Академический Документы
Профессиональный Документы
Культура Документы
2pW 2-Transistor
Voltage Reference
Mingoo Seok, Gyouho Kim, Dennis Sylvester, David Blaauw
University of Michigan, Ann Arbor, MI
Abstract- A voltage reference using a depletion-mode device is [1,2,5]. Although the amplifier provides good PSRR, line
designed in a 0.13m CMOS process and achieves ultra-low sensitivity and other error correction, the associated power and
power consumption and sub-1V operation without sacrificing area overhead is significant. Recent designs use supply voltage
temperature and supply voltage insensitivity. Measurements independent current sources [3,4], however the current sources
show a temperature coefficient of 3.6ppm/oC, line sensitivity often rely on MOSFETs in saturation mode, which increases
of 0.033%/V, power supply rejection ratio of -67dB, and power consumption. In addition, the saturated MOSFETs
power consumption of 2.2pW. It requires only two devices require headroom, limiting supply voltage scalability. In this
and functions down to Vdd=0.5V with an area of 1350m2. A paper, we eliminate amplifiers and saturated devices while
variant for higher Vout is also demonstrated.
maintaining excellent voltage insensitivity, which enables
I. INTRODUCTION improvements in supply voltage scalability, power
consumption, and area.
Voltage references are vital to many digital and analog
blocks including voltage regulators and A/D converters. They Top Stack
are also essential to bias analog circuitry. Temperature and Vdd
supply voltage insensitivity along with power and area are key
Bottom Stack
metrics for voltage references. There have been several M3 Vss
approaches to designing voltage references in CMOS Vdd Vdd
3/60
technology [1-5]. Vref
Recently sub-1V operation for voltage references has M1 Vss M1 Vss M4
gained attention since technology forecasts project supply 3.3/60 9/60 21/60
voltages well below 1V for highly-scaled low-power CMOS Vref
Normalized TC
L1 m1VT 20
[EQ2]
W2 Vref VTH 2
= 2Cox 2 (m2 1)VT 2 exp( ) 15
L2 m2VT
mm mm C WL 10
Vref = 1 2 (VTH 2 VTH 1 ) + 1 2 VT ln( 1 ox1 1 2 ) [EQ3]
m1 + m2 m1 + m2 2Cox 2W2 L1
5
Sizing M1 and M2 in the 2T voltage reference aims to 1
minimize both power consumption and temperature sensitivity. 0.3 0.7 1.0 1.3 1.7 2.0
The longest gate length (L1=L2=60m) allowed by the process Normalized W1/W2
design rules is used for both devices for ultra-low power
consumption, although shorter gate length can be used to Fig. 2. Proper sizing of two transistors minimizes
reduce footprint if energy budget for voltage references is temperature dependency (simulated results).
relaxed. The widths (W1=3.3m, W2=1.5m) are chosen to
minimize temperature sensitivity. In selecting widths, the -0.9
different characteristics ( and m) of two devices must be
-1.0
considered. As shown in Figure 2 and Equation 3, the Normalzed (PSRR)
optimum W1 and W2 balances out the temperature-dependent -1.1
parts from the two terms in Equation 3, resulting in little -1.2
temperature coefficient. -1.3
Since coupling through the parasitic MOSFET capacitance
-1.4
can affect PSRR, an output capacitor is added for signal
robustness. Simulated behavior in Figure 3 shows that larger -1.5
Cout=0.4pF
output capacitance improves PSRR as expected. -1.6
** 2T voltage reference
** Noise frequency = 10MHz
The minimum supply voltage is limited by whether Vds of
1f 10f 100f 1p 10p
M2 is larger than 3-4VT. If not, Equation 2 does not hold since Output Capacitance [F]
the final Vds term in Equation 1 cannot be neglected. On the
other hand, the maximum supply voltage is set by reliability Fig. 3. A larger output capacitor provides better PSRR
issues such as oxide breakdown. If necessary, diode connected (simulated results).
transistors can be added between Vdd and M1 to increase the
maximum Vdd. To evaluate the tolerance of the 2T voltage reference to
Equation 3 implies a design constraint on the required process variation, 47 dies from a single run are measured as
difference of VTH between the two devices (M1 and M2). shown in Figure 6. Although operation occurs in the sub-VTH
Assuming typical subthreshold swing (90mV/dec) for the two regime, process variation impact is small due to 1) the linear
devices (i.e., m1=m2=1.5), the minimum VTH difference is effect of VTH on output voltage and 2) large device dimensions,
approximately 1.33Vref from Equation 3 if we can neglect the suppressing both VTH variation due to random dopant
second log term to the first order. Note that Vref is equivalent fluctuations and geometric variations. The standard deviation
to Vds of M1, which should be larger than 3~4VT as shown of the output voltage for the 2T voltage reference is 1.3mV
above (i.e. to neglect the final Vds term in Equation 1). Hence, without post-silicon trimming. Since all 47 dies are from a
the minimum VTH difference is approximately 4-5.3VT for this single wafer, it is hard to evaluate the tolerance to wafer-to-
type of voltage reference. wafer variation yet. Corner case simulation shows +/- 2%
maximum output voltage change due to global VTH variation
III. 2T REFERENCE MEASURED RESULTS of the two different devices, which could be addressed using
Figure 4 shows measured results from a test chip post-silicon trimming.
fabricated in a standard 0.13m CMOS technology with no Table I compares the 2T voltage reference to recently
process options. With a 0.4pF finger-shaped metal-to-metal published work in bulk CMOS [2-4] and SOI processes [5].
output capacitor, the 2T voltage reference exhibits a TC of The TC and line sensitivity compare favorably with previous
<4ppm/oC across a range of Vdd. The reference achieves an
175.6 175.6 -66 V =1.4V
dd,dc
o 100
Temp=20 C
175.5 175.5
-68 Setup limits
Current [pA]
PSRR [dB]
175.4 175.4 higher freq. testing
Vref[mV]
Vref[mV]
10
175.3 175.3
-70
175.2 Vdd=0.5V TC=3.4ppm
175.2
o
Temp=-20 C LS= 0.022%/V gate Vdd=0.5V
175.1 Vdd=1.2V TC=3.6ppm
175.1 o
Temp=20 C LS= 0.033%/V
1 leakage Vdd=1.2V
Vdd=3.3V TC=3.0ppm
-72
o
Temp=80 C LS= 0.029%/V Vdd=3.3V
175.0 175.0
-20 0 20 40 60 80 0.5 1.0 1.5 2.0 2.5 3.0 3.5 100 1k 10k 100k -20 0 20 40 o 60 80
o
Temperature[ C] Vdd[V] Frequency [Hz] Temperature [ C]
(a) (b) (c) (d)
Fig. 4. Measured results for the 2T voltage reference: (a) temperature coefficient, (b) line sensitivity,
(c) power supply rejection ratio, (d) current consumption.
343 343 1k
-56
342 342
-58
Current [pA]
100
Vref [mV]
PSRR[dB]
Vref [mV]
gate leakage
341 341 o
Temp=-20 C LS=0.036%/V -60
o
Temp=20 C LS=0.036%/V
o
Temp=80 C LS=0.046%/V -62 10
340 340
Vdd=0.5V TC= 33.77ppm Vdd=0.5V
Vdd,dc=1.4V Vdd=1.2V
Vdd=1.2V TC= 32.63ppm
-64 Temp=20oC Vdd=3.6V
339 Vdd=3.6V TC= 31.10ppm 339
1
-20 0 20 40 60 80 0.5 1.0 1.5 2.0 2.5 3.0 3.5 100 1k 10k 100k -20 0 20 40 o 60 80
o
Temperature [ C] Vdd [V] Frequency [Hz] Temperature [ C]
(a) (b) (c) (d)
Fig. 5. Measured results for the 4T voltage reference: (a) temperature coefficient, (b) line sensitivity,
(c) power supply rejection ratio, (d) current consumption.
work while silicon footprint is reduced significantly since it IV. 4T VOLTAGE REFERENCE
uses only two devices. In addition, power consumption is
We also demonstrate a 4T voltage reference to produce a
reduced by about three orders of magnitude, realizing a pW
higher Vref by stacking two 2T voltage references, as shown in
voltage reference for the first time. Also the 2T voltage
the right of Figure 1. Since the ground for the top stack is the
reference is operational down to 0.5V. The small power
output of the bottom stack, TC and PSRR are expected to
consumption makes it feasible to use the 2T voltage reference
degrade somewhat compared to the 2T reference.
for ultra-low power systems without dominating the total
power budget.
4T ref
14 47 dies
o
20 C, V dd =1.2V
2T ref 12
12 47 dies mean = 345.3mV
o
20 C, Vdd=1.2V 10 = 2.7mV
no trimming
10 mean = 176.77mV
8
Count
= 1.3mV
8 no trimming
6
Count
6 4
4 2
2 0
336 340 344 348 352 356
0 Nom inal V ref [mV]
176 180 184
Nominal Vref [mV] Fig. 7. Measured output distribution of the 4T reference
Fig. 6. Measured output distribution of the 2T reference.
Table. I Comparison table (size in ( ) represents the area normalized to a 0.35m technology).
2T 4T [2] [3] [4] [5]
Process 0.13m CMOS 0.13m CMOS 0.35m CMOS 0.35m CMOS 0.6m CMOS CMOS/SIMOX
Vdd,min 0.5V 0.5V 1V 0.9V 1.4V 0.6V
Vout 175.5mV 341.5mV 190.1mV 670mV 309.3mV 530mV
TC 3.6ppm/oC 33.8ppm/oC 16.9ppm/oC 10ppm/oC 2.7ppm/oC 20ppm/ oC
LS 0.033%/V 0.036%/V 0.76%/V 0.27%/V 0.012%/V N/A
-70/-67dB -58/-59dB -41/-28/-17dB -47dB/-38/-41dB -47dB/-20dB
PSRR N/A
(100/100kHz) (100/100kHz) (100/100k/100MHz) (100/100k/100MHz) (100Hz/10MHz)
4.43pA0.5V 21.7pA0.5V
Power 250nA1V 40nA0.9V 9.7A3V 0.1mA1V
8.23pA3.3V 272pA3.6V
Size 1350(9785)m2 3500(25369)m2 49000m 2
45000m 2
55000(18715)m 2
60000 m2
Cout
REFERENCES
[1] B.S. Song et al., A Precision Curvature-Compensated CMOS
Cout Bandgap Reference, IEEE Journal of Solid-State Circuits, pp.634-
4T voltage
Pads 643, Dec. 1983
reference
[2] H.W. Huang et al., A 1V 16.9ppm/oC 250nA Switched-
2mm