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013303-2 Thompson, Rosenzweig, and Travish Rev. Sci. Instrum. 76, 013303 (2005)
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013303-3 Sub-skin depth plasma density transition Rev. Sci. Instrum. 76, 013303 (2005)
the system, see Fig. 1. The funnel ensures that the electron
beam will encounter a well-defined plasma column, which is
important for producing the density transition. A photograph
of the plasma column is shown in Fig. 3. The column has a
peak density of approximately 3.5⫻ 1013 cm−3, a transverse
width of about 5 cm full width at half maximum (FWHM),
and well-defined boundaries. Its shape is that of a truncated
Gaussian. The average plasma temperature observed during
this measurement was 6.8 eV, as derived from the I–V curve
measured by a single electrostatic Langmuir probe.16,17 Den-
sity measurements are derived from the probe’s ion satura-
tion current.
While the column described above represents the typical
operating configuration of the plasma source, it is possible to
achieve higher peak densities. The highest peak density
achieved with this source was 6 ⫻ 1013 cm−3. Producing this
density requires the magnetic confinement field to be in-
creased to about 100 G, which both increases the peak den-
sity and narrows the column to about 3 cm FWHM. We
choose not to operate the trapping experiment at maximum
density because high magnetic fields adversely affect the
trapping process.5
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013303-4 Thompson, Rosenzweig, and Travish Rev. Sci. Instrum. 76, 013303 (2005)
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013303-5 Sub-skin depth plasma density transition Rev. Sci. Instrum. 76, 013303 (2005)
FIG. 7. (Color online) Photograph of the plasma density transition appara- FIG. 9. Fine scale measurement of a density transition in a higher density
tus. plasma using a moving probe.
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013303-6 Thompson, Rosenzweig, and Travish Rev. Sci. Instrum. 76, 013303 (2005)
mm this transition fulfills the sub-k−1 p transition length con- few centimeters behind the screen. The metal backstop cools
dition since kregion1
p L trans = 0.95⬍ 1. The transition may actu- the plasma and forces it to recombine into gas before it has a
ally be sharper than this since some blurring due to the probe chance to diffuse.
size can be expected at this level of resolution.
ACKNOWLEDGMENTS
V. DISCUSSION
The authors would like to thank Mike Schneider and
It should be possible to produce transitions even shorter
Chris Muller for their technical assistance. This research is
than the ones we have measured by reducing the spacing
supported by the U.S. Dept. of Energy Grant No DE-FG03-
between the probe and the baffle edge. For the measurement
92ER40639 .
in Fig. 8, the spacing between probe and baffle was mea-
sured to be between 500 and 930 m. The range of measure- 1
T. Tajima and J. M. Dawson, Phys. Rev. Lett. 43, 267 (1979).
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E. Esarey, P. Sprangle, J. Krall, and A. Ting, IEEE Trans. Plasma Sci. 24,
range of transition lengths given this range of spacings is
252 (1996).
1.12–1.86 mm. The measured value of 1.25 mm for the tran- 4
Hyyong Suk, Nick Barov, James Benjamine Rosenzweig, and E. Esarey,
sition length agrees reasonably well with the prediction of Phys. Rev. Lett. 86, 1011 (2001).
5
Eq. (2). The measurements of spacing and transition length M. C. Thompson, J. B. Rosenzweig, and H. Suk, Phys. Rev. ST Accel.
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made during the scan shown in Fig. 9 exhibited a similar 6
S. Bulanov, N. Naumova, F. Pegoraro, and J. Sakai, Phys. Rev. E 58,
level of agreement. It is therefore reasonable to expect that R5257 (1998).
7
the transition will be shorter if the probe/baffle spacing is J. U. Kim, C. Kim, G. H. Kim, N. Hafz, H. J. Lee, and H. Suk, Proceed-
reduced, as predicted by Eq. (2). An attempt to make preci- ings of the 2003 Particle Accelerator Conference, Portland, Oregon
(IEEE, Piscataway, NJ, 2003), p. 1849.
sion measurements of the transition length at different probe/ 8
Matthew C. Thompson, Ph.D. thesis, University of California, Los Ange-
baffle spacings failed because of technical problems with the les, 2004.
9
in-vacuum positioning motors. H. Suk, C. E. Clayton, G. Hairapetian, C. Joshi, M. Loh, P. Muggli, R.
It should also be noted that for a density masking screen Narang, C. Pellegrini, J. B. Rosenzweig, and T. C. Katsouleas, in Proceed-
ings of the 1999 Particle Accelerator Conference, New York (IEEE, Pis-
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placed behind the screen to prevent back diffusion of the 10
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plasma. The purpose of such a barrier is the same as the one C. Pellegrini, and J. B. Rosenzweig, IEEE Trans. Plasma Sci. 28, 271
that lead to the diffusion control funnel discussed earlier. If (2000).
11
J. B. Rosenzweig, D. B. Cline, B. Cole, H. Figueroa, W. Gai, R. Konecny,
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N. Barov, J. B. Rosenzweig, M. E. Conde, W. Gai, and J. G. Power, Phys.
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13
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behind the density screen, except for a small slit of about 5 14
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15
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17
Francis F. Chen, in Plasma Diagnostic Techniques, edited by Huddlestone
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