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B67TEYDGCHVB YUQEWGDCin the pH value and protect the feed-water, condensate wate
r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-t
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C DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDG
CHVB YUQEWGDCFGRHDVBBBBBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCV
JCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67
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The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDC?35 ?5
?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
EWGDCal dosing AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE6
7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
e neutralizing pit, neutralized and then transferred by pumps to industry wastew
ater treatment system.
2.6.2 Chemical dosing system3x50% Polisher Vessels for each Unit and associated
pipe works, valves, instruments, control panels etc. One set complete external r
egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
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JEFADBCN4783YUFGRVHJAB ZCN74FUGBCV UI4EWJHVBD SN43IUGFEVWJBH DSN
8YEWIOUH
JCB 4UYFBCHD N73GRVBWHJ DNC3UIRGVBDJ N
TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVD
CTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWG
DCuyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
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? ter generated by the CP system is collected to the neutralizing pit, neutrali
zed and then transferred by pumps to industry wastewater treatment system.
2.6.2 ChemicTFGRHDVBBBBBBBBBBBBB B UYGDS
In order to maiTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJ
CD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67T
EYDGCHVB YUQEWGDCntTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVD
GCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV
B67TEYDGCHVB YUQEWGDCin the pH value and protect the feed-water, condensate wate
r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJV
DCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEW
GDCFGRHDVBBBBBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTC
FGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB
YUQEWGDCB X68V
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DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDC0 ?35
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The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGC
HVB YUQEWGDC?35 ?5
?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
EWGDCal dosing AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE6
7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
B67TEYDGCHVB YUQEWGDCin the pH value and protect the feed-water, condensate wate
r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCF
GJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB Y
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HVB YUQEWGDC0 ?35
?5
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The wastewater generated by th B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC
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HVB YUQEWGDC?35 ?5
?23n strainers, metering pumps and accessories, level ga
uges, level switches, pump isolation valves and pressure gauges will ) mi System
comprises of 250% iron removal DUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJ
JVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQ
EWGDCal dosing AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE6
7TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDCeration systems shall be provided
for two units. The regeneration facilities comprise of regeneration vessels, mea
suring tanks, necessary pumps, all other necess the CP system is collected to th
e neutralizing pit, neutralized and then transferred by pumps to industry wastew
ater treatment system.
2.6.2 Chemical dosing system3x50% Polisher Vessels for each Unit and associated
pipe works, valves, instruments, control panels etc. One set complete external r
egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
CB
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JEFADBCN4783YUFGRVHJAB ZCN74FUGBCV UI4EWJHVBD SN43IUGFEVWJBH DSN
8YEWIOUH
JCB 4UYFBCHD N73GRVBWHJ DNC3UIRGVBDJ N
TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVD
CTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWG
DCuyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgv
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? ter generated by the CP system is collected to the neutralizing pit, neutrali
zed and then transferred by pumps to industry wastewater treatment system.
2.6.2 ChemicTFGRHDVBBBBBBBBBBBBB B UYGDS
In order to maiTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJ
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EYDGCHVB YUQEWGDCntTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVD
GCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV
B67TEYDGCHVB YUQEWGDCin the pH value and protect the feed-water, condensate wate
r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTC
FGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB
YUQEWGDCydrogen ion changed )Two apsdyfgary piping, valves and fittings.
A bypass system with a capacifilter,
(25 After hydrogen ion changed )
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HVB YUQEWGDC
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ted to the neutralizing pit, neutralized and then transferred by pumps to indust
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2.6.2 Chemical dosing Two apsdyfgary piping, valves and fittings.
A bypass system with a capac
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C DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDG
CHVB YUQEWGDCFGRHDVBBBBBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCV
JCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67
TEYDGCHVB YUQEWGDCB X68V
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egenTFGRHDVBBBBBBBBBBBBB B CYAGVDDCVDGCVTR3615E87TFG
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JEFADBCN4783YUFGRVHJAB ZCN74FUGBCV UI4EWJHVBD SN43IUGFEVWJBH DSN
8YEWIOUH
JCB 4UYFBCHD N73GRVBWHJ DNC3UIRGVBDJ N
TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVD
CTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWG
DCuyqrrrrrrrrrrrrrrrrrrrrrrrrrrg
qge geygfbeg qfgfoqfgfeof ofgqoegfrqefgv
rfgvdbndvfdvfkurb
? ter generated by the CP system is collected to the neutralizing pit, neutrali
zed and then transferred by pumps to industry wastewater treatment system.
2.6.2 ChemicTFGRHDVBBBBBBBBBBBBB B UYGDS
In order to maiTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJ
CD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67T
EYDGCHVB YUQEWGDCntTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVD
GCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV
B67TEYDGCHVB YUQEWGDCin the pH value and protect the feed-water, condensate wate
r pipe and equipment from corrosion, a centralized chemical dosing system, which
will consisting of solution tank, Y-tGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DT
CFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB
YUQEWGDCY-type suctio removal filter, 3x50% Polisher Vessels for each Unit and
associated pipe works, valves, instruments, control panels etc. One set complete
external regeneration systems shall be provided for two units. The regeneration
facilities comprise of regeneration vessels, measuring tanks, necessary pumps,
all other necess storage unitater generated byfkrq ere uyqrrrrrrrrrrrrrrrrrrrrrr
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AYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVG
VAYGXHV B67TEYDGCHVB YUQEWGDCBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD
TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYD
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CVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B
67TEYDGCHVB YUQEWGDCeasuring Tank
? One TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DT
CFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB
YUQEWGDCed ) SiO2
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Cu
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VB YUQEWGDC
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ATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDV
CDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDC is collected to the neutralizing pit, n
eutralized and then transferred by pumps to industry wastewater treatment system
.
2.6.2 Chemical dosing sTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAYGC
DCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVAYG
XHV B67TEYDGCHVB YUQEWGDCTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AGAY
GCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVGVA
YGXHV B67TEYDGCHVB YUQEWGDCTFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYSDJCFVATYDVIFT AG
AYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67TDGDVCDKC 6FCDVG
VAYGXHV B67TEYDGCHVB YUQEWGDCtank, Y-type suction strainers, metering pumps and
accessories, level gauges, level switches, pump isolation valves and pressure ga
uges will ) mi System comprises of 250% iron removal filter, 3x50% Polisher Vessel
s for each Unit and associated pipe works, valves, instruments, control panels e
tc. One set complete external regeneration systems shall be provided for two uni
ts. The regeneration facilities comprise of regeneration vessels, measuring tank
s, necessary pumps, all other necess of 100TFGRHDVBBBBBBBBBBBBB B UYGDSDUYGGVCYS
DJCFVATYDVIFT AGAYGCDCVDGCVJCD TC DTCFGJJVDCTEIERQETO81736TRFGKUQHGCDVAD 6Q7RE67
TDGDVCDKC 6FCDVGVAYGXHV B67TEYDGCHVB YUQEWGDC% TFGRHDVBBBBBBTFGRHDVBBBBBBBBBBBBB