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ISSN 16486897
JOURNAL OF ENVIRONMENTAL ENGINEERING
AND LANDSCAPE MANAGEMENT
http:/www.vtu.lt/english/editions
Abstract. The problem considered in the paper is mathematical and physical modeling of the adsorption process during
utilization of gas emissions of cured tyres and tyre components. The paper contains synthesis and analysis of mathemati-
cal models for violent and moderate gassing. It describes an adsorption scheme, formulates an experimental dependence
of productivity upon the concentration of emissions in an absorber chamber of a system used for trapping of curing gas
emissions and vapors.
mixture. Other assumptions will be introduced in the right part of the equation characterizes the air inlet
further, if necessary. Designation of literal nota- as a result of a chemical reaction, the second member de-
tions and symbols standing for physical and scribes the heat outlet due to heat interchange with a gas
chemical characteristics and technological pa- and vapor mixture, the third member is the heat outlet for
rameters is given in the paper in a traditional the escaped gas and vapor mixture, the last component is
form [5]. the heat consumption for vaporization.
In equations (15) we use values for heat of liquid
4. Mathematical modeling of processes taking place vaporization and for heat capacities of liquid, solid and
with gas emissions of small quantities gas components. To calculate these values the following
equations can be derived:
To evaluate the temperature of a gas and vapor mix-
thus vaporization heat of pure substance is de-
ture we formulate an equation of heat balance:
fined analytically as the solution of the follow-
ρmix CmixVmix ⋅ dT = ing equation:
αÒ (T − Tl ) SÑÂ ⋅ d τ − I 2Σ ρmix ÑmixÒ ⋅ d τ + d ( ln PVP ) ∆HV
=− ; (6)
m n (1) d (1 T ) R∆ZV
Cmix SmixT ∑ I Ã 1 j + ∑ I Ï1i ⋅ d τ.
j =1 i =1 value ∆ZV at a normal boiling temperature can
The left part of equation (1) reflects the resulting be defined by the formula:
change in heat contents of the gas and vapor mixture, the
∆ZV = 1 − 1 ( PC TBG ) 3 0,5
. (7)
first member in the right part of the equation is the heat
inlet due to heat interchange with the source of the gas Having inserted form (7) into (6) and having evalu-
emitting surface, the second member is the heat outlet with
ated the value ∆HV as it is, we can deduce a design for-
the outgas mixture, the third member is the heat inlet with
the escaped vapors. mula for calculation of ∆HVÂ at a normal boiling tempera-
Density Pmix and modular heat capacity of the mix- ture:
ture Ñmix can be found according to the additivity rule, 0,5
2,3RTBTC KV lg PC TC3
using Mendeleev Clapeyron equation: ∆HVÂ = ⋅ 1 − , (8)
TC − TB 3
PC TB
m n
ρñì = ∑ M Ïi PÏi + ∑ M Ãj C Ãj RT ; (2) where KV is an empirical constant, depending on the tem-
i =1
j =1
perature:
To calculate heat capacity for liquid components at Moreover, equations (15), (16) also contain the val-
an arbitrary temperature we can use the following known ues of gas and vapor flows for I Ï1i , I Ã1 j components that
correlation:
can be calculated in the following way. We can assume
Ñl (Tl ) = À + ÂÒ l + ÑÒ l2 . (11) that a set of liquid components contained in the treated ma-
terial is an ideal system. Then the partial pressures of va-
Constants A, B, C for different substances are listed
por components close to the surface of the treated mate-
in the tables [5].
rial can be written according to the Raoult law for ideal
Heat capacities of gases and vapors will change dur-
systems:
ing a technological process run depending on the pressure.
As heat capacity is connected with enthalpy by the corre- Pi = X i P0i . (18)
lation In accordance with the earlier accepted assumptions,
Ñ p = (∂H ∂T ) p , the vapor pressure of a pure component is calculated by
(12)
the Antoine equation
heat capacity change by pressure change can be written in
P0i = ln ( Ai − Bi T ). (19)
the following form:
By insertion of equation (19) into (18) we deduce a
Ñ p − Ñ 0p ∂ PÃ 2 ∂Z formula for calculation of partial pressures for vapor com-
=− ∫ TÃ d (ln PÃ ) . (13) ponents over the surface of the treated material at an arbi-
∂TÃ 0 ∂TÃ PÃ PÃ
R
trary temperature:
The last equality after transformation leads to the Pi = X i ln ( Ai − Bi T ). (20)
equation
Differentiation of both parts of equation (20) leads
∂Ñ p ∂ RT ∂Z to a formula for calculation of partial pressure increments
2
∂2 H
= = − ⋅ . (14) for vapor components over the material surface by dT tem-
∂P T ∂P∂T ∂T P ∂P p p
perature change:
Here we additionally assume that at a constant pres- X i Bi ln ( Ai − Bi T )
sure heat capacities of gases and vapors practically do not ∆Pi = ⋅ dT + X i ln ( Ai − Bi T ). (21)
depend upon temperature. T2
A differential equation of material balance can be de- According to the earlier accepted assumptions, the
rived for separate components of the mixture. The mate- components of a gas and vapor mixture obey the ideal gas
rial balance equation for the first i component of a vapor laws. Therefore, partial density of the vapor and gas mix-
and gas mixture has the following form: ture components over the material surface can be found
by the Mendeleev Clapeyron equation
I Ï1i SÑÂ ⋅ d τ − I Ï 2i Cni ⋅ d τ = VÑÂ ⋅ dCni . (15)
ρi = Pi M i RT . (22)
The first member in equation (15) reflects the inlet
of the vapor mixture i component to the curing chamber Differentiation of both parts of equation (22) leads
due to vaporization of i liquid component from the sur- to the following equation:
face of the treated material, the second component is the Mi PM
inlet of the vapor mixture i component to the trapping sys- d ρi = ⋅ dPi − i i ⋅ dT . (23)
tem. The right part of equation (15) characterizes a change RT RT 2
in partial concentration of i component in a vapor mixture. By insertion of the form (21) into (23) we derive a
A material balance equation for j component of a va- form for calculation of partial density increments for va-
por and gas mixture can be written in a similar form: por components over the material surface by dT tempera-
I Ã1 j SÑÂ ⋅ d τ − I Ã 2 j C Ãi ⋅ d τ = VÑÂ ⋅ dC Ãj . (16) ture change:
We define the partial mass decreasing due to vapor- 5. Mathematical modeling of processes taking place
ization for i liquid component contained in the treated ma- with gas emissions of big quantities
terial:
In this case heat balance equations will be similar to
τ
mi = miD − S SB ∫ I Ï1i ( τ ) ⋅ dx. (25) those for processes taking place with gas emissions of small
D quantities. Equations for material balance will also be simi-
Mole fraction of i component is expressed through lar to the equation for slow flowing processes, but here it
its partial mass by the following correlation: is more convenient to use as a variable partial density of
the vapor and gas mixture component. It is implied by the
mi fact that in this case by contrast to the previous one it is
Xi = . (26)
n m j m mi not possible to neglect the resistance of liquid and gas
Mi ∑
j =1 M j i∑
+ phases. Therefore, to calculate the flows of gas and vapor
=1 M i
components from the surface of the treated material we use
It possible to express the mass of vapors i compo- the following equation:
nent through density and volume:
mi = ρiV . (27)
(
I i = −βi ρi − ρ∗i . ) (34)
To sum it up, a material balance equation for the first
Time differentiation in the left and right parts of equa-
i vapor component has the following form:
tion (27) and division by the surface area of the treated
material lead to the following equation: I Ï1i ⋅ SÑÂ ⋅ d τ − I Ï 2i ⋅ρ Ïi ⋅ d τ = VÑÂ ⋅ d ρ Ïi . (35)
1 dmi V d ρi A material balance equation for the first j gas com-
⋅ = ⋅ . (28) ponent is:
S dτ S dτ
As the height, volume and cross section area of the I Ã1 j ⋅ SÑÂ ⋅ d τ − I Ã 2 j ⋅ρ Ãj ⋅ d τ = VÑÂ ⋅ d ρ Ãj . (36)
chamber are connected by the correlation H = V S , and To formulate a constructive mathematical description
the left part of equation (28) is the flow of the i vapor com- of the processes it is reasonable to make a number of as-
ponent, this equation can be transformed as follows: sumptions.
In accordance with the assumptions accepted earlier,
d ρi the i component density close to the surface of the treated
I Ï1i = H ⋅ . (29)
dτ material ρ∗i can be considered as an equilibrium value, i e
Inserting formula (24) into (29), it is possible to de- a value uniquely defined by the state of a liquid phase. The
rive an equation for calculating partial vapor flows released i component density for camera volume ρi can be found
from the surface of the treated material: from balance equations.
The physical meaning of additives from equations
X i Bi ln ( Ai − Bi T )
Mi ⋅ dT + (35) and (36) is similar to that of corresponding additives
H RT
T2 − from equations (15), (16). Just like in the case with pro-
I Ï1i = dX i ln ( Ai − Bi T ) . (30) cesses taking place with gas emissions of small quantities,
dτ
Mi volumetric capacity of a system for trapping toxic emis-
2 ⋅ dT ⋅ X i ln ( Ai − Bi T ) sions is connected for the first vapor and gas mixture i com-
RT ponent with its concentration through power dependence.
I Ã 1 j partial flow of j gas component included into Partial pressures of the gas and vapor mixture com-
ponents are connected with their weight concentrations
formula (16) is defined in the following way. The kinetic according to the known formula [6].
equation of a reaction taking place inside or on the sur- Equations (35), (36) contain the partial flow values
face level of the treated material is written in the follow-
of vapor I Ï1i and gas I Ã1 j components. Vapor flows
ing form:
I Ï1i can be calculated according to the following formula:
W = kCliϕi Clkϕk . (31)
The dependence of the chemical reaction constant (
I Ï1i = −β Ïi ρ Ïi − ρ∗Ïi . ) (37)
speed upon temperature is determined by the Arrhenius law
According to the earlier accepted assumptions, the
k = Z ln ( − E RT ). (32) components of a gas and vapor mixture obey the ideal gas
Taking into account that the vaporization intensity is laws. That is why partial density of a vapor component
proportional to the chemical reaction speed and the sur- close to the surface of the treated material can be found
face area of the treated material, we finally deduce: by the Mendeleev Clapeyron equation:
Similarly to the processes taking place with gas emis- in the curing process upon their concentration in the cham-
sions of small quantities partial pressures of vapor com- ber. As to measure the productivity of the trapping system
ponents over the surface of the treated material can be cal- directly is considerably difficult, in this work we used an
culated according to the formula: indirect method for productivity evaluation based on the
following factors.
(
Pi∗ = X i ln Ai − Bi T ∗ . ) (39) If the change in the mass concentration of j compo-
nent is known for some time period, then it is possible to
Choosing a considerably thin layer over the surface
calculate the component mass change in the chamber
of the phase border with the account of temperature conti-
caused by running a vapor and gas trapping system accord-
nuity in space we can deduce the border temperature con-
ing to the formula:
dition of the first genus for the phase border:
∆m j = ∆C jVk . (43)
T ∗ = TÆ . (40)
Inserting (39) into (38) and taking into consideration Then knowing the density of j component ρ j we can
the border condition (40), we will have: estimate the change in this component volume according
Mi to the following formula:
ρ∗i = ⋅ X i ⋅ ln ( Ai − Bi Tæ ). (41)
RT ∆V j = ∆m j ρ j = ∆C jVk ρ j . (44)
By insertion of (41) into (37) we derive a formula for
Division of the value ∆V j by the time period ∆τ
calculation of partial vapor flows:
leads to the volumetric capacity of the gas and vapor trap-
M
I Ï1i = −β Ïi ρ Ïi − i ⋅ X i ⋅ ln ( Ai − Bi Tæ ) . (42) ping system for j component
RT
J j = ∆V j ∆τ = ∆C jVk ρ j ∆τ . (45)
Partial densities ρ Ïi included into formula (42) are
defined from the material balance equation (35). Mole frac- ( )
Considering mass concentrations kg m3 , this for-
tions of the liquid components X i are calculated in a simi- mula can be written in the following form:
lar way as for slow flowing processes, i e according to for- J j = ∆Ñ jVk C j ∆τ. (46)
mulas (25), (26).
Partial flow of j gas component released from the sur- Using formula (46) it is possible to formulate depen-
face of the treated material is also calculated for slow flow- dence of the trapping system volumetric capacity for j com-
ing processes according to formula (33). ponent upon the concentration of this component in the
Due to complexity of the derived equation system it curing gas emission chamber.
is not possible to give a solution for it in an explicit form. Table 1 lists the experimental data of the dynamic
That is why we use the numerical method of finite differ- change in the concentration of aromatic hydrocarbons re-
ences for approximation of the set. leased during tyre curing and the volumetric system ca-
pacity calculated according to formula (46).
6. Physical model of multicomponent gas absorption Fig 1 shows dependence of aromatic hydrocarbon
concentrations, sulphur organic compounds and aldehydes
At the premises of OJSC Tyre Enterprise Amtel in the curing chamber upon the process duration.
Tchernosemye a trial industrial aggregate was designed
for investigation of curing gas absorption where an alka-
line solution was used as an absorbent.
To get more precise data on the degree of absorption
intensification by temperature increase it is necessary to
formulate an experimental dependence of the system pro-
ductivity used for trapping of gases and vapors released
The received data evidence that the process of trap- increase of trapped gas concentrations according to the
ping released gases and vapors gets more intensive with power law. As a result, at the beginning of the curing pro-
increase of their concentration in the curing chamber. A cess the change in the concentrations of gas emissions is
check for the mathematical model adequacy has shown that nearly linear. As the concentration of released gases and
the difference between the calculation and experimental vapor increases, the system capacity grows, and the com-
data is within a confidence interval. ponent concentration in the chamber drops to certain val-
A graphic analysis in Fig 1 shows that there are two ues: for aromatic hydrocarbons to 1995 mg m3 , for sul-
concentration-time dependences which are sharply defined.
phur content compounds to 584 mg m3 and for alde-
In the first period the concentration of gases and vapor in
the chamber increase, as this period coincides with the cur- hydes to 161 mg m3 . At the beginning of the second
ing cycle. An increase in the gas and vapor contents is also period the concentrations of gas components reach maxi-
observed in an adjoining 2 m work zone (Fig 2). mum values, and at the same time the trapping system
In the second period there is a decrease in the con- works more efficiently. As the concentration of harmful
centration of released gases and vapor, since the trapping gases and vapor drops in the chamber, the efficiency of
system is in operation. Accordingly, the component con- the trapping system decreases, and the curves of the con-
centrations in a 2 m work zone decrease. centration-time dependence gradually approach the zero
It is typical that dependences of the component con- level. In this zone the curves have the characteristics of
centration changes in the first period as well as in the sec- decreasing exponents.
ond one have exponential characteristics. It is explained In order to check, if it is possible to describe gas emis-
by the fact that the trapping system capacity increases with sions during tyre curing by the elaborated mathematical
methods and algorithms, an experimental investigation took
place using an aggregate by 260508 P truck tyres curing
concentration
2. Vlasov, G. Ya.; Syritsyn, L. M.; Tchemerinski, V. B. Uti- composites. M.: L. L. C. Scientific Technical Center of
lization of volatile components in the process of tyre cur- Tyre Industry Scientific and Research Institute, Vol 2,
ing. Problems of chemistry and chemical technology, No 5, 2004, p 176187.
2004, p 9096. 5. Vlasov, G. Ya.; Syritsyn, L. M.; Tchemerinski V. B. Re-
3. Vlasov, G. Ya.; Syritsyn, L. M.; Tchemerinski, V.B. Des- search on gas emission processes during curing of tyre
orption process of curing gases at decreased pressure and components. Caoutchouc and rubber, No 5, 2004, p 15
electrocontact method of heat inlet. Chemical industry, 22.
No 11, Vol 81, 2004, p 584587. 6. Vlasov, G. Ya.; Syritsyn, L. M.; Tchemerinski, V. B. The
4. Vlasov, G. Ya.; Syritsyn, L. M.; Tchemerinski, V. B. An method of absorption parameters calculation for volatile
the problem of curing gases recuperation. In: Proceedings compounds of vent emissions at tyre factories. Production
of the 15th Symposium Problems of tyres and rubber cord and use of elastomers, No 2, 2004, p 2731.
Santrauka
Nagrinëjamas adsorbcijos proceso, utilizuojant vulkanizuotø padangø bei jø komponentø gamybos metu susidariusias dujas,
matematinis bei fizinis modeliavimas. Pateikiama intensyvaus bei neþymaus dujø iðsiskyrimo matematiniø modeliø sintezë bei
analizë. Apraðyta adsorbcijos schema, formulëmis iðreikðta eksperimentiniu bûdu nustatyta produktyvumo priklausomybë nuo
emisijø koncentracijos vulkanizacijos dujø emisijø ir garø sugaudymo sistemos absorbcinëje kameroje.
Genady VLASOV, Leonid SYRITSYN, Vyacheslav TCHEMERINSKI, Nikolai ZHAKOMIN. OJSC Tyre Enterprise
Amtel-Tchernozemye.
Research interests: assembling/adhesive formulation, tread strip, adhesive film, air-stream carrying interlayer, adsorption.