; .,

\
/ AWj

P3

YES

or

/ AR,
or

PJ.
P,
P2

I
&

12085:1996

IARj
Iorl
;@IAW,
_______

Ai#, .ql
,LJ

L-_---__;

(AR, +ARj.,).
A(for R)
(A W,+ AW, .,). B(for W)

(ARi+Af?j

I
I
J

AR,+,
or
AWi.,

.q)s A(for

R)

(A Wi+AWj.,ls8(for

NO

W)

YES

;;LL

II

Condition Ill

T,

L---

T.

T2

___a

T,or

T2 \
T! ~d
: T,
1--- _____l

Enlargement of the T
characteristic
of both motifs

T2

T ? T, and T2

No

YES

H,. ,and H,.2.60%T(for


Hw,,, and Hw,.2 .60A

R)
T(for W)

One of the depths s 60 % of


the T characteristic
of the
motif under consideration

NO

YES

Hj+, or Hj+z=60%T(for
Hw,., or Hwj.2s60%T(for

R)
W)
I

~
Combine the two motifs and test
if two other motifs are availab~e

Test if one other motif is available

t
NO]

NO

End of this combination

sequence

Figure 11 Combination of motifs

I
I

YES

IS 15422:2003
ISO 12085:1996

4.5

Procedure for parameter calculation

Primary profile
I
v
Elimination

of small local peaks

[Figure 12 a)]

Seeking all peaks and valleys which define individual roughness

motifs

w
Combination of individual roughness motifs two by two over the whole profile, in order to find motifs as large as
[Figure 12 b)]
possible which comply with the four conditions

[Figure 12 c)]

Calculation of RX3)

+
Correction

of individual

peaks and valleys the depth of which is greater than H = =j + 1,65~Hj

These depths are levelled equal to H

*
Calculation of R

and AR 1,3,

Corrected

upper envelope

[Figure 12 d)]

line

I
*
On this line: seeking all peaks and valleys which

define

individual

waviness

motifs

Combination of individual waviness


with the four conditions

motifs two by two, in order to find motifs as large as possible which comply

calculation

1) R and AR parameters

are calculated

2)

W and

3)

If there are less than three motifs,

10

AW parameters

of

W, A W2) WX and Wt. 3,

for at least three motifs.

are calculated

for at least three motifs,

RX, m Wx, is calculated.

[Figure 12 e)]

IS 15422:2003
ISO 12085:1996
z
I
2 pm

Combination
of motifs

1
1

L.x

500 ~m

).;+;r.,**.
~@

5W
a) Primary

prdila
Primary profile
Roughness peaks

Roughness motifs

b) Roughness

motifs superimposed

Roughness valleys
on primary profile

.,

d
/

-.
iC) Roughnaas

Calculation

of Hj and AR;

motifs

1
Corrected

upper envelope

line

.=

d) Wavineas

profila

superimposed

profile
Waviness peak

on primary

r
Waviness motifs

Corrected upper
envelope line

Waviness valley
e) Waviness

motifs superimposed

on waviness

profile

Figure 12 Illustration of procedure for parameter calculation

11

IS

15422:2003

ISO

12085:1996

Measuring

5.1

Convention

conditions

concerning traversing the primary profile

In order to calculate waviness


ISO 3274).

5.2

of parameters

parameters,

the primary profile shall be measured

measurement

conditions

(see ISO 3274) are stated in table 1.


Table

mm

Evaluation
length
mm

as
.~m

Maximumstylus
tip raclhs
pm

0,02

0,1

0,64

0,64

2,5

2 & 0,5

0,1

0,5

3,2

3,2

2,5

2 k 0,5

0,5

2,5

16

16

5*1

2,5

12,5

80

80

25

10*2

El)

mm

specified,

the default values shall be A = 0,5 mm and B = 2,5 mm, respectively.

Profile quantization step

The parameters covered


quantization steps.

by this standard are only valid if the primary profile contains a minimum

of 150 vertical

Rule for acceptance

The 16

5.5

Traversing
length
mm

Al)

1) If not otherwise

5.4

guide (see

Recommended measurement conditions

The recommended

5.3

relative to a reference

?4.

rule given in ISO 4288 applies for motif parameters.

Use of motifs method for analysis of multiprocess surfaces

The corrected upper envelope line can be used as an alternative to the filter defined in ISO 13565-1, for the assessment of parameters Rk, Rpk and Rvk defined in ISO 13565-2. In this case, these parameters are named Rke,
Rpke and Rvke.

5.6

Indications on the drawings

The motif parameters

12

are specified on the drawings according to ISO 1302.

IS 15422:2003
ISO 12085:1996

Annex A
(normative)
Calculation method for combination of motifs
lnorder tohavereproducible
results with existing apparatus,
applied in the software (see figure Al).

the method

of calculation

given inA.1

to A.3shalibe

A.1 Profile decomposition in segments, the length of which is smaller than or equal
to A for roughness and B for waviness (A and B values in 5,2)
Find two peaks Pi, Pi+ 1 satisfying

the folIowing

conditions:

the horizontal distance between

this horizontal distance is smaller than or equal to A or B (see table 1);

there is no peak between

them, higher than either of them.

The part of the profile comprised

A.2

these two peaks is maximum;

between

these two peaks is called segment.

Motif combination inside each segment

Inside each segment, the three conditions 1, Ill, IV of 4,4 are successively tested on each pair of motifs.
bination of two individual motifs is only possible if these three conditions are fulfilled.
For condition
(T= minimum

The com-

IV, the minimum (Ffj + 1, Hj + z) is compared to 60 O/. of the vertical reference T of the segment
of the two heights hl, hz of the segment) and not to that of the possible combined motif.

When all individual motifs inside the segment have been successively tested, the combination operation
formed again from the beginning of the segment until no combination is possible inside this segment,
The following

A.3

segments

are then examined

is per-

in the same manner

Combination over the whole profile

All motifs resulting from the previous step are combined two by two over the whole profile. For each pair of motifs,
the conditions I, 11,Ill, IV are successively tested. The two considered motifs are combined only if these four concfkions are fulfilled. For condition IV, the vertical characteristic T is the minimum of the two heights of the possible
combined motif considered.
When all motifs of the profile are successively tested,
ginning of the profile until no combination is possible.

the combination

operation

is performed

again from the be-

13

IS

15422:2003

ISO

A.4

12085:

1996

Summary of the calculation method for combination of motifs


Decomposition of profile into segments
(width s A for roughness and width s B for waviness)
I
Motif combination inside each segment
Test of conditions 1, Ill, IV

14

Motif combination over the whole profile


Test of conditions 1, 11,Ill, IV

IS 15422:2003
ISO 12085:1996

.,

Eliminated
Motif combination
inside segments

II

Profile decomposition
in segments

-L-

peak

rkfl
I

. .

I
Peak preserved

Eliminated oeak
.

[ombinatlon over the


whole profile

(condition

IV)

/m

ll\

w /(7

1 A

Eliminated oeak -

Peak preserved

I
X Eliminated
(conditions
fultilled)
O

(conditions

I and 11)

(condition

peak

W)

End of possible
combinations

1, II, III, IV

End of tests

Peaks pceserved

Figure A.1 Combination of motifs

IS 15422:2003
ISO 12085:1996

Annex B
(informative)
Relation between motif parameters and function of surfaces
Table B.1 gives, for information,

the motif parameters

which can be specified

according to the function

of surfaces.

Tabl B.1
Parameters

Functionsarmlied
to the su~ace

Surface

Designations

with
relative
displacement

FG

FS

Rolling

FR

Resistance to hammering

RM

Fluid friction

FF

(lubricated)

with
gasket

Dynamic
sealing

Wo
in

Symbol)

Dry friction

Slipping

]arts

Roughness
profile

with
without
displacement

with
stress
ndepen
jent
;urface

without
stress

Static
sealing

gasket

aasket
Adjustment without
disdacement with stress

AC

s 0,3R
0

==
0,6R

AW

Pt

P&

o
o
o
0
0

< 0,6R

CR

CR

Adherence (bondina)

AD

Oc

Fatigue strengths

EA

0
o

Corrosion resistance

RC

s 2R

RE

Electrolytic coating

DE

Measures

ME

AS

(aspect)

0
o

Paint coating

<R

specify at Ieest one of them

on W is equal tO the uPPer tolerance

on

R multiplied

)The symbols (FG, etc.) are acronyms of French designations.

16

profile

Wte

J secondary parameters: to be Speclt!ed It necessary according to the part functions.


he mdlcation < 0,8R, for example, means that, if the symbol FG is indicated on the drawing,
JPPer tolerance

Wx

< 0,8R

Tools (cuttina surface)

parameters:

o
0
o
0

Primary

profile

ES

without

Appearance
D Most important

AR

Waviness

ED

without
gasket

:ontact

Rx

by

0,8.

and w not otherwise

specified,

the

IS 15422:2003
ISO 12085:1996

Annex C
(informative)
to the GPS matrix model
For full details about the GPS matrix model, see lSO/TR 14638,

C.1 -Information about the standard and its use


This International Standard defines roughness and waviness parameters which are complementary
to the profile
method parameters defined in ISO 4287. They can be used when the peaks of the surface are important for the
function of the surface.
NOTE 5

The conversion

from the profile

method

parameters

to the motif parameters

and vice versa is not, in general, poss-

ible,

C.2 Position in the GPS matrix model


This International Standard is a general GPS standard, which influences chain links 2, 3 and 4 of the chain of standards on roughness profile and waviness profile in the general GPS matrix, as graphically illustrated in figure C.1.
Global GPS standards
Fundamental

GeneralGPS matrix

GPS

Chainlink number
standards

1!2]3]

41516

Size
Distance
Radius
Angle
Form of line independent
Form of line dependent

of datum
on datum

Form of surface mdeoendent


Form of surface dependent

of datum

1
I

on datum

Orientation
Location
Circular run-out

I\ Total run-out

1111111

Datums

Roughness profile
Waviness profile
Primary profile
Surface defects
Edges
Figure C.1

C.3 Related International Standards


The related International

Standards are those of the chains of standards indicated in figure C.1.

17

IS 15422:2003
ISO 12085:1996

Annex D
(informative)
Bibliography
[1]

1S013565-1:1996,
Geornetrica/ Product Specifications (G/?S) Surface texture:
having stratified functional properties Part 1: Filtering and general measurement

[21

ISO 13565-2:1996,
Geometrical Product Specifications (GPS) Surface texture: Profile method Surfaces
having stratified functional properties Part 2: Height characterization using the linear material ratio curve.

[3]

lSO/TR 14638:1995,

Geometrical Product Specification

V/M /nternationa/

vocabulary of basic and genera/

[4]

OIML, 2nd edition, 1993.

18

Profile method
conditions.

Surfaces

(GPS) Masterplan.

terms in metrology.

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IV Cross Road, CHENNAI

Western

: Manakalaya, E9 MlDC, Marol, Andheri (East)


MUMBAI 400093

Branches

: AHMEDABAD.
GHAZIABAD.
NALAGARH.

BANGALORE.

23237617
{ 23233841
23378499,23378561
{ 23378626,23379120

160022
600113

BHOPAL. BHUBANESHWAR.

603843
{ 609285
22541216,22541442
{ 22542519,22542315
28329295,28327858
{ 28327891,28327892
COIMBATORE.

FARIDABAD.

GUWAHATI. HYDERABAD.
JAIPUR. KANPUR. LUCKNOW. NAGPUR.
PATNA. PUNE. RAJKOT. THIRUVANANTHAPURAM.
VISAKHAPATNAM.
Printed at Simco Printing Press, Delhi

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