Академический Документы
Профессиональный Документы
Культура Документы
LEE CHENGXU
Date of birth
16 MARCH 1988
Title
Academic Session :
2011/2012
CONFIDENTIAL
RESTRICTED
OPEN ACCESS
SIGNATURE
SIGNATURE OF SUPERVISOR
880316-02-5377
(NEW IC NO. /PASSPORT NO.)
Date :
NOTES :
Date :
Signature
LEE CHENGXU
JUNE 2012
ii
I declare that this thesis entitled Design of Plasma Needle and High Frequency
Power Supply for Bio-Medical Applications is the result of my own research except
as cited in the references. The thesis has not been accepted for any degree and is not
concurrently submitted in candidature of any other degree.
Signature
Name
: LEE CHENGXU
Date
iii
Dedicated to my beloved father and mother, siblings, friends and lecturers for their
endless loves, encouragement and support
iv
ACKNOWLEDGEMENT
ABSTRACT
vi
ABSTRAK
Baru-baru ini, rawatan plasma sejuk pada tisu hidup telah menjadi satu topic
yang popular dalam bidang sains perubatan selepas ia ditemui mempunyai fungsi
penghapusan bakteria pada tahun 2002. Ia dihasilkan di bawah tekanan atmosfera
dan suhu bilik oleh getaran frekuensi radio. Pada masa ini, penjana dan penguat yang
dikomersialkan untuk tujuan penyelidikan telah digunakan untuk menjana plasma
sejuk. Oleh itu, penjana kuasa berfrekuensi tinggi yang lebih murah perlu direkacipta
untuk aplikasi pada masa depan.Selain itu, saiz plasma yang dijana pada hujung
jarum plasma juga sangat kecil. Ia memerlukan masa rawatan yang lebih panjang jika
digunakan pada luka yang saiznya lebih besar. Dalam karya ini, penjana kuasa yang
berfrekuensi tinggi telah direka dan dibangunkan dengan menggunakan litar penguat
kuasa kelas E yang telah diubahsuai. MAX038 telah digunakan sebagai penjana
isyarat untuk menjana isyarat berfrekuensi tinggi. Pemandu MOSFET DEIC515 dan
MOSFET DE275X2,-102N06A telah digunakan untuk tujuan pensuisan ultra-cepat
sebelum dipasang pada litar penguat. Berdasarkan simulasi yang telah dibuat, rekaan
penjana kuasa frekuensi tinggi ini mampu menjana 505Vpp pada frekuensi
13.56MHz dan keluaran ini adalah cukup tinggi untuk menjana plasma sejuk. Reka
bentuk baru jarum plasma dengan magnet cincin di kepala jarum telah direka
bertujuan untuk meningkatkan keseragaman plasma serta meningkatkan kesan
penyembuhan pada kawasan yang dirawat. Selain penjana kuasa frekuensi tinggi,
laporan ini juga akan membentangkan jarum plasma yang direka. Beberapa cadangan
untuk kajian pada masa hadapan juga dimasukkan dalam bahagian akhir laporan ini.
vii
TABLE OF CONTENTS
CHAPTER
TITLE
PAGE
DECLARATION
ii
DEDICATION
iii
ACKNOWLEDGEMENTS
iv
ABSTRACT
ABSTRAK
vi
TABLE OF CONTENTS
vii
LIST OF FIGURES
LIST OF SYMBOLS
xii
LIST OF ABBREVIATIONS
xiii
LIST OF APPENDICES
xiv
INTRODUCTION
1.1 Introduction
1.2 Background
1.4 Objectives
LITERATURE REVIEW
2.1 Introduction
viii
10
11
14
2.7 MOSFET
17
18
21
22
23
23
24
24
RESEARCH METHODOLOGY
3.1 Introduction
25
26
27
27
27
29
30
30
31
32
35
35
ix
36
37
38
39
40
42
42
44
44
45
47
49
7.2 Conclusion
49
7.3 Recommendation
50
REFERENCES
52
APPENDICES
APPENDIX A
55
APPENDIX B
57
LIST OF FIGURES
FIGURE NO.
TITLE
PAGE
1.1
Thermal Plasma
2.1
Plasma
2.2
2.3
2.4
Plasma Needle
10
2.5
12
2.6
Experimental waveform
14
2.7
17
2.8
18
2.9
2.10
19
19
2.11
20
2.12
22
4.1
31
4.2
31
4.3
33
4.4
34
4.5
35
5.1
36
5.2
38
5.3
39
xi
5.4
39
5.5
40
5.6
41
6.1
43
6.2
43
6.3
Output of MAX038
44
6.4
Output of DEIC515
46
6.5
Output of DE275X2-102N06A
48
xii
LIST OF SYMBOLS
Kelvin
Degree Celcius
UV
Ultraviolet
Min
Minute
ns
Nanoseconds
IG
Gate Current
ID
Drain Current
IS
Source Current
Volts
kV
Kilo Volts
Kilo Ohms
mm
Milimeter
cm
Centimetre
mV
Mili Volts
mW
Mili Watts
GHz
Giga Hertz
MHz
Mega Hertz
Vpp
Peak-to-peak Voltage
Vp
Peak Voltage
He
Helium
uH
Micro Henries
mH
Mili Henries
ZL
Load Impedance
VGS(th)
Threshold Voltage
VCC
xiii
LIST OF ABBREVIATIONS
RF
Radio Frequency
Frequency
BNC
Bayonet NeillConcelman
DC
Direct Current
AC
Alternating Current
UTM
CCP
NI
National Instrument
OD
Outer Diameter
ID
Internal Diameter
IGBT
MOSFET
IC
Integrated Circuit
PCB
xiv
LIST OF APPENDICES
APPENDIX
TITLE
PAGE
55
Datasheet
57
CHAPTER 1
INTRODUCTION
1.1
Introduction
The conducted research was Design of Plasma Needle and High Frequency
Power Supply for Bio-Medical Applications. The reason this topic was chosen is
because non-thermal plasma treatment has become more and more popular in
modern plasma physics and in medical sciences. Besides, non-thermal plasma has
made an innovative form in solid state processing technology. In this chapter, there
are a few things that will be covered, namely background of the study, problem
statement, objective of the study, scope of the study and significance of the study.
1.2
On earth, solid, liquid and gas are three states of matter that can be easily
found. Human are very familiar with these three states of matter as they are facing
them everyday. In 1879, an English physicist, Sir William Crookes had identified a
fourth state of matter where we call it as plasma now. The name plasma was first
being applied by Dr. Irving Langmuir, an American chemist and physicist, in 1929.
Plasma comprises of free charge carriers (electrons and ions), active radicals
and excited molecules and atoms which is similar to gas. High energy such as
thermal, electrical, or light is needed to ionize its atom or molecules and this process
will cause the gas to become electrically conductive. This electrically conductive,
ionized gas is called plasma. The temperature for plasma electrons normally above
104 K while the temperature for neutrals and ions depend on type of plasma and have
the range from room temperature to 107 K.
(a)
(b)
Figure 1.1: Thermal Plasma (a) Lighning Strike and (b) Metal Spraying
For non thermal plasma, the electron temperature and gas temperature are not
in equilibrium with each other. The temperature of molecules, ions and atoms are
much lower (normally room temperature) than electrons (higher temperature). The
relative low temperature of non-thermal plasma make it does not impose thermal
damage to nearby object. The thermal damage caused by the high temperature of
thermal plasma has been eliminated or minimised. Since the thermal damage had
been eliminated, it can be applied in many applications.
1.3
Problem Statement
The plasma system that researchers are using now is very expensive. This is
because commercialize function generator and research amplifier are used in plasma
radio-frequency (RF) power supply. This equipment is not specifically use for
generating non-thermal plasma but normally used in laboratory with the purpose of
studying and researching. Due to the high cost of the plasma system, alternative for
cheaper RF power supply is needed so that the cost for plasma system can be
lowered down. This is vital for future applications of non-thermal plasma.
1.4
The aim of this project is to study, research and redevelop the high frequency
power supply and design a new plasma needle by adding a ring magnet to the plasma
needle to improve the plasma uniformity. This aim will be met through two
objectives:
i.
ii.
1.5
i.
ii.
iii.
iv.
1.6
Although there are various experiments being carried out on the plasma
needle, they did not discuss on the ways of improving the plasma uniformity and
treatment area. This study is to enhance the design of plasma needle by adding a ring
magnet with the purpose of improving the plasma uniformity as well as the healing
effects on the treated are. By improving the plasma uniformity and treatment area,
the treatment time can be shortening and more patients can be benefitted every day.
The findings of this study were important as it opens the ways of improving plasma
uniformity for future research.
CHAPTER 2
LITERATURE REVIEW
2.1
Introduction
In this chapter, literature review starts with screening the non-thermal plasma
generation, design and applications of plasma needle, which is the big picture of the
research. This research is part of the effort to generate non-thermal plasma for the
usage of plasma needle.
2.2
Plasma Generation
Plasma can be generated from various ways. The most common method in
plasma generation is the electrical breakdown of an electric field in a neutral gas. In
the electric field, the speeded charge carriers will transfer their energy into the
plasma by smashing other atoms and molecules. The electrons will preserve their
major energy in elastic collisions with other particles due to their light weight and
they will only transfer their energy mainly in inelastic collisions. The plasma
generated by the electric fields can be classified into four which are direct current (dc)
2.3
Plasma Needle
In year 2002, Physicist Eva Stoffels and her team had come out with an
innovative idea which is the plasma needle. Plasma needle is a novel design of nonthermal plasma source which being generated at atmospheric pressure by using the
concept of radio-frequency discharges. It has a single-electrode configuration and
operated with the presence of helium gas [5]. The plasma generated in plasma needle
operates near room temperature and at atmospheric pressure, do not cause pain and
bulk destruction of the tissue yet allows treatment of uneven surface and has a small
penetration depth. These features allow plasma needle to be applied in bio-medical
applications.
This plasma source will generate the plasma which contains free electrons
and ions, various chemical reactive species and energetic UV photons [8]. UV
emission and density of chemical reactive species are significant in defining the
performance of plasma in the treatment of biological materials. The spore
inactivation with an atmospheric pressure discharge can be mainly due to UV
radiation. With the absence of UV emission, action of chemical reactive species such
as O-, OH-, N2+, N2 and He can cause spore inactivation as well. Hence, the spore
inactivation depending on the operating conditions, it can be achieved either under
dominant UV radiation or under purely action of the reactive species [9].
The plasma generation with the presence of helium gas are most stable and
have the widest range of operating conditions. The operating conditions of the
plasma needle as a function of helium flow rate and percentage of air admixture at a
constant total flow rate are shown in Figure 2.3. This is mainly essential for saving
budgets and convenience of operation in small model openings. Since with the
presence of helium gas, the plasma has very low power dissipation and the sustaining
voltage is tolerable, it is preferable to be used in biomedical applications.
Figure 2.3 Stability Curves of The Plasma: (a) as a function of helium flow rate and
(b) as a function of percentage of air admixture at a constant total flow rate (350 ml
min-1). Displayed are the breakdown voltages, needed to ignite the plasma (),
minimum operating voltages, just above extinction threshold () and maximum
voltages, just below arcing () [5].
10
2.4
Plasma needle has relatively simple design. The tungsten needle of 0.3mm is
inserted coaxially in a Perspex tube which has an inner diameter of 4mm [10]. The
tungsten needle serves as the powered electrode here. The Perspex tube is put into
the stainless steel holder and it is protrudes from the stainless steel holder. The length
of the needle normally is around 6-8cm. The electrode is insulated by the Perspex
tube to prevent a discharge along the needle.
The breakdown voltage to generate plasma can easier be achieved with the
presence of gas helium at minimum peak-to-peak RF voltage of around 200V. The
RF signal voltage is connected to plasma needle through a coaxial cable. There is a
gas inlet in the stainless steel holder for gas helium to flow in. Helium is regulated by
a mass flow controller to flow at a rate of 21/min into the Perspex tube [10]. It will
mix with a small amount of air at the tip of the needle. The helium-air mixture is
significant to create active radical species for sterilization [4].
11
The needle should keep as short as possible. This is because the changes in
the power supplied to plasma needle will cause the changes in matching network.
The heating of the needle is thought to be the main reason of the changes. It is better
for coaxial cable that connecting the power supply to the plasma needle to cover
most of the distance rather than lengthen the needle itself. Even though the plasma
kills most of the bacteria, the plasma needle should be sterilized after the treatment
[18]. This is the precaution step taken to avoid any bacteria remain at the needle after
the treatment.
There is heat at the tip of the needle when plasma is formed. The damage will
be done when there is direct contact between the tip of the needle and the skin.
Besides, the tip is very sharp as well. Hence, contact with the skin should be avoided
[18]. The housing covers should cover the needle in total so that the metal tip will
never touch the skin. If there is accident contact made during the treatment, the cover
will touch the skin instead of the warm metal tip.
2.5
12
The way of generating excitation voltage was based on the modified class E
amplifier where it is different with the original topology. This configuration uses a
metal oxide/semiconductor field-effect transistor (MOSFET), which perform on-off
operation by driving a parallel resonant circuit. The output signal from square wave
generator (CGS3311) will be supplied to a driver, which provides the on and off
pulses for the MOSFET [15]. The MOSFET output pulses will then be converted
into a sinusoidal high voltage signal by parallel RLC resonant (class E amplifier)
circuit.
(2.1)
13
During the OFF state (S = OFF), the resonant circuit is governed by LR, CR
and CT. The current signal I will supply the resonant circuit and the frequency
response is
(2.2)
The transistor acts as a switch with a duty ratio D and a work frequency f is
limited by (f1 < f < f2). The S can be expressed by
S=
for
0 < wt 2
for 2 < wt 2
ON wt,
OFF wt,
(2.3)
The circuit will show two distinct frequencies according to the state of S. The
capacitive parameter for MOSFET will be fixed according to MOSFET manufacture.
Hence, CT has a fix value which can be found from the datasheet. Thus, the resonant
network parameter LR and CR can be obtained by
(2.4)
(2.5)
14
(a)
(b)
Figure 2.6: Experimental waveform of (a) VCR(t), VCT(t), and (b) iLR(t) and IRS(t) [15]
2.6
15
intrinsically offer shortest propagation delay hence signals have smaller traverse
distance. It also has shorter rise and fall times. Since all important parameters are
specified in an IC Driver, designers manage to save their time and capital as they
need not go through process of defining, designing and testing circuits to drive the
MOSFET [19].
(2.6)
Where,
16
With desired rise and fall times in the range of 2 to 3 ns, lengths of current
carrying conductors should be kept as short as possible. Conductor traces partial
inductance can be calculated by:
(2.7)
It would be better to keep Vcc of Driver to about 20 VDC. If the trace length
from output pin of Driver IC to the gate of MOSFET cannot keep at minimum
distance, the width of the tract should be increased to minimize the loop inductance.
For every tiny increase in conductor length between output pin of Driver IC to the
Gate lead of MOSFET, there will be a major increase in rise time. Besides, it will
cause transmission line effect and resultant RFI/EMI [19]. This inductance could also
resonate with parasitic capacitances of MOSFET, making it hard to acquire clean
current waveforms at rise and fall. Every MOSFET also has some inductance and the
lower this value; the better is the switching performance.
17
2.7
MOSFET
(2.8)
18
2.7.1
19
Figure 2.10: A MOSFET being turned off by a driver in a clamped inductive load
20
VGS(th) with
VDD and Drain current, ID has not commenced yet. Between 0 to t1, as VGS rises, IGS
falls exponentially, because it is an RC Circuit. After time t1, as the V GS rises above
VGS(th), MOSFET enters its linear region. At time t1, ID initiates, but the VDS is still
maintain at VDD. However, after t1, ID builds up rapidly. Between t1 to t2, the ID
increases linearly with respect to VGS. At time t2, VGS enters the Miller Plateau level
and VD begins to fall quickly [20].
21
From t2 to t4, VGS and IGS remain at the same value. This is called the Miller
Plateau Region. In this time period, most of the drive current from the driver is used
to discharge the CGD and enhance rapid fall of VDS. The ID will only be restricted by
the external impedance in series with VDD. After t4, VGS begins to exponentially rise
again with a time constant T2. During this time interval the MOSFET gets fully
enhanced and the final value of the VGS will determine the effective RDS(on). When
VGS reaches its final value, VDS attains its lowest value, determined by VDS= IDS x
RDS(on) [20].
2.7.2
From t3 to t4, the VGS begins to fall further below VGS(th). CGS will be
discharge through any external impedance between Gate and Source terminals. The
MOSFET is in its linear region and ID drops rapidly towards zero value. At the
beginning of this interval, the VDS was at its off state value VDS(off) and the MOSFET
will completely turned off at t4 [20].
22
2.8
It is proven that magnetic fields do affect the human body in different ways,
and these may be best to be used in therapy [14]. When injury occur, that particular
area is magnetically positive (south pole) and it will become magnetically negative
after few hours (healing occur). North pole magnets have the ability to end the
23
enlargement of growth and contamination while south pole magnets able to arouse
growth of tissue and living systems (bacteria). Hundreds of experiments show that
north pole, the magnetic negative energy has decelerated, controlled and stopped
further development of active cancer site [15]. Due to its characteristic, north pole is
preferred as it has healing effects, relieves pains, reduce inflammations as well as the
infections.
2.9
2.9.1
Dental Applications
Plasma can prevent patient from suffering as it can sterilize the dental cavities
without going through drilling and heating process. This is because the active plasma
species it produces can easily access small irregular cavity and gap. The excess
active species will recombine among themselves or reacting with ambient air and
water molecules once the treatment is completed. Besides, plasma does not cause
major heating to dental pulp yet able to kill the bacteria [10]. Furthermore, cost of
plasma is relatively inexpensive.
24
2.9.2
2.9.3
Cancer Treatment
Plasma treatment can prevent patients from suffering as it does not have the
side effects. Plasma treatment has high-precision on the cells as there will be sharp
boundary line between non-plasma treated region and plasma-treated regions [12].
The high-precision of plasma treatment allows it to be applied directly to the cancer
cells without damaging the surrounding normal cells especially in biomedical
application.
25
CHAPTER 3
RESEARCH METHODOLOGY
3.1
Introduction
This chapter will discuss the methodology used to complete the design of
plasma needle and high frequency power supply for bio-medical applications. Sub
title included in this chapter is methodology procedure, related guidelines and
datasheet, and software used for modelling. Methodology procedure will list out all
necessary steps to finish the design in a simple flow chart. Guidelines and datasheets
that related to the design will be study as well. Software used in this study are
SolidWorks 2011 and Multisim 10.0.
26
3.2
Methodology Procedure
The methodology of the design of plasma needle and high frequency power
supply is as summarized in the flow chart below:
Literature Review
Hardware development of
plasma needle
27
3.3
In order to design the plasma needle and high frequency power supply, the
related journal papers were read and used as references and guidelines. The
specifications of designed plasma needle will be based on the current plasma needle
designed by Eva Stoffels and her team. Same thing goes to the high frequency power
supply as well. The power supply circuit will be modified base on the current circuit.
Besides, related datasheets will be read so that the best components will be chosen in
the circuit. It is very important to choose the correct values and ratings for the
components used in the designed circuit.
3.4
In this study, SolidWorks 2011 will be used to design the plasma needle
while Multisim 10.0 will be used for class E power amplifier circuit simulation.
3.4.1
SolidWorks 2011
SolidWorks 2011 was chosen as the software to design the plasma needle. It
is a 3D software tools which is more user friendly and easier to learn. It has variety
of user interface tools and capabilities to help designers in creating and editing
models well. Those tools are windows functions, SolidWorks document windows
and function selection and feedback.
28
SolidWorks Simulation Premium arms the users with tools to easily validate
design decisions, uncover hidden problems before they affect production and hence
save a lot of money in prototyping. New version also has the event-based motion
simulation, proximity sensors and automatic edge-weld sizing. The overhauled
simulation advisor will guide learners through their first few successful simulations,
shortening the learning curve and adding a layer of protection against errors.
29
3.4.2
Multisim 10.0
Multisim provides the reliable circuit design for expertise. It keeps improving
to ensure the circuit designers and researchers can move faster to the stage of PCB
production. One of the advantages of circuit design by using this software is the
designers will have the accurate part selection. Multisim has the database of more
than 22,000 components from top semiconductor manufacturers such as Analog
Devices, National Semiconductor, NXP, ON Semiconductor, and Texas Instruments.
Secondly, it can verify the designs by the simulation. The simulation result
can be used for analysis purpose. Multisim has around 20 industry standard SPICE
analyser and 22 measurement instruments for the designer to validate the
performance of the designed circuit. Thirdly, the design circuit can be translated
faster to PCB prototype since the NI Ultiboard layout environment is wholly
integrated with Multisim. It can save the transfer time and ease the designer work.
30
CHAPTER 4
4.1
Introduction
This section will discuss the design of plasma needle. It will discuss about the
components used, the dimension and the description of the model. The plasma needle
will be designed by using SolidWorks 2011 software.
4.2
Modelling Components
31
Plastic Holder
Cylinder Shape
Washer
Pyrex Tube
BNC Female
Ceramic Rod
Ring Magnet
Tungsten Needle
4.3
Modelling Dimensions
32
The designed plasma needle has the length of 118mm with the width of
18mm. it is kept as short and thin as possible so that it is easier for handling. The
plastic holder in the design has the length of 50mm and width of 20mm. One end of
the plastic holder is connected to the BNC female while another end is connected to
the Perspex tube. The gas inlet in the plastic holder has the slope of 450. It is
designed with the slope of 450 so that the gas inlet pipe does not obstruct the
treatment process when plasma needle is being applied in dentistry or other
applications.
Besides, there is a 2mm thick Perspex between the washer and the ring
magnet. The 2mm Perspex is used to fixed the ring magnet at its position. The ring
magnet has the outer diameter (OD) of 18mm and internal diameter (ID) of 12mm.
This ring magnet has to be custom-made as the size is too small and rarely found in
the magnet manufacturing plant.
4.4
Modelling Descriptions
33
Gas Inlet
Ring Magnet
RF Signal
The tip of tungsten needle is uncovered 2mm so that the tungsten can mix
with helium to create the plasma. Both electrode and ceramic tube are embedded in
the Pyrex tube. The Pyrex tube is used to insulate the needle to prevent a discharge
along the pin. The tube is protrudes from the plastic holder. The plastic holder is
designed with a gas inlet hence the gas helium can flow in from the gas inlet.
Another end of the plastic holder is threaded inside so that it can grip the BNC
female tightly. BNC will be connected to the power supply via the coaxial cable.
The novel design is made by adding a 10mm ring magnet at the tip of the
plasma needle. A washer is added so that the ring magnet can be attracted to it. The
ring magnet with different magnetic field strength (Tesla) will be tested to find for
the best magnetic field strength in creating the uniform plasma besides having the
healing effect on the treated area. The washer will only be used in the experiment
stage where it can be removed after the best magnetic field strength was found. The
ring magnet can be glued directly to the Perspex tube after confirm the magnetic
field strength of the ring magnet.
34
Gas Inlet
Needle Tip
Ring Magnet
Figure 4.4: The Pyrex tube moved 5mm into the plastic holder
The Perspex tube which protrudes from the plastic holder can move 5mm into
the plastic holder as shown in Figure 4.4. This is specially design for sterilizing
purpose. Even though the plasma kills most of the bacteria, the plasma needle needs
to be be sterilized after the treatment. Figure 4.5 shows the designed plasma needle
after rendered by using SolidWorks 2011.
35
CHAPTER 5
5.1
Introduction
This section discusses the design of high frequency power supply for biomedical applications. This research aims to design a high frequency power supply
which can generate a voltage up to 200V with the frequency of 13.56MHz. The
design was started with the software simulation and followed by hardware
development. The simulation and hardware development will be discussed in detail.
5.2
Simulation Development
The design of high frequency power supply was started with software
simulation. This is the step to verify whether the design circuit is functioning well
before continue with hardware development. In this research, Multisim 10.0 was
used as the simulation software.
36
5.2.1
VCR
VCT
VO
Figure 5.1 shows the modified Class E amplifier simulation circuit. This
circuit is very simple yet able to generate high voltage and high frequency in
generating non-thermal plasma. The component L1 is functioning as a choke
inductor for filtering. It allows only DC signal to pass through. The RLC load
consisted of R1, L3 and C2. L2 and C1 were combined to form the resonant circuit
with the frequency of 13.56MHz. Their value can be adjusted based on the input
frequency by using the formula
(5.1)
The voltage range from 200Vpp to 600Vpp is needed in generating nonthermal plasma. The voltage is inversely proportional to the required helium flow
rate. The higher the voltage the lower the gas helium required to generate the plasma.
When the gas helium is lower, the cost of generating the plasma is lowered down as
well.
37
In the simulation circuit, the function generator with 5Vp square wave was
used to replace the MAX038. MAX038 is the signal generator IC which able to
generate the waveform frequency up to 20MHz. The input voltage of 20V was used
in the modified Class E amplifier simulation circuit. The 20V input voltage was
connected to the 33H choke inductor.
5.3
Hardware Development
38
5.3.1
Figure 5.2 shows the MAX038 waveform generator circuit. MAX038 can
generate square wave, sine wave and triangle wave. The input to A0 ( pin 3 ) and A1
( pin 4 ) will determine type of waveforms being generated. The MOSFET needs
square wave for its input signal. Hence, both inputs to A0 and A1 were set to 0 to
have the square wave output signal. CF was fixed at 33pF and the frequency of the
output waveform can be adjusted by varying the 20k potentiometer, RIN.
39
4.7
F
RIN, 20k
Output
1nF
-5V
+5V
12k
MAX038
The +5V was connected to pin 17 while -5V was connected to pin 20 of
MAX038. The 5V was supplied from the regulated DC power supply. The 4.7H
capacitors were used to reduce noise and stabilize the input voltage to MAX038. The
output from MAX038 will be connected to the input of MOSFET Driver, DEIC515.
5.3.2
40
DEIC515 is a 15A low side ultrafast RF MOSFET driver. It can drive the
MOSFET with the frequency up to 45MHz. However, a very large transient will be
created in DEIC515 due to the high currents and high speeds. L1 as shown in Figure
5.4 is the simple tri-filar winding on a small ferrite core. It is the common mode
choke used at the DEIC515 input to avoid false triggering by directing the input
signals to follow the internal die potential changes.
The input and ground of the square wave were connected to the common
mode choke before entering IN and INGND of the DEIC515. The input voltage, V CC
for DEIC515 was 15V. The input square wave signal has the amplitude of 5Vp. The
output from DEIC 515 was connected to MOSFET DE275X2-102N06A input.
IN
INVCC
10F
VCC
Output
10F
INGND
DEIC515
Ground
5.3.3
41
Drain of the MOSFET. The output from MOSFET was attached to the Class E
amplifier circuit.
Ground
VDD
Output
DEIC515
DE275X2-102N06A
Figure 5.6: DEIC515 and MOSFET Hardware Circuit
42
CHAPTER 6
6.1
Introduction
This section discusses the simulation and the experimental results in this
research. It will start with the simulation result of modified Class E amplifier and
follow by the MAX038, DEIC515 and DE275X2-102N06A hardware results. The
output from the MOSFET, DE275X2-102N06A will be combined with the class E
amplifier to get the high voltage and high frequency output. The results obtained
from the experiment will be compared with the simulation results.
6.2
Figure 6.1 and 6.2 show the simulated waveforms of VCT, VCR, Vo and Vin.
The simulated results as shown in Figure 6.1 and 6.2 prove that the modified Class E
amplifier able to generate an output voltage of 505Vpp at the frequency of
13.56MHz with an input voltage of 20V. The output voltage is high enough to
43
generate non-thermal plasma after mix with the helium gas. VCT is the simulated
waveform that obtained from the Drain of the MOSFET. It was amplified from 15V
to 99.6Vpp.
VCR
VCT
Vo
Vin
All the components are assumed ideal in the simulation. In reality, many
factors will affect the output of the circuit. The output voltage will be lower than the
simulation result in real experiment.
44
6.3
Hardware Results
6.3.1
Figure 6.3(a), (b) and (c) show the output signals from MAX038 at frequency
of 5MHz, 10MHz and 13.75MHz. The frequency was varied by adjusting the 20k
potentiometer. The results show that MAX038 can generate square wave at high
frequency. It can be used as the signal generator to replace the function generator in
generating input signal for MOSFET. This will definitely reduce the cost of the power
supply since MAX038 is cheaper than a function generator.
(a)
45
(b)
(c)
Figure 6.3: Output of MAX038 at (a) 5MHz, (b) 10MHz and (c) 13.75MHz
6.3.2
Figure 6.4(a), (b) and (c) show the DEIC515 MOSFET Driver output signal at
frequency of 1MHz, 5MHz and 10MHz. It can be observed that the output from the
Driver has the amplitude of 14Vpp at the frequency of 1MHz. At frequency of 5MHz,
the amplitude was reduced to 7Vpp. The amplitude was decreased to 3.5Vpp at
frequency of 10MHz. However, the square shape still can be observed although the
46
frequency increased to 10MHz. This results show that Driver DEIC515 has the ability
to drive the signal at high frequency.
(a)
(b)
47
(c)
Figure 6.4: Output of DEIC515 at (a) 1MHz, (b) 5MHz and (c) 10MHz
The problem faced was the signal output voltages were decreasing when the
frequency increased. The voltage at the voltage generator also decreased when the
frequency of the input signal increased. There were voltage drop along the circuit
when high frequency being applied to the Driver. The circuit path was inductive and
the reactance, XL= jwL. When f=13.56MHz, the reactance was very large. At this
time, it is believed that most of the supply voltage did not pass through the Driver but
go through the capacitor that connected between the VCC and the ground.
6.3.3
48
(a)
(b)
Figure 6.5: Output of DE275X2-102N06A at (a) 5MHz and (b) 8MHz
From the results, it can be observed that the voltage decrease when the
frequency was being increased. It is believed that the MOSFET is not ON during the
experiment since no amplification occurred. The voltage drop along the circuit paths
need to be tackled in order to solve this problem.
49
CHAPTER 7
7.1
Introduction
In this chapter, the researcher will restate the objectives and make the
conclusion based on the results. Besides, recommendation for future research also
will be indicated.
7.2
Conclusion
This research had presented the design of plasma needle and high frequency
power supply for bio-medical applications. First objective of the research to design a
plasma needle was achieved successfully. SolidWorks 2011 software was used to
design the plasma needle. The modelling components, dimensions and descriptions
were discussed in chapter 4 previously. The newly design plasma needle is expected
to improve the plasma uniformity as well as the healing effects on the treated area. It
will be lighter and easier for handling with diverse design and material used.
50
The second objective of the research to design the high frequency power
supply was partially achieved. The simulation of the power supply circuit was
simulated successfully where it managed to produce the high voltage at high
frequency. When it comes to the hardware development, the output at both Driver
and MOSFET were not similar to the simulation result. The DEIC515 and
DE275X2-102N06A were able to drive the input signal at high frequency. However,
the voltage dropping at high frequency needs to be settled before proceed to the
amplifier circuit stage.
7.3
Recommendation
Based on the research of this study, here are several recommendations for
future work to improve the high frequency power supply as well as the plasma
needle in bio-medical applications:
51
2. For RF design, the high speed switching and losses always become the problem
in circuit design. Using DEIC515 and MOSFET DE275X2-102N06A in the
designed circuit was the right one. It has an excellent thermal transfer and able to
optimize the switching speed of the output waveform. Hence, the RF Driver and
RF MOSFET should be used in the future research.
52
REFERENCES
1.
2.
3.
4.
5.
6.
7.
I.E.Kieft (2005). Plasma Needle: exploring biomedical applications of nonthermal plasmas, Printservice Technische Universiteit Eindhoven: 153.
8.
53
9.
10.
11.
Ingrid E. Kieft, D. D., Anton J.M. Roks and Eva Stoffels (2005). Plasma
Treatment of Mammalian Vascular Cells: A Quantitative Description. IEEE
Transactions on Plasma Science 33(2): 771-775.
12.
D. Kim, B. G., D.B. Kim, W. Choe and J.H. Shin (2009). A Feasibility Study
for the Cancer Therapy Using Cold Plasma. ICBME: 355-357.
13.
14.
15.
Jose A. Perez-Martinex, R. P.-E., Regulo Lopez-Callejas, Antonio MercadoCabrera, Raul Valencia Alvarado, Samuel R. Barocio, Anibal de la PiedadBeneitez (2008). Power Supply for Plasma Torches Based on a Class-E
Amplifier Configuration.
16.
54
17.
Albert Roy Davis and Walter C. Rawls, J. (1988). The Magnetic Effect and
Magnetism and Its Effects on the Living System, Exposition Press.
18.
19.
20.
21.
22.
Lo Keat How (2011). Modeling And Design of Plasma Needle Supply. IVAT.
Johor, Universiti Teknologi Malaysia. Bachelor of Engineering (Electrical).
55
APPENDIX A
56
Fluke Multimeter
57
APPENDIX B
Datasheet
KIT
ATION
EVALU
LE
B
A
IL
A
AV
________________________Applications
___________________Pin Configuration
_______________Ordering Information
PART
MAX038CPP
MAX038CWP
MAX038C/D
MAX038EPP*
MAX038EWP*
TEMP RANGE
PIN-PACKAGE
0C to +70C
20 Plastic DIP
0C to +70C
0C to +70C
-40C to +85C
-40C to +85C
20 SO
Dice
20 Plastic DIP
20 SO
TOP VIEW
Pulse-Width Modulators
REF 1
20 V-
Phase-Locked Loops
GND 2
19 OUT
Frequency Synthesizer
A0 3
A1 4
18 GND
MAX038
COSC 5
17 V+
16 DV+
GND 6
15 DGND
DADJ 7
14 SYNC
FADJ 8
13 PDI
GND 9
12 PDO
IIN 10
11 GND
DIP/SO
For pricing, delivery, and ordering information, please contact Maxim/Dallas Direct! at
1-888-629-4642, or visit Maxims website at www.maxim-ic.com.
MAX038
________________General Description
MAX038
Stresses beyond those listed under Absolute Maximum Ratings may cause permanent damage to the device. These are stress ratings only, and functional
operation of the device at these or any other conditions beyond those indicated in the operational sections of the specifications is not implied. Exposure to
absolute maximum rating conditions for extended periods may affect device reliability.
ELECTRICAL CHARACTERISTICS
(Circuit of Figure 1, GND = DGND = 0V, V+ = DV+ = 5V, V- = -5V, V DADJ = V FADJ = V PDI = V PDO = 0V, C F = 100pF,
RIN = 25k, RL = 1k, CL = 20pF, TA = TMIN to TMAX, unless otherwise noted. Typical values are at TA = +25C.)
PARAMETER
SYMBOL
FREQUENCY CHARACTERISTICS
Maximum Operating Frequency
Fo
Frequency Programming
Current
IIN
VIN
Frequency Temperature
Coefficient
Fo/C
CONDITIONS
MIN
TYP
20.0
40.0
VFADJ = 0V
2.50
750
VFADJ = -3V
1.25
375
1.0
VFADJ = 0V
MAX
MHz
2.0
600
Fo/C
VFADJ = -3V
(Fo/Fo)
V- = -5V, V+ = 4.75V to 5.25V
V+
Frequency Power-Supply
Rejection
(Fo/Fo)
V+ = 5V, V- = -4.75V to -5.25V
VOUTPUT AMPLIFIER (applies to all waveforms)
UNITS
A
mV
ppm/C
200
0.4
2.00
0.2
1.00
%/V
VOUT
Output Resistance
ROUT
0.1
IOUT
mV
0.2
40
mA
VOUT
Rise Time
tR
10% to 90%
1.9
Fall Time
tF
90% to 10%
Duty Cycle
dc
2.0
2.1
12
VP-P
ns
12
ns
47
50
53
1.9
2.0
2.1
VP-P
VOUT
Nonlinearity
Duty Cycle
FO = 100kHz, 5% to 95%
dc
VDADJ = 0V (Note 1)
0.5
47
50
53
2.0
2.1
VP-P
VOUT
THD
1.9
CF = 1000pF, FO = 100kHz
2.0
_______________________________________________________________________________________
(Circuit of Figure 1, GND = DGND = 0V, V+ = DV+ = 5V, V- = -5V, V DADJ = V FADJ = V PDI = V PDO = 0V, C F = 100pF,
RIN = 25k, RL = 1k, CL = 20pF, TA = TMIN to TMAX, unless otherwise noted. Typical values are at TA = +25C.)
PARAMETER
SYMBOL
SYNC OUTPUT
Output Low Voltage
VOL
Output High Voltage
VOH
Rise Time
tR
Fall Time
tF
Duty Cycle
dcSYNC
DUTY-CYCLE ADJUSTMENT (DADJ)
DADJ Input Current
IDADJ
DADJ Voltage Range
VDADJ
Duty-Cycle Adjustment Range
dc
DADJ Nonlinearity
dc/VFADJ
Change in Output Frequency
Fo/VDADJ
with DADJ
Maximum DADJ Modulating
FDC
Frequency
FREQUENCY ADJUSTMENT (FADJ)
FADJ Input Current
IFADJ
FADJ Voltage Range
VFADJ
Frequency Sweep Range
Fo
FM Nonlinearity with FADJ
Fo/VFADJ
Change in Duty Cycle with FADJ dc/VFADJ
Maximum FADJ Modulating
FF
Frequency
VOLTAGE REFERENCE
Output Voltage
VREF
Temperature Coefficient
CONDITIONS
ISINK = 3.2mA
ISOURCE = 400A
10% to 90%, RL = 3k, CL = 15pF
90% to 10%, RL = 3k, CL = 15pF
MIN
2.8
190
-2.3V VDADJ +2.3V
-2V VDADJ +2V
VREF/IREF
Line Regulation
VREF/V+
MAX
UNITS
0.3
3.5
10
10
50
0.4
V
V
ns
ns
%
250
2.3
320
85
4
A
V
%
%
2.5
15
190
-2.4V VFADJ +2.4V
-2V VFADJ +2V
-2V VFADJ +2V
250
2.4
70
0.2
2
MHz
320
IREF = 0
2.48
VREF/C
Load Regulation
TYP
2.50
20
1
1
1
A
V
%
%
%
MHz
2.52
V
ppm/C
2
4
2
mV/mA
mV/V
VIL
VIH
0.8
2.4
IIL, IIH
IIL, IIH
25
POWER SUPPLY
Positive Supply Voltage
SYNC Supply Voltage
Negative Supply Voltage
Positive Supply Current
SYNC Supply Current
Negative Supply Current
V+
4.75
5.25
DV+
4.75
5.25
V-
-4.75
-5.25
I+
35
45
mA
IDV+
mA
I-
45
55
mA
MAX038
OUTPUT FREQUENCY
vs. IIN CURRENT
10M
1.8
33pF
100pF
330pF
1M
3.3nF
100k
10k
MAX038-09
2.0
IIN = 100A, COSC = 1000pF
1.6
FOUT NORMALIZED
MAX038-08
100M
1.4
1.2
1.0
0.8
0.6
33nF
0.4
100nF
0.2
0
-3
1k
-2
-1
1F
VFADJ (V)
3.3F
10F
100
90
47F
100F
0.1
1
10
100
1000
80
DUTY CYCLE (%)
10
MAX038-16B
100
70
60
50
40
30
20
10
IIN = 200A
0
-3
-2
-1
DADJ (V)
IIN = 25A
IIN = 50A
1.00
0.95
IIN = 100A
IIN = 250A
0.90
IIN = 500A
IIN = 500A
1.5
1.0
0.5
IIN = 250A
0
IIN = 100A
-0.5
-1.0
-1.5
IIN = 50A
IIN = 25A
IIN = 10A
-2.0
-2.5
0.85
-2.0
DADJ (V)
MAX038-18
2.0
DUTY-CYCLE LINEARITY ERROR (%)
IIN = 10A
1.05
DUTY-CYCLE LINEARITY
vs. DADJ VOLTAGE
MAX038-17
1.10
NORMALIZED OUTPUT FREQUENCY
MAX038
-1.0
1.0
1.5
2.5
DADJ (V)
_______________________________________________________________________________________
7
6
THD (%)
5
4
3
2
1
0
100
1k
10k
100k
1M
FREQUENCY (Hz)
IIN = 400A
CF = 20pF
IIN = 400A
CF = 20pF
10M
_______________________________________________________________________________________
MAX038
MAX038
0.5V
0V
-0.5V
IIN = 400A
CF = 20pF
TOP: OUTPUT
BOTTOM: FADJ
TOP: OUTPUT
BOTTOM: IIN
TOP: OUTPUT
BOTTOM: IIN
+2V
0V
-2V
_______________________________________________________________________________________
-20
-20
ATTENUATION (dB)
ATTENUATION (dB)
-10
MAX038 12B
MAX038-12A
0
-10
-30
-40
-50
-60
-70
-30
-40
-50
-60
-70
-80
-80
-90
-90
-100
-100
0
10 20 30 40 50 60 70 80 90 100
10 15 20 25 30 35 40 45 50
FREQUENCY (MHz)
FREQUENCY (kHz)
______________________________________________________________Pin Description
PIN
NAME
REF
FUNCTION
2, 6, 9,
11, 18
GND
Ground*
A0
A1
COSC
DADJ
FADJ
10
IIN
12
PDO
13
PDI
Phase detector reference clock input. Connect to GND if phase detector is not used.
14
SYNC
TTL/CMOS-compatible output, referenced between DGND and DV+. Permits the internal oscillator to be
synchronized with an external signal. Leave open if unused.
15
DGND
Digital ground
16
DV+
17
V+
19
OUT
20
V-
Digital +5V supply input. Can be left open if SYNC is not used.
+5V supply input
Sine, square, or triangle output
-5V supply input
*The five GND pins are not internally connected. Connect all five GND pins to a quiet ground close to the device. A ground plane is
recommended (see Layout Considerations).
_______________________________________________________________________________________
MAX038
MAX038
TRIANGLE
COSC
OSCILLATOR
CF
GND
OSC A
OSC B
A0
A1
SINE
SINE
SHAPER
OUT
TRIANGLE
19
MUX
SQUARE
8
7
10
FADJ
DADJ
OSCILLATOR
CURRENT
GENERATOR
RL
CL
COMPARATOR
IIN
MAX038
RF
RD
RIN
-250A
COMPARATOR
*
+5V
-5V
REF
17
20
V+
V-
2, 9, 11, 18
14
PDO
12
PDI
13
2.5V
VOLTAGE
REFERENCE
PHASE
DETECTOR
GND
DGND
DV+
16
15
SYNC
+5V
_______________Detailed Description
The MAX038 is a high-frequency function generator
that produces low-distortion sine, triangle, sawtooth, or
square (pulse) waveforms at frequencies from less than
1Hz to 20MHz or more, using a minimum of external
components. Frequency and duty cycle can be independently controlled by programming the current, voltage, or resistance. The desired output waveform is
selected under logic control by setting the appropriate
code at the A0 and A1 inputs. A SYNC output and
phase detector are included to simplify designs requiring tracking to an external signal source.
The MAX038 operates with 5V 5% power supplies.
The basic oscillator is a relaxation type that operates by
alternately charging and discharging a capacitor, CF,
8
with constant currents, simultaneously producing a triangle wave and a square wave (Figure 1). The charging and discharging currents are controlled by the current flowing into IIN, and are modulated by the voltages
applied to FADJ and DADJ. The current into IIN can be
varied from 2A to 750A, producing more than two
decades of frequency for any value of CF. Applying
2.4V to FADJ changes the nominal frequency (with
VFADJ = 0V) by 70%; this procedure can be used for
fine control.
Duty cycle (the percentage of time that the output waveform is positive) can be controlled from 10% to 90% by
applying 2.3V to DADJ. This voltage changes the CF
charging and discharging current ratio while maintaining
nearly constant frequency.
_______________________________________________________________________________________
Waveform Selection
The MAX038 can produce either sine, square, or triangle waveforms. The TTL/CMOS-logic address pins (A0
and A1) set the waveform, as shown below:
A0
X
0
A1
1
0
WAVEFORM
Sine wave
Square wave
Triangle wave
X = Dont care.
Waveform switching can be done at any time, without
regard to the phase of the output. Switching occurs
within 0.3s, but there may be a small transient in the
output waveform that lasts 0.5s.
Waveform Timing
Output Frequency
The output frequency is determined by the current
injected into the IIN pin, the COSC capacitance (to
ground), and the voltage on the FADJ pin. When
[4]
_______________________________________________________________________________________
MAX038
MAX038
FADJ Input
The output frequency can be modulated by FADJ,
which is intended principally for fine frequency control,
usually inside phase-locked loops. Once the fundamental, or center frequency (Fo) is set by IIN, it may be
changed further by setting FADJ to a voltage other than
0V. This voltage can vary from -2.4V to +2.4V, causing
the output frequency to vary from 1.7 to 0.30 times the
value when FADJ is 0V (Fo 70%). Voltages beyond
2.4V can cause instability or cause the frequency
change to reverse slope.
The voltage on FADJ required to cause the output to
deviate from Fo by Dx (expressed in %) is given by the
formula:
VFADJ = -0.0343 x Dx
[5]
where V FADJ , the voltage on FADJ, is between
-2.4V and +2.4V.
Note: While IIN is directly proportional to the fundamental, or center frequency (Fo), VFADJ is linearly related to
% deviation from Fo. VFADJ goes to either side of 0V,
corresponding to plus and minus deviation.
The voltage on FADJ for any frequency is given by the
formula:
VFADJ = (Fo - Fx) (0.2915 x Fo) [6]
where:
Fx = output frequency
Fo = frequency when VFADJ = 0V.
Likewise, for period calculations:
VFADJ = 3.43 x (tx - to) tx
[7]
where:
tx = output period
10
[9]
Programming FADJ
FADJ has a 250A constant current sink to V- that must
be furnished by the voltage source. The source is usually an op-amp output, and the temperature coefficient
of the current sink becomes unimportant. For manual
adjustment of the deviation, a variable resistor can be
used to set VFADJ, but then the 250A current sinks
temperature coefficient becomes significant. Since
external resistors cannot match the internal temperature-coefficient curve, using external resistors to program V FADJ is intended only for manual operation,
when the operator can correct for any errors. This
restriction does not apply when VFADJ is a true voltage
source.
A variable resistor, RF, connected between REF (+2.5V)
and FADJ provides a convenient means of manually
setting the frequency deviation. The resistance value
(RF) is:
RF = (VREF - VFADJ) 250A
[10]
VREF and VFADJ are signed numbers, so use correct
algebraic convention. For example, if V FADJ is -2.0V
(+58.3% deviation), the formula becomes:
RF = (+2.5V - (-2.0V)) 250A
= (4.5V) 250A
= 18k
Disabling FADJ
The FADJ circuit adds a small temperature coefficient
to the output frequency. For critical open-loop applications, it can be turned off by connecting FADJ to GND
(not REF) through a 12k resistor (R1 in Figure 2). The
-250A current sink at FADJ causes -3V to be developed across this resistor, producing two results. First,
the FADJ circuit remains in its linear region, but disconnects itself from the main oscillator, improving temperature stability. Second, the oscillator frequency doubles.
If FADJ is turned off in this manner, be sure to correct
equations 1-4 and 6-9 above, and 12 and 14 below by
doubling Fo or halving to. Although this method doubles
the normal output frequency, it does not double the
upper frequency limit. Do not operate FADJ open circuit or with voltages more negative than -3.5V. Doing
so may cause transistor saturation inside the IC, leading to unwanted changes in frequency and duty cycle.
______________________________________________________________________________________
20
FREQUENCY
1
C1
1F
C3
1nF
V-
10
8
DADJ
IIN
MAX038
OUT
DV+
DGND
SYNC
CF
19
C2
1F
PDI
COSC
PDO
16
13
12
R3
+2.5V
100k
MAX038
R2
50
SINE-WAVE
OUTPUT
R7
100k
R5
100k
N.C.
15
14
R4
100k
REF
FADJ
R1
12k
2.5V
4
V+ A1
AO
RIN
20k
REF
17
MAX038
5V +5V
R6
5k
N.C.
Fo =
2 x 2.5V
RIN x CF
DADJ
Figure 2. Operating Circuit with Sine-Wave Output and 50% Duty Cycle; SYNC and FADJ Disabled
______________________________________________________________________________________
11
MAX038
Output
The output amplitude is fixed at 2V P-P, symmetrical
around ground, for all output waveforms. OUT has an
output resistance of under 0.1, and can drive 20mA
with up to a 50pF load. Isolate higher output capacitance from OUT with a resistor (typically 50) or buffer
amplifier.
Reference Voltage
REF is a stable 2.50V bandgap voltage reference capable of sourcing 4mA or sinking 100A. It is principally
used to furnish a stable current to IIN or to bias DADJ
and FADJ. It can also be used for other applications
external to the MAX038. Bypass REF with 100nF to minimize noise.
for low temperature coefficient over the whole temperature range. NPO ceramics are usually satisfactory.
The voltage on COSC is a triangle wave that varies
between 0V and -1V. Polarized capacitors are generally
not recommended (because of their outrageous temperature dependence and leakage currents), but if they
are used, the negative terminal should be connected to
COSC and the positive terminal to GND. Large-value
capacitors, necessary for very low frequencies, should
be chosen with care, since potentially large leakage
currents and high dielectric absorption can interfere
with the orderly charge and discharge of CF. If possible, for a given frequency, use lower IIN currents to
reduce the size of the capacitor.
SYNC Output
SYNC is a TTL/CMOS-compatible output that can be
used to synchronize external circuits. The SYNC output
is a square wave whose rising edge coincides with the
output rising sine or triangle wave as it crosses through
0V. When the square wave is selected, the rising edge
of SYNC occurs in the middle of the positive half of the
output square wave, effectively 90 ahead of the output.
The SYNC duty cycle is fixed at 50% and is independent of the DADJ control.
Because SYNC is a very-high-speed TTL output, the
high-speed transient currents in DGND and DV+ can
radiate energy into the output circuit, causing a narrow
spike in the output waveform. (This spike is difficult to
see with oscilloscopes having less than 100MHz bandwidth). The inductance and capacitance of IC sockets
tend to amplify this effect, so sockets are not recommended when SYNC is on. SYNC is powered from separate ground and supply pins (DGND and DV+), and it
can be turned off by making DV+ open circuit. If synchronization of external circuits is not used, turning off
SYNC by DV+ opening eliminates the spike.
Phase Detectors
Internal Phase Detector
The MAX038 contains a TTL/CMOS phase detector that
can be used in a phase-locked loop (PLL) to synchronize its output to an external signal (Figure 3). The
external source is connected to the phase-detector
input (PDI) and the phase-detector output is taken from
PDO. PDO is the output of an exclusive-OR gate, and
produces a rectangular current waveform at the
MAX038 output frequency, even with PDI grounded.
PDO is normally connected to FADJ and a resistor,
RPD, and a capacitor CPD, to GND. RPD sets the gain
of the phase detector, while the capacitor attenuates
high-frequency components and forms a pole in the
phase-locked loop filter.
______________________________________________________________________________________
C1
1F
C2
1F
CENTER
FREQUENCY
RD
14
1
16 17
SYNC DV+ V+
20
VA0
REF
A1
7
10
8
3
4
DADJ
IIN
FADJ
MAX038
OUT
19
RF
OUTPUT
RPD
5
CPD
CF
PDI
COSC
PDO
ROUT
50
13
12
______________________________________________________________________________________
13
MAX038
+5V -5V
MAX038
-5V
+5V
C1
1F
C2
1F
N
14
CENTER
FREQUENCY
16
17
20
SYNC DV+ V+
VA0
REF
A1
R2
3
4
CW
7
R3
PHASE DETECTOR
10
R4
R5
OFFSET
EXTERNAL
OSC INPUT
DADJ
MAX038
IIN
OUT
-5V
RF
OUTPUT
FADJ
R6
GAIN
5
R1
50
19
PDI
COSC
PDO
13
12
C4
C3
CAPTURE FREQUENCY
+5V
-5V
C1
1F
C2
1F
N
14
CENTER
FREQUENCY
16
17
SYNC DV+ V+
20
VA0
REF
R2
A1
3
4
CW
7
R3
10
R4
EXTERNAL
OSC INPUT
R5
OFFSET
DADJ
IIN
-5V
C4
C3
CAPTURE FREQUENCY
OUT
19
PDI
COSC
PDO
13
12
14
R1
50
RF
OUTPUT
FADJ
R6
GAIN
5
MAX038
______________________________________________________________________________________
28
8.192MHz
LD
N11
OSCOUT
OSCIN
N10
FIN
PD1OUT
VDD
VSS
RA0
0.1F
3.3M
MAX427
0.1F
33k
VDD
PDR
BIT7
PDV
BIT8
BIT6
3.3M
BIT9
BIT5
N8 MC145151 FV
N9
PDV
T/R
PDR
N12
RA2
RA1
N13
BIT10
BIT4
N0
BIT11
BIT3
N1
BIT2
33k
BIT12
N
N6
MX7541
N7
14
BIT1
N3
N2
GND
N4
N5
18
0.1F
VREF
10
RFB
OUT2
35pF
20pF
512kHz
1.024MHz
2.048MHz
4.096MHz
8.192MHz
15
1kHz
2kHz
4kHz
8kHz
16kHz
32kHz
64kHz
128kHz
256kHz
OUT1
______________________________________________________________________________________
0.1F
7.5k
10k
0.1F
MAX412
+2.5V
3.33k
2N3904
2.5V
0.1F
2
0V TO 2.5V
35
pF
10
1N914
GND1
PDO
IIN
GND1
SYNC
DADJ
PDI
DGND
GND1
FADJ
DV+
COSC
V+
GND
A0
MAX038
OUT
GND1
A1
V-
VREF
2A to
750A
2N3906
WAVEFORM
SELECT
MAX412
2.7M
1k
11
20
0.1
F
100
50.0
56pF
110pF
-5V
SYNC
OUTPUT
SIGNAL
OUTPUT
56pF
50
0.1F
0.1F
50, 50MHz
LOWPASS FILTER
220nH
220nH
+5V
MAX038
1k
Figure 6. Crystal-Controlled, Digitally Programmed Frequency Synthesizer8kHz to 16MHz with 1kHz Resolution
15
MAX038
___________Applications Information
Frequency Synthesizer
Figure 6 shows a frequency synthesizer that produces
accurate and stable sine, square, or triangle waves with
a frequency range of 8kHz to 16.383MHz in 1kHz increments. A Motorola MC145151 provides the crystal-controlled oscillator, the N circuit, and a high-speed phase
detector. The manual switches set the output frequency;
opening any switch increases the output frequency.
Each switch controls both the N output and an
MX7541 12-bit DAC, whose output is converted to a current by using both halves of the MAX412 op amp. This
current goes to the MAX038 IIN pin, setting its coarse
frequency over a very wide range.
Fine frequency control (and phase lock) is achieved
from the MC145151 phase detector through the differential amplifier and lowpass filter, U5. The phase detec-
___________________Chip Topography
GND
REF
V-
OUT
AO
GND
V+
A1
DV+
DGND
COSC
0.118"
(2.997mm)
SYNC
GND
DADJ
PDI
FADJ GND IIN
GND
0.106"
(2.692mm)
PDO
Package Information
For the latest package outline information, go to
www.maxim-ic.com/packages.
Maxim cannot assume responsibility for use of any circuitry other than circuitry entirely embodied in a Maxim product. No circuit patent licenses are
implied. Maxim reserves the right to change the circuitry and specifications without notice at any time.
16 ____________________Maxim Integrated Products, 120 San Gabriel Drive, Sunnyvale, CA 94086 408-737-7600
2004 Maxim Integrated Products
Printed USA
DEIC515
15 Ampere Low-Side Ultrafast RF MOSFET Driver
Features
Description
Applications
Driving RF MOSFETs
Class D or E Switching Amplifier Drivers
Multi MHz Switch Mode Power Supplies (SMPS)
Pulse Generators
Acoustic Transducer Drivers
Pulsed Laser Diode Drivers
DC to DC Converters
Pulse Transformer Driver
VCC IN
IN
IN GND
VCC
OUT
DGND
DEIC515
15 Ampere Low-Side Ultrafast RF MOSFET Driver
Absolute Maximum Ratings
Parameter
Value
Supply Voltage
30V
Input
-5V to Vccin+0.3V
Parameter
Maximum Junction Temperature
-0.3V to (Vcc,Vccin)+0.3V
Power Dissipation
TAMBIENT25C
Tcase25C
2W
100W
Storage Temperature
-40C to 150C
Value
150oC
-40oC to 85oC
Thermal Impedance (Junction To Case)
JC
0.13oC/W
Electrical Characteristics
Unless otherwise noted, TA = 25 oC, 8V < VCC =VCCIN < 30V .
All voltage measurements with respect to DGND. DEIC515 configured as described in Test Conditions.
Symbol Parameter
VIH
VIL
VIN
IIN
VOH
VOL
ROH
Input current
High output voltage
Low output voltage
Output resistance
@ Output high
Output resistance
@ Output Low
Peak output current
ROL
IPEAK
IDC
Maximum frequency
Rise time (1)
tF
tONDLY
On-time propagation
delay (1)
Off-time propagation
delay (1)
Minimum pulse width
PWmin
Typ
Max
VCCIN -2
0.8
VCC + 0.3
-5
0V VIN VCC,VCCIN
10
Units
V
V
V
0.55
0.025
0.85
A
V
V
0.35
0.85
-10
VCC,VCCIN - .025
VCC,VCCIN = 15V
15
2.5
2.5
4.1
2.5
3.9
17.4
18.5
MHz
ns
ns
ns
ns
ns
CL=2nF Vcc=15V
14.6
16
ns
6.4
8.2
15
30
ns
ns
V
Min
Continuous output
current
fMAX
tR
tOFFDLY
Test Conditions
45
8
VIN = 0V
VIN = VCCIN
10
10
A
A
DEIC515
15 Ampere Low-Side Ultrafast RF MOSFET Driver
Lead Description - DEIC515
SYMBOL
VCC
VCCIN
IN
OUT
PGND
INGND
FUNCTION
DESCRIPTION
Input for the positive output section power-supply voltage. These leads provide
Output Supply Voltage
power to the output section. Both leads must be connected.
Input for the positive input section power-supply voltage. This lead provide
Supply Voltage
power to the input section. This lead should not be directly connected to VCC.
Input
Input signal.
Output
Driver Output.
The system ground leads. Internally connected to all circuitry, these leads provide
ground reference for the entire chip. These leads should be connected to a low noise
Power Ground
analog ground plane for optimum performance.
The input ground lead. This lead is a Kelvin connection internally to PGND.
This lead must not be connected to PGND as excessive current can damage this
Input Ground
lead.
Note 1: Operating the device beyond parameters with listed absolute maximum ratings may cause permanent
damage to the device. Typical values indicate conditions for which the device is intended to be functional, but do not
guarantee specific performance limits. The guaranteed specifications apply only for the test conditions listed. Exposure
CAUTION: These devices are sensitive to electrostatic discharge; follow proper ESD procedures when
handling and assembling this component.
Bottom View
DEIC515
15 Ampere Low-Side Ultrafast RF MOSFET Driver
Typical Performance Characteristics
Figure 3a - Characteristics Test Diagram
INVCC VCC
VCC
IN
Input
10F
L1
OUT
CL
10F
INGND GND
Application
The very high currents and high speeds inside the DEIC515 create very large transients. To avoid problems with
false triggering, the input to the DEIC515 should be supplied via a common mode choke. This is a simple tri-filar
winding on a small ferrite core. This prevents high speed transients from effecting the input signals, by allowing the
input signals to follow the internal die potential changes without changing the state of the input.
DE275X2-102N06A
RF Power MOSFET
VDSS
1000 V
ID25
16 A
RDS(on)
0.8
PDC
= 1180 W
Symbol
Test Conditions
Maximum Ratings
VDSS
TJ = 25C to 150C
1000
VDGR
1000
VGS
Continuous
20
VGSM
Transient
30
ID25
Tc = 25C
16
IDM
48
IAR
Tc = 25C
EAR
Tc = 25C
20
mJ
V/ns
dv/dt
>200
V/ns
1180
750
5.0
PDC (1)
PDHS (1)
PDAMB (1)
Tc = 25C
Symbol
Test Conditions
Characteristic Values
TJ = 25C unless otherwise specified
min.
VGS = 0 V, ID = 3 ma
VGS(th)
VDS = VGS, ID = 4 ma
IGSS
IDSS
RDS(on)
100
nA
50
1
A
mA
1.6
0.25
C/W
0.50
C/W
+175
175
TJM
-55
Tstg
Weight
5.5
7.5
-55
TJ
GATE 2
SD2
SourceSG2
2
Features
Isolated Substrate
high isolation voltage (>2500V)
excellent thermal transfer
Increased temperature and power
cycling capability
IXYS advanced low Qg process
Low gate charge and capacitances
easier to drive
faster switching
Low RDS(on)
Very low insertion inductance (<2nH)
No beryllium oxide (BeO) or other
hazardous materials
Advantages
(1)
TL
2.5
RthJC (1)
RthJHS
max.
1000
VGS = 15 V, ID = 0.5ID25
Pulse test, t 300S, duty cycle d 2%
VDS = 15 V, ID = 0.5ID25, pulse test
gfs
typ.
DRAIN 2
GATE 1
SG1
SourceSD1
1
IS = 0
VDSS
DRAIN 1
+175
(1)
300
DE275X2-102N06A
RF Power MOSFET
Symbol
Test Conditions
Characteristic Values
(TJ = 25C unless otherwise specified)
min.
typ.
0.3
1800
pF
130
pF
25
pF
21
pF
ns
ns
ns
ns
50
nC
20
nC
30
nC
RG
Ciss
VGS = 0 V, VDS = 0.8 VDSS(max),
f = 1 MHz
Coss
Crss
Cstray
Td(on)
Ton
Td(off)
Toff
Qg(on)
VGS = 10 V, VDS = 0.5 VDSS
ID = 0.5 ID25
Qgs
Qgd
Source-Drain Diode
max.
Characteristic Values
(TJ = 25C unless otherwise specified)
Symbol
Test Conditions
min.
IS
VGS = 0 V
ISM
VSD
IF = IS, VGS = 0 V,
Pulse test, t 300 s, duty cycle 2%
typ.
Trr
IF = IS, -di/dt = 100A/s,
VR = 100V
QRM
IRM
(1)
max.
6
96
1.5
200
ns
0.6
For detailed device mounting and installation instructions, see the DESeries MOSFET Mounting Instructions technical note on IXYS RFs web
site at www.ixysrf.com/Technical_Support/App_notes.html
IXYS RF reserves the right to change limits, test conditions and dimensions.
IXYS RF MOSFETS are covered by one or more of the following U.S. patents:
4,835,592
4,860,072
4,881,106
4,891,686
4,931,844
5,017,508
5,034,796
5,049,961
5,063,307
5,187,117
5,237,481
5,486,715
5,381,025
5,640,045
DE275X2-102N06A
RF Power MOSFET
275X2-102N06A Capacitances vs Vds
10000
Ciss
Coss
Capacitance in pF
Crss
1000
100
10
0
100
200
300
400
500
600
700
800
900
1000
Vds in Volts
S = S1 = Source1
S = S1 = Source1
G1 = Gate1
D1 = Drain1
G2 = Gate2
D2 = Drain2
S = S2 = Source2
S = S2 = Source2
Note: Sources S1, S2 are independent, having no common connection between them for the package diagram.
DE275X2-102N06A
RF Power MOSFET
102N06A DE-SERIES SPICE Model
The DE-SERIES SPICE Model is illustrated in Figure 1. The model is an expansion of the SPICE level 3
MOSFET model. It includes the stray inductive terms LG, LS and LD. Rd is the RDS(ON) of the device, Rds
is the resistive leakage term. The output capacitance, COSS, and reverse transfer capacitance, CRSS are
modeled with reversed biased diodes. This provides a varactor type response necessary for a high
power device model. The turn on delay and the turn off delay are adjusted via Ron and Roff.
10 DRAIN
Ld
4
Rd
Lg
Doff
D1crs
Roff
D2crs
20 GATE
8
1
5
Ron
Don
Dcos
Rds
M3
2
7
Ls
30 SOURCE
This SPICE model may be downloaded as a text file from the IXYS RF web site at
www.ixysrf.com
Net List:
*SYM=POWMOSN
.SUBCKT 102N06A 10 20 30
* TERMINALS: D G S
* 1000 Volt 6 Amp 1.6 Ohm N-Channel Power MOSFET
M1 1 2 3 3 DMOS L=1U W=1U
RON 5 6 .5
DON 6 2 D1
ROF 5 7 1.0
DOF 2 7 D1
D1CRS 2 8 D2
D2CRS 1 8 D2
CGS 2 3 1.9N
RD 4 1 1.6
DCOS 3 1 D3
RDS 1 3 5.0MEG
LS 3 30 .5N
LD 10 4 1N
LG 20 5 1N
.MODEL DMOS NMOS (LEVEL=3 VTO=4 KP=2.3)
.MODEL D1 D (IS=.5F CJO=10P BV=100 M=.5 VJ=.2 TT=1N)
.MODEL D2 D (IS=.5F CJO=400P BV=1000 M=.6 VJ=.6 TT=1N RS=10M)
.MODEL D3 D (IS=.5F CJO=400P BV=1000 M=.35 VJ=.6 TT=400N RS=10M)
.ENDS
An
IXYS Company