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timely dissemination of this information in an accurate manner to the public.
1 +, 1 +
01 ' 5
Jawaharlal Nehru
IS 15422 (2003): Geometrical Product Specifications (GPS) Surface Texture: Profile Method - Motif Parameters [PGD 25:
Engineering Metrology]
! $ ' +-
Satyanarayan Gangaram Pitroda
! > 0 B
BharthariNtiatakam
IS 15422:2003
M) 12085:1996
iF51-s$FT
-wG-fa-4mt3m
Indian Standard
ICS
17.040.20
(3 B!S 2003
BUREAU
MANAK
December
2003
OF
BHAVAN,
INDIAN
9 BAHADUR
NEW
DELHI
STANDARDS
SHAH
110002
ZAFAR
MARG
Price Group
Engineering
NATIONAL
Metrology
Sectional Committee,
BP 25
FOREWORD
This Indian Standard which is identical with ISO 12085:1996 Geometrical Product Specification (GPS)
Surface texture: Profile method Motif parameters issued by the International Organization
for
Standardization
(ISO) was adopted by the Bureau of Indian Standards on the recommendations
of the
Engineering Metrology Sectional Committee and approval of the Basic and Production Engineering Division
Council.
This standard defines terms and parameters used for determining surface texture by the motif method. It
also describes the corresponding ideal operator and measuring conditions. The approach described in
this standard facilitates the determining roughness and waviness parameters from the primary profile by
finding those motifs that characterize the surface under consideration.
This method is independent of
any profile filter and results in parameters which are based on the depth and spacing of the motifs.
The text of the ISO Standard has been approved as suitable for publication as an Indian Standard without
deviations.
In this adopted standard certain conventions are, however, not identical to those used in
Indian Standards. Attention is particularly drawn to the following:
a)
b)
Comma (,) has been used as a decimal marker in the International Standards,
Inaian Standards, the current practice is to use a point (.) as the decimal marker.
Technical Corrigendum
they should
while in
In this adopted standard, reference appears to certain International Standards for which Indian Standards
also exist. The corresponding
Indian Standards which are to be substituted in their places are listed
below along with their degree of equivalence for the editions indicated:
international
Standard
Corresponding
Indian
Standard
Degree
of
Equivalence
Identical with
ISO 1302:1978
Identical
do
do
the assessment
of surface texture
IS 15422:2003
ISO 12085:1996
Scope
This International Standard defines terms and parameters used for determining surface texture by the motif
method. it also describes the corresponding ideal operator and measuring conditions.
Normative
references
The following standards contain provisions which, through reference in this text, constitute provisions of this international Standard. At the time of publication, the editions indicated were valid. All standards are subject to revision,
and parties to agreements based on this International Standard are encouraged to investigate the possibility of applying the most recent editions of the standards indicated below. Members of IEC and ISO maintain registers of
currently valid International Standards.
ISO 1302:1992,
Technical drawings
Method
of indicating
surface texture.
iS0 4287:1997,
and parameters
Geometrical
product
of surface texture.
specifications
ISO 4288:1996,
Geometrical Product Specifications
cedtires for the assessment of surface texture.
(GPS) Surface
texture:
Definitions
3.1
3.1.1
General definitions
surface profile: (See ISO 4287.)
definitions
apply.
Profile
Nominal
character-
IS 15422 :200~
ISO 12085:1996
local peak of profile: A part of a profile between
3.1.3
3.1.4
its length, ARi or AWi, measured parallel to the general direction of the profile;
its two depths, Hi and Hi+ 1, or HWj and HWj+ I, measured perpendicular
profile;
its T characteristic,
T= MINIH,:H,.,1
here: T = H,. ,
3.1.6 roughness motif: Motif derived by using the ideal operator with limit value A (see figure 3).
NOTE
By this definition,
a roughness
motif
has a length
Al/j
smaller
than
or equal
to
A.
of the PrimarY
IS
ISO
15422:2003
12085:1996
3.1.7 upper envelope line of the primary profi-le(waviness profile): Straight lines joining the highest points of
peaks of the primary profile, after conventional discrimination of peaks (see figure 4),
Upper enve[ope line
..
Upper envelope
line
?
.
(J
A W,
T =MINIHw,:
Hw, .,]
here: T = Hwj. ,
mo-
AR=~~ARi
n, ,=1
where n is the number of roughness
motifs,
R.+Hj
m
j=l
3.2.3
The number
of Hj values
is twice
the number
of ARi values
(m = 2n)
maximum depth of profileirregularity, Rx: The largest depth, Hj, within the evaluation
length.
EXAMPLE
On figure 6: Rx = H3,
IS 15422:2003
ISO 12085:1996
mo-
id
3.2.5
mean depth of waviness motifs, w The arithmetical
within the evaluation length (see figure 7), i.e.
W=~~
Hwj
j=l
maximum depth of waviness, Wx: The largest depth Hwj, within the evaluation
3.2.7 total depth of waviness, Wte: The distance, measured in a direction perpendicular to the general direction
of the primary profile, between the highest point and the lowest point of the upper envelope line of the primary
profile (see figure 7).
z
2,5 @
L-.---x
S00pm
IS
ISO
Theoretically
4.1
12085:1996
Generai
4.2
15422:2003
the identification
conditions of motifs
roughness and waviness parameters.
discrimination)
and presents
the
The recommended
0.
spacing s ,4
L4
b) Waviness motifs
4.3
Depth discrimination
of surface roughness.
Divide the primary profile into sections of width A/2, and take the height of each rectangle.
The local peaks taken into account
tangles (see figure 9).
~Local
peak retained
{example)
L--
L-
Height Of
of these
rec-
this rectan91e
(example)
!-
IS 15422:2003
ISO 12085:1996
4.3.2
Discrimination
based on maximum
depth
For the roughness motifs the depths of which are Hjt the value ~j
ation) are calculated. Any depth of local peak or valley the value of which is larger than H = Hj + 1,65 ~Hj, is levelled equal to the H value (see figure 10).
NOTE 4 If the distribution of Hj is Gaussian, this condition concerns 5
the risk of high isolated peaks Interfering with the envelope line,
V.
~-
1
f
I
!
1
t
Figure 10 Discrimination
based on maximum
depth
IS
!S0
(Blank page)
15422:2003
12085:1996
IS 15422:2003
ISO 12085:
1996
4.4
Envelope condition
II
retains peaks, which are higher than one of the adjacent peaks.
Length condition
The second condition limits the length of motif to the A value (conventional limit between roughness
or the B value (conventional limit between waviness and residual form!, as defined in 4.2 and 5.2.
Ill
and waviness)
Enlargement condition
eliminates
It does not allow the combining of two motifs into one motif, longer than the two original ones, if it results in a motif the T characteristic of which is smaller than one of the two original motifs.
(It eliminates small peaks which are inserted between large peaks.)
IV
The combination
limits combination of motifs with similar depths, particularly for periodical surfaces.
peaks the depth of which is similar to adjacent peaks.)
algorithm
can be accomplished
IS
15422:2003
ISO
NOcombination
Condltlons
Possible combination
P,
II
P?
PJ
Condltlon I
I--_______;
P,.
P2and
P3
.
I
Aor
,---_______J
P,5P70r
, Aor
AR; .,
\
/ AWj
P3
YES
or
/ AR,
or
PJ.
P,
P2
I
&
12085:1996
IARj
Iorl
;@IAW,
_______
Ai#, .ql
,LJ
L-_---__;
(AR, +ARj.,).
A(for R)
(A W,+ AW, .,). B(for W)
(ARi+Af?j
I
I
J
AR,+,
or
AWi.,
.q)s A(for
R)
(A Wi+AWj.,ls8(for
NO
W)
YES
;;LL
II
Condition Ill
T,
L---
T.
T2
___a
T,or
T2 \
T! ~d
: T,
1--- _____l
Enlargement of the T
characteristic
of both motifs
T2
T ? T, and T2
No
YES
R)
T(for W)
NO
YES
Hj+, or Hj+z=60%T(for
Hw,., or Hwj.2s60%T(for
R)
W)
I
~
Combine the two motifs and test
if two other motifs are availab~e
t
NO]
NO
sequence
I
I
YES
IS 15422:2003
ISO 12085:1996
4.5
Primary profile
I
v
Elimination
[Figure 12 a)]
motifs
w
Combination of individual roughness motifs two by two over the whole profile, in order to find motifs as large as
[Figure 12 b)]
possible which comply with the four conditions
[Figure 12 c)]
Calculation of RX3)
+
Correction
of individual
*
Calculation of R
and AR 1,3,
Corrected
upper envelope
[Figure 12 d)]
line
I
*
On this line: seeking all peaks and valleys which
define
individual
waviness
motifs
motifs two by two, in order to find motifs as large as possible which comply
calculation
1) R and AR parameters
are calculated
2)
W and
3)
10
AW parameters
of
are calculated
[Figure 12 e)]
IS 15422:2003
ISO 12085:1996
z
I
2 pm
Combination
of motifs
1
1
L.x
500 ~m
).;+;r.,**.
~@
5W
a) Primary
prdila
Primary profile
Roughness peaks
Roughness motifs
b) Roughness
motifs superimposed
Roughness valleys
on primary profile
.,
d
/
-.
iC) Roughnaas
Calculation
of Hj and AR;
motifs
1
Corrected
upper envelope
line
.=
d) Wavineas
profila
superimposed
profile
Waviness peak
on primary
r
Waviness motifs
Corrected upper
envelope line
Waviness valley
e) Waviness
motifs superimposed
on waviness
profile
11
IS
15422:2003
ISO
12085:1996
Measuring
5.1
Convention
conditions
5.2
of parameters
parameters,
measurement
conditions
mm
Evaluation
length
mm
as
.~m
Maximumstylus
tip raclhs
pm
0,02
0,1
0,64
0,64
2,5
2 & 0,5
0,1
0,5
3,2
3,2
2,5
2 k 0,5
0,5
2,5
16
16
5*1
2,5
12,5
80
80
25
10*2
El)
mm
specified,
by this standard are only valid if the primary profile contains a minimum
of 150 vertical
The 16
5.5
Traversing
length
mm
Al)
1) If not otherwise
5.4
guide (see
The recommended
5.3
relative to a reference
?4.
The corrected upper envelope line can be used as an alternative to the filter defined in ISO 13565-1, for the assessment of parameters Rk, Rpk and Rvk defined in ISO 13565-2. In this case, these parameters are named Rke,
Rpke and Rvke.
5.6
12
IS 15422:2003
ISO 12085:1996
Annex A
(normative)
Calculation method for combination of motifs
lnorder tohavereproducible
results with existing apparatus,
applied in the software (see figure Al).
the method
of calculation
given inA.1
to A.3shalibe
A.1 Profile decomposition in segments, the length of which is smaller than or equal
to A for roughness and B for waviness (A and B values in 5,2)
Find two peaks Pi, Pi+ 1 satisfying
the folIowing
conditions:
A.2
between
Inside each segment, the three conditions 1, Ill, IV of 4,4 are successively tested on each pair of motifs.
bination of two individual motifs is only possible if these three conditions are fulfilled.
For condition
(T= minimum
The com-
IV, the minimum (Ffj + 1, Hj + z) is compared to 60 O/. of the vertical reference T of the segment
of the two heights hl, hz of the segment) and not to that of the possible combined motif.
When all individual motifs inside the segment have been successively tested, the combination operation
formed again from the beginning of the segment until no combination is possible inside this segment,
The following
A.3
segments
is per-
All motifs resulting from the previous step are combined two by two over the whole profile. For each pair of motifs,
the conditions I, 11,Ill, IV are successively tested. The two considered motifs are combined only if these four concfkions are fulfilled. For condition IV, the vertical characteristic T is the minimum of the two heights of the possible
combined motif considered.
When all motifs of the profile are successively tested,
ginning of the profile until no combination is possible.
the combination
operation
is performed
13
IS
15422:2003
ISO
A.4
12085:
1996
14
IS 15422:2003
ISO 12085:1996
.,
Eliminated
Motif combination
inside segments
II
Profile decomposition
in segments
-L-
peak
rkfl
I
. .
I
Peak preserved
Eliminated oeak
.
(condition
IV)
/m
ll\
w /(7
1 A
Eliminated oeak -
Peak preserved
I
X Eliminated
(conditions
fultilled)
O
(conditions
I and 11)
(condition
peak
W)
End of possible
combinations
1, II, III, IV
End of tests
Peaks pceserved
IS 15422:2003
ISO 12085:1996
Annex B
(informative)
Relation between motif parameters and function of surfaces
Table B.1 gives, for information,
of surfaces.
Tabl B.1
Parameters
Functionsarmlied
to the su~ace
Surface
Designations
with
relative
displacement
FG
FS
Rolling
FR
Resistance to hammering
RM
Fluid friction
FF
(lubricated)
with
gasket
Dynamic
sealing
Wo
in
Symbol)
Dry friction
Slipping
]arts
Roughness
profile
with
without
displacement
with
stress
ndepen
jent
;urface
without
stress
Static
sealing
gasket
aasket
Adjustment without
disdacement with stress
AC
s 0,3R
0
==
0,6R
AW
Pt
P&
o
o
o
0
0
< 0,6R
CR
CR
Adherence (bondina)
AD
Oc
Fatigue strengths
EA
0
o
Corrosion resistance
RC
s 2R
RE
Electrolytic coating
DE
Measures
ME
AS
(aspect)
0
o
Paint coating
<R
on
R multiplied
16
profile
Wte
Wx
< 0,8R
parameters:
o
0
o
0
Primary
profile
ES
without
Appearance
D Most important
AR
Waviness
ED
without
gasket
:ontact
Rx
by
0,8.
specified,
the
IS 15422:2003
ISO 12085:1996
Annex C
(informative)
to the GPS matrix model
For full details about the GPS matrix model, see lSO/TR 14638,
The conversion
method
parameters
ible,
GeneralGPS matrix
GPS
Chainlink number
standards
1!2]3]
41516
Size
Distance
Radius
Angle
Form of line independent
Form of line dependent
of datum
on datum
of datum
1
I
on datum
Orientation
Location
Circular run-out
I\ Total run-out
1111111
Datums
Roughness profile
Waviness profile
Primary profile
Surface defects
Edges
Figure C.1
17
IS 15422:2003
ISO 12085:1996
Annex D
(informative)
Bibliography
[1]
1S013565-1:1996,
Geornetrica/ Product Specifications (G/?S) Surface texture:
having stratified functional properties Part 1: Filtering and general measurement
[21
ISO 13565-2:1996,
Geometrical Product Specifications (GPS) Surface texture: Profile method Surfaces
having stratified functional properties Part 2: Height characterization using the linear material ratio curve.
[3]
lSO/TR 14638:1995,
V/M /nternationa/
[4]
18
Profile method
conditions.
Surfaces
(GPS) Masterplan.
terms in metrology.
Bureau
of Indian
BIS is a statutory
harmonious
Standards
institution
development
established
of the activities
to connected
of standardization,
matters
marking
and quality
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of
in the country.
Copyright
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no changes are needed; if the review indicates that changes are needed, it is taken up for revision.
Users of Indian Standards
should ascertain
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from
DOC:
and Standards:
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(021 4).
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