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CB.
These e- in the CB are the only charge carriers that we care about in device physics. All of the previous
analysis holds for holes where the only holes of interest (the charge carriers) are located in the VB. A hole is
the empty state in the VB that we discussed previously. A hole can also be visualized as the motion of an
empty state on a bond (missing bond) of an atom that propagates when it is filled by an electron from a
neighboring bond.
The motion of this missing bond (hole) is exactly opposite to the electron that was just captured by the atom
with the missing bond. We can also can look at this in terms of the energy band diagram where the removal
of an e- from the VB creates and empty state in a vast sea of filled states. This empty state moves about
freely in the lattice (like a bubble in a liquid) because of the cooperative motion of the valence e-.
We now look at the process of e- and h+ creation in detail. At 0 K all the bonds are intact as shown below
and all the e- are in the VB and the CB is empty.
The key to making a useful semiconductor device is to precisely control the amount of charge carriers (CB e-
or VB h+) present. We can’t do this simply by raising the temperature because that always creates e- and h+
in pairs. What we need is a different amount of e- or h+ in the lattice. This is where the principle of
semiconductor doping (adding impurities) comes into play. Pure undoped Si (intrinsic) is of very little use to
us as a semiconductor material since there are relatively few CB e- (and VB h+) at room temperature. Now
look at some numbers. There are approximately 5.02e22 Si atoms / cm3 in a Si lattice and since there are
four valence e- per atom, the total number of VB e- in the lattice is about 2.08e23 VB e- / cm3 or
bonds / cm3. At room temperature there is enough thermal energy present to break about 1e10 bonds / cm3
which means that we have 1e10 e- in the CB. This is not enough to make Si sufficiently electrically
When we dope a semiconductor we intentionally add impurities atoms into the Si lattice that alter the ratio of
e- to h+. Normally when a Si bond breaks we get a CB e- and a VB hole. Now we will add either a Col III
(usually B, called p doping or adding acceptors) or a Col V material (usually As, P or Sb, called n doping or
adding donors). Let us first consider the situation when we add B (see below). From the periodic table we
know that B has only 3 valence e- in its outer orbital. (Note that when we dope Si we usually add between
1e16 - 1e19 dopant atoms / cm3 into the lattice which means that we have between 1 in 20.8 million and 1 in
20.8 thousand dopant atoms in the lattice). So, in general each dopant B atom will be completely surrounded
by Si atoms. The B atom will bond with 4 neighboring Si atoms but what about its missing e-?
Now we have an extra e- for each donor atom. As we might guess, this e- will be only weakly attached to its
parent donor atom. The presence of these weakly bound e- causes discrete energy states to be formed within
the band gap and for n doping these states lie right below the bottom of the CB. In Si at room temperature
the extra e- in P lies 0.045eV below the CB edge, while in As it lies 0.054eV below the CB edge. In B on
the other hand the discrete energy state lies 0.045eV above the top of the VB. This is shown in the figure
below.
What this means is that very little thermal energy is required for the extra e- in P to be elevated into the CB
where it becomes a useful charge carrier. The same occurs for the hole provided by B. At room temperature,
almost all of the 1e16 - 1e19 dopant atoms will be ionized which means that they have donated their extra
carrier into the CB (if e-) or VB (if h+). We no longer have only 1e10 carriers / cm3, but 6 to 9 orders of
magnitude more and with this large amount of carriers we can make a useful semiconductor device.
What happens to our doping levels as the temperature changes? At very low temperatures there will not be
sufficient energy for either the VB e- or the bandgap donor e- to make it into the CB and this is known as the
freeze-out region. At 0 K, all of the Si valence e- in the semiconductor lattice will reside in the VB and all of
Up around 550 K the e- from the VB can start making the transition into the CB (bond breaking) and soon
their numbers swamp the numbers due from the dopants (remember there are about 2.08e23 VB e- / cm3
compared with a doping levels between 1e16 – 1e19) and we can no longer operate the device; this is called
the intrinsic temperature range. Remember in order to get a useful device we need a majority of one or the
other type of carrier. See the figures on the next page. Note the difference between Ge and Si with respect
to the onset of the intrinsic temperature range.
One important note in all of this is that the dopant atom must occupy a normal Si lattice site (substitutional),
not an interstitial site (in the middle) for it to have an energy state in the band gap. Remember we need to
increase the number of CB e- or VB h+ in Si in order to get useful electrical properties, and in order to do
this the B, P, or As impurity must sit on a substitutional site in order to get a state near the edges of the
bandgap. The problem with many interstitial impurities is that they tend to create states in the bandgap but
towards the center (deep level impurities) where they cause undesired leakage currents.
Adding impurities can also alter other properties of a material. Take diamond for example. What color is a
pure diamond (clear)? What color are many of diamonds found in nature (green or yellow)? What type of
substitutional impurities would you guess these are from (N and N2 impurities). Now what other colors are
diamonds (blue = B, green from radiation damage to the lattice, brown, pink and red due to other defects in
the lattice).
As a note, the band gap of Ge = 0.66 eV and GaAs = 1.42 eV. The distinction of metal, semiconductor and
insulator can be made on the basis of the concept of the bandgap. Most metal have little or no band gaps,
while insulators have high band gaps (eg. SiO2 = 8eV).
Color (um) nm eV
Far IR 100 100000 0.01
Fiber Optic 1.55 1550 0.80
Fiber Optic 1.3 1300 0.95
IR 1 1000 1.24
Near IR 0.7 700 1.77
Deep Red 0.633 633 1.96
Red 0.616 616 2.01
Red Orange 0.607 607 2.04
Orange 0.595 595 2.08
Amber 0.588 588 2.11
Yellow 0.58 580 2.14
Green 0.565 565 2.19
Emerald
Green 0.53 530 2.34
Blue 0.5 500 2.48
Violet 0.39 390 3.18
near UV 0.35 350 3.54
UV 0.1 100 12.40
far UV 0.05 50 24.80
X-rays 0.01 10 124.00
You can also see how the size of the bandgap also helps determine the operating temperature range of the
semiconductor device (as we discussed previously). All else being equal, the larger the bandgap, the higher
the tempeature the semiconductor device will operate before it hits its intrinsic region. That is one of the
reasons that Si is preferred over Ge and also why GaAs operates at a higher temperature than Si. We can
also see that diamond will operate at an even higher temperature due to its band gap of around 5.6 eV.
Now we look at the properties of the e- and h+ in more detail. First, both are charged particles (- and +) and
the magnitude of the charge is that of the e- = 1.6e-19 C. They also have mass but it is not a simple number.
It is dependent on many different parameters such as the semiconductor material and the direction of travel
within the crystal, temperature etc.
First we note that the mass of an e- in a crystal is not the same as the mass of an e- in free space. It is
probably easier to think of the mass of the e- and h+ in a crystal as the proportionality constant between an
applied electric (E) field and the resulting acceleration of the particle (see figure below).
So when we apply an E field to a crystal and find that the acceleration is different, we can say that the mass
of the e- or h+ has changed. We then redefine our above equation and call the mass of the particle its
effective mass. Using this definition we can again treat the e- and h+ in the crystal in a classical Newtonian
manner instead of using quantum mechanics which actually governs the motion of particles in crystals. We
just change the effective mass to fit the experimental parameters.
The effective masses we are most interested in are called the density of states effective masses (we will
discuss density of states soon). Their values are contained below (at 300 K) as ratios compared with the
mass of a free e-.
We now reintroduce the term intrinsic semiconductor to mean one that is not doped (pure). We can also
define the intrinsic carrier concentration of a semiconductor as the number of ehp that are created (broken
bonds) which is strongly temperature dependent. Remember in this case the carriers are always created in
pairs.
Si / Ge / GaAs = 1e10 cm-3, 2e13, 2e6 broken bonds at room temperature. Note the values change as you
would expect from their respective band gaps; 1.12, 0.66 and 1.42 eV, also note that in Si there are a total of
2.08e23 bonds that can be broken so we are talking about 1 in 1e13 broken bonds in intrinsic Si at room
temperature. Again, this is why pure Si is not a good conductor at room temperature. See figure below.