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Challenges of Megapixel Camera Module Assembly and Test

Asif Chowdhury1, Robert Darveaux1, Jay Tome1, Ron Schoonejongen1, Mitch Reifel1, Archie De Guzman1, Sung Soon Park2 ,
Yong Woo Kim2, Hyung Wook Kim2,
1
Amkor Technology, Inc.
1900 S. Price Rd.
Chandler, AZ 85236
achow@amkor.com
480-821-2408 x5949
2
Amkor Technology Korea
Korea

Abstract
Driven by the market growth of mobile phones with
camera, production of image sensor devices has increased
dramatically in recent years. From 2004 an increasing
number of these mobile phones contain megapixel cameras.
The packaging of an image sensor in a camera module
presents several unique engineering challenges. Megapixel
camera module assembly poses further challenges due to
more stringent particle control criteria. For particle control,
special attention has to be given on facilities control,
equipment and material selection, process flow, discipline
among line personnel and continuous particle reduction
effort. Other material, process and equipment selection
criteria for megapixel module are also discussed. Test for
megapixel camera module also has its own challenges. This
paper discusses these challenges and methods to meet them. Figure 1. Examples of megapixel camera module
Introduction
Image sensor devices are used in various applications
Megapixel image sensors are defined as image sensors
such as surveillance, digital still cameras, PC cameras,
with more than a million individual sensors or pixels. Table
medical instruments, bar code readers, PDAs, Toys,
1 shows different image sensor display formats. SXGA and
automotive and mobile phones. Megapixel image sensors
UXGA are examples of megapixel sensors. Some examples
are primarily used in digital still cameras but becoming
of megapixel camera modules are shown in Figure 1.
widely adopted in mobile phones as well. Today digital still
cameras primarily uses image sensors with 3 megapixel or
greater. For mobile phones the most common format today

Designat Name Pixel Array Number of Pixels


or
CIF Common Intermediate Format 352 x 288 101,376
VGA Video Graphics Array 640 x 480 307,200
SVGA Super Video Graphics Array 800 x 600 480,000
XGA Extended Graphics Array 1024 x 768 786,432
SXGA Super Extended Graphics Array 1280 x 1024 1,310,720
(or 1.3 Mega Pixel)
C UXGA Ultra Extended Graphics Array 1600 x 1200 1,920,000
(or 2 Mega Pixel)

Table 1. Common display formats

0-7803-8906-9/05/$20.00 ©2005 IEEE 1390 2005 Electronic Components and Technology Conference
is 1.3 megapixel cameras. Table 2 shows the forecasted Lens Barrel
growth of mobile phones and mobile phones with camera
modules. It is forecasted that by 2007 over 90% of all
mobile phones with camera will have megapixel camera Lens 1
modules. Figure 2 shows the growth of megapixel camera
module. Lens 2
Mount
Lens 3
Total Mobile Mobile Phones
Mobile Phones with with Megapixel
Phones, Camera, Camera, IR Filter
M units M units M units Image Sensor
2002 502 38 -
2003 614 82 2 Substrate
2004 665 190 68
2005 761 281 200 Signal Processor
2006 797 398 358
2007 876 508 483
2008 969 629 616

Table 2. Forecast of mobile phones and mobile phones with


camera modules and megapixel camera modules (Source: Solder Joints Flex Circuit
Amkor Technology)

700 Figure 3. Cross-section of a typical megapixel camera


module.
600

500
in Millions

400
3,500,000
Pixel Size (um) 2.8 3.4 4.0 4.5 5.6 6.0
300
3,000,000
200
Resolution (pixels)

2,500,000
100

0 2,000,000
2002 2003 2004 2005 2006 2007 2008
1,500,000

1,000,000
Figure 2. Forecasted growth of megapixel camera module.
500,000
Mobile Phone Camera Module Trend
-
Cross-section of a typical fixed focus megapixel camera 0.00 0.20 0.40 0.60 0.80 1.00
1/7 1/5 1/3 1/2
module design is shown in Figure 3. It shows a stacked die 1/6 1/4 Optical Format
version where the image sensor is on top of a signal
processing die. There is a flexible circuit with passive Figure 4. Relationship between pixel size, resolution (pixel
components attached to the bottom of the laminate count), and optical format.
substrate. The module design that a particular manufacturer
might choose depends on several factors such as cost, size, eliminate longer wavelength radiation, which would create
available technology, and personal preference. CSP noise in the sensor.
versions of camera modules are also available. One Shown in Figure 4 is the relationship between pixel
example is the Shellcase CSP [1] where the die is encased size, resolution, and optical format. For mobile phone
in glass as part of wafer level processing. While CSP applications, the trends are to increase resolution and
solution may require less stringent particle criteria, it has its reduce optical format. It is clear from Figure 4 that a
own challenges which are beyond the scope of this paper. reduction in pixel size is needed to satisfy these two
Detailed description of other possible camera module opposing requirements.
design is described in an earlier paper published in 2004
SMTA International conference [2]. The Challenge of Particle Control
A typical fixed focus lens system for megapixel is In camera module assembly, particles are usually the
comprised of a mount, lens barrel, IR filter, and 3 or more primary cause of yield loss. Figure 5 shows a pareto of
lens elements. The number of lens elements will vary with assembly related defect for a 1.3 megapixel module. It is
the optical design requirement. The IR filter is used to observed that over 90% of the defects are related to
particle.
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To keep device sizes relatively small, the pixel sizes are Facilities Control
smaller for megapixel sensors as shown in Figure 4. Table 3 shows clean room requirement by assembly process
Currently most megapixel CMOS image sensors have pixel step. The portion of the assembly process where the die is
sizes ranging from 3.0 micron to 3.5 micron while exposed is most sensitive to particle. Until the module is
megapixel CCD sensors have pixel sizes in the encased with the lens system, assembly is typically done in
neighborhood of 2.8 microns. The maximum allowable class 100 environment. Focus and barrel lock is
particle size on a die is typically equal to one pixel. recommended to be done in class 1000 environment while
Hence, for megapixel camera module assembly, particle remainder of the assembly process can be done in class
control strategies must improve. 100K. The actual clean room particle count must be
checked on a regular interval and at strategic places within
the clean room. For example particle detector should be
90
placed close to the die attach and wire bond process area
80
where the die is exposed to the environment. This will
70 provide data on actual particle control level at those critical
60 process areas. Figure 7 shows a class 100 clean room with
50
various particle check point strategically selected based on
process location. Table 4 shows the actual particle count in
%

40
those locations.
30

20 Process Clean Room Class


10 Wafer / Glass Mount
0 Wafer De-tape
Wafer / Glass Saw
Particle on die Particle on glass Others
Die Attach
Figure 5. Defect pareto of a 1.3 megapixel camera module. Die Attach Cure
Wire Bond 100
There are numerous sources for particles in the Glass Attach
assembly line. Particles can be generated due to poor Glass Attach Cure
facilities control, from material selected for assembly, from Mount Attach
equipment, inadequate cleaning steps during process flow, Mount Attach Cure
too many people in the line, etc. Figure 6 shows some Barrel Insert
examples of particle on image sensor die. Continuous Backgrind 1,000
particle reduction must become a standard practice by Focus
assembly engineers. The next few sections discuss each of Barrel Lock 10,000
these in detail from the viewpoint of particle reduction Image Test
effort. They also cover additional criteria for each section Screen Print
which are required for megapixel camera module assembly. Pick and Place
Reflow 100,000
Laser Mark
Singulation
Flex Attach

Table 3. Typical facilities requirement

The environment inside all equipment should be


monitored and steps should be taken for particle reduction.
It is possible that while the clean room particle count is
well under control, the particles inside some of these
equipment are outside the spec of class 100 clean room.
Proper airflow inside the equipment is key in reducing
particles. Keeping covers of the equipment open or taking
them off completely can help reduce particle level inside
the machines. Figure 8 shows a picture of assembly
equipment in operation with the cover open.
Assembly line layout is also another area where special
Figure 6. Examples of particle defects on image sensor die. attention should be given. Smooth laminar airflow inside
the clean room is important in reducing particle count. For
example adequate space between equipments, workbenches

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Air shower
#6 #5 #4
Pass Box

Mount attach
Air lock
#7

Wafer saw Die attach Wire Bond

#1 #2 #3

# Particle check points

Figure 7. Example of strategic locations for particle check point inside class 100 clean room

Over
0.30.3
umum Criteria
Over0.5
0.5um
um
(Reference) (0.5um base)
P oint 1 4 3
P oint 2 0 0
P oint 3 11 8
P oint 4 9 2 100 class
P oint 5 22 16
P oint 6 4 3
P oint 7 0 0

Table 4. Actual particle count data at each of the particle check points shown in Figure 7.

a) All moving parts should be away from the actual


exposed die area so that particle generated does
not land on die surface.
b) Equipments with its own de-ionized airflow
system will help reduce particle.
c) Incoming air should come through a filtration
system ensure clean air coming in.
d) Substrate strip indexing should be done on rollers
instead of on rails to reduce friction which
generates particle.

Figure 8. Equipment shown with cover open to allow In the last two years, a few of the well known assembly
improved airflow. equipment suppliers have come up with equipment
specifically for image sensor assembly. These equipment
and shelves must be allowed. A camera module assembly inherently generate lesser particle by.
floor equipment layout will look sparse compared to that of Megapixel module assembly may require equipment
a standard packaging assembly floor. All workbenches and with tighter process control specifications. For example,
shelves should have adequate ventilation in the form of megapixel modules require a tighter optical center to sensor
perforation to allow airflow. center alignment. The current requirement is +/-50 microns
Equipment Selection to +/-75 microns for VGA designs. The requirement for
Equipment material and design can inherently generate megapixel design is +/-25 micron to +/-50 microns, which
requires advanced assembly equipment as well as tighter
particles during operation. All handling area and moving
parts of the equipment should be made such that particle process control.
generation due to friction is reduced both from a design and
material selection view point. Examples are given below.

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Item Unit Test A B C D E
Method

Cure Conditions 125°C UV 150 °C UV 100°C

1 hr 5 – 7 secs 2 min 5 – 7 secs 60 min

Outgassing % TGA 0.28 N/A 6.85 1.23 N/A

Table 5. Comparisons of adhesive materials in terms of cure conditions and out-gassing properties.

Polycarbonate /
Liquid
Acrylonitrile
Crystal Polyphenelyene Polyphenylene
Item Unit Test Method Butadiene
Polymer Sulfide (PPS) Oxide (PPO)
Styrene
(LCP)
(PC/ABS)
310C, 1
Melt Viscosity Pa-s 600 400 N/A N/A
in/sec
Temperature of
Deflection under C ASTM D648 271 270 130 135
Load (1.82MPa)
Table 6. Mount and lens barrel material properties.

Mount 1st image test 2nd image test(after shaking)


Mat'l
TTL Particle % TTL Particle %

PPS 179 1 0.56% 178 3 1.69%

LCP 179 0 0.00% 187 0 0.00%


Table 7. LCP mount-barrel shows zero particles compared to PPS mount-barrel.

Acrylic Polyolefin Glass


Item Unit Polycarbonate Arton F Optores Topaz
(PMMA) (Zeonex) D263T

Processability Excellent Difficult Good Good TBD Good Difficult

Maximum service
C 90 120 123 171 95 125 529
Temp

Table 8. Potential candidates of lens material.

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Materials Selection
Several of the packaging materials used in camera
modules are standard. Among the standard materials are
silicon die, gold wire, laminate substrate, ceramic substrate,
flex circuit, passive components, and connectors.
However, there are several materials which are somewhat
unique to camera modules when compared to other IC
adhesives, mount, lens barrel, lens elements, and IR glass
filter. The detail material properties and selection criteria
have been discussed in the earlier paper published in
SMTA [2]. A general discussion is provided below on
some of the unique material selection criteria especially
with respect the issue of particle contamination.
In case of adhesives, out-gassing properties are Figure 9. Particle related performance for PPS (left picture)
important in terms of potential cause of contamination. and LCP (right) as materials for mount and barrel.
Adhesives with higher out-gassing may contaminate the
sensor surface or the IR glass during the cure process.
Table 5 shows comparisons of adhesives materials for lens Assembly Process
barrel, mount and lens attach in terms of their cure The assembly process flow for a camera module is
conditions and out gassing properties. shown in Figure 10. The process is broken into 5 separate
flows for wafer, substrate, mount, flex circuit, and module.
For the mount and the lens barrel, the common plastic
Details of camera module process flow have been described
materials used are Liquid Crystal Polymer (LCP),
in the paper published in 2004 SMTA [2]. For fixed focus
Polyphenelyene Sulfide (PPS), Polyphenelyene Oxide
megapixel camera module the process flow is no different.
(PPO) and Polycarbonate/Acrylonitrile Butadiene Styrene
For auto focus modules the focus and lock is obviously not
(PC/ABS). Part of the process is to screw the lens barrel
required.
into the mount. For fixed focus modules the lens barrel is
screwed or unscrewed during the focus test depending on Careful consideration must be given to cleaning and
the test methodology. Choosing the right material inspection steps within the process flow. All jigs, fixtures,
combination between the mount and the lens barrel will carrier frames, and trays must be cleaned prior to use in the
reduce particle generation during this barrel insertion and class 100 clean room environment. Use of ultrasonic wet
focus test process. Another key criteria for selecting the cleaning process is common. Among the 5 separate flows
right material for mount and lens barrel is its ability to shown in figure 10, flows for wafer, substrate and mount
withstand the adhesive cure temperature. Temperature are most critical from a particle related defect stand point.
under deflection under a certain load for each of these This is due the fact that the sensor die is exposed during
materials is shown in Table 6. It is seen that LCP and PPS these process steps. These sub-processes are also done in
have relatively higher temperature of deflection compared class 100 clean room environment except for the mark and
to that of PPO and PC/ABS. For this reason, LCP and PPS singulation process.
are being widely used for mount and lens barrel. A test was For the wafer flow, particles can be generated during
done on mount and barrel each made of LCP and PPS backgrinding process from the backgrinding tape that is
material. Simulated focus operation was performed on each attached on the top surface of the die. Standard
of these mounts and barrels and then the IR glass was backgrinding tape can be used if the wafer goes through a
checked for particles. It was observed that LCP material wet cleaning process before die attach. The standard wet
produced no particle on the IR glass while PPS produced a cleaning during the saw process is adequate. Si particles
small percentage of particles. Table 7 and Figure 9 can be a major source of particle contamination during the
summarize the results. wafer saw process. The standard wet cleaning during the
Similar tests should be done before choosing lens saw process may not be adequate for removing Si dust.
element material as well. Examples of lens element Two steps can be taken to reduce Si partcile contamination
candidates with their processability and maximum service from the saw process. First, the saw process must be
temperature are shown in Table 8. Among the plastic optimized to reduce Si dust accumulation on the wafer. For
materials, Zeonex is being widely used for its good example it has been observed that a two pass saw shows
workability and relatively high service temperature. less Si dust related contamination vs. standard one pass saw
process. Secondly, a separate wet cleaning process after
In the case of IR filter, particles can be generated from
wafer saw can further reduce any Si particle contamination.
the IR coat material. Depending on the coat material and
Sawn wafers should be inspected to ensure cleanliness
process, it may produce flakes during process conditions
before die attach process.
and also during reliability test conditions. IR filter from
each supplier should be tested under the conditions As mentioned in the material section, use of laminate
corresponding to the actual process and reliability test substrate for camera module is increasing. These substrates
conditions to ensure integrity of the coat material. must be cleaned using a wet ultrasonic cleaning process

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Wafer Flow flow, the IR glass saw process should use a similar cleaning
Wafer Mount process as the wafer saw process. After the IR glass is
Backgrind attached to the mount, the mount sub-assembly is attached
De-tape
to the substrate sub-assembly which has the sensor die
attached and wirebonded. Before the mount attach, the
Wafer Mount
mount should also be cleaned and inspected. Wet cleaning
Wafer Saw Substrate Flow after wirebond and before mount attach can significantly
Wafer Clean Substrate Clean Mount Flow reduce particle and improve yield.
Inspection Die Attach Glass Mount The remainder of the module flow and flex attach flow is
done in class 100K room. At this point the camera module
Cure Glass Saw
is much less susceptible to particle defect as sensor die and
Dry/wet Clean Dry/wet Clean the IR filter are already encased.
Wire Bond Glass Attach Cleaning frequency and methodology of equipment in
Dry/wet Clean Cure clean room should be optimized. For example if adhesive
cure ovens are not cleaned regularly, they can be a large
Inspection Dry/wet Clean
source of particle contamination.
Mount Attach Inspection Process flow shown in Figure 10 has many inspection steps
Clean to ensure module cleanliness. As process conditions are
Inspection improved (proven by higher assembly yield), some of the
inspection steps can be eliminated or reduced to a sampling
Cure
basis.
Barrel Insert The listed processes all have specific requirements that
Laser Mark impact the size and / or optical performance of the camera
Singulate module. Some of these requirements exceed current
manufacturer’s standard capability. Hence, advanced
Flex Circuit Flow Module Flow
development with latest state-of-the-art equipment is
required. Some of the critical process capability
Flex Circuit Flow Image Test
requirements are shown in Table 9.
Screen Print Functional Test
Pick & Place Focus Process Attribute Requirement
Reflow Barrel Lock
wafer thickness 150µm
Singulate Flex Attach total thickness
O/S Test Backgrind < 10µm
variation
Pack / Ship damage to microlens
zero
on die
Figure 10. Typical process flow x,y placement +/- 25µm
Die
Attach die tilt +/- 0.2 degrees
before die attach. After die attach process the units should
outgassing zero
be cleaned again. Dry cleaning can be done with ionized
Wire
air-blow and vacuum pull on each sensor attached to min die / mount space 300µm
Bond
substrate. This should be done with the substrate inverted
(die down configuration) so that particles will fall off easily. x,y placement +/- 50µm
Fig 11 shows a semi-auto dry cleaning equipment used Mount
after die attach process. Attach overall optical tilt +/- 0.5 degrees
Wet cleaning is usually done in an inert environment outgassing zero
using ultrasonics. Similar cleaning processing should be Flex
Max lens temperature 85C
repeated after the wirebond process as well. On the mount Attach
Table 9. Typical process capability.

Tilt control is critical for megapixel modules. Most of


the digital still cameras and digital SLR cameras have room
for self-alignment and tilt adjusting capability. Camera
modules in cell phones do not have the room to do this.
Whereas VGA modules require about <+/-0.7o of
maximum tilt, 1.3 to 2 megapixel modules may require <+/-
0.5o of maximum tilt. This means that tighter control will
Figure 11. Semi-auto dry cleaning equipment using be required for die attach and lens holder attach process.
deionized airblow and vacuum. Lens barrel tilt will also need to be controlled. One way to
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reduce tilt is by changing material from paste type to film
type. Tape has better inherent tilt performance compared to
that of paste. Table 10 lists comparison data of a 8mm x
8mm die tilt for film and paste die attach materials. It
shows a magnitude of tilt improvement for film adhesive
material. However tilt performance using paste die attach is
well within the spec limit of <+/-0.5 o. As pixel sizes
increases and goes beyond 3 megapixel, film die attach can
be used if tighter tilt control is required.

Die Tilt (degrees)


Film Die Attach Paste Die Attach
Min 0.00 0.05
Max 0.03 0.18
Avg 0.01 0.09 Figure 12. Examples of particle found on die surface.
SD 0.01 0.04
Sample size 20 20 EDX Result Particle Q'ty
%
Contribution
Table 10. Die tilt comparison for film and paste die attach Substrate 15 45%
material. IR Filter Related 5 15%

Discipline In Assembly Line Sticky Tape 5 15%

Discipline of line engineers and operators is another key Si Dust 4 12%


factor for reducing particle related defects. For example, Not Identified 2 6%
other than the standard practice of wearing appropriate Wafer Related 1 3%
clean room attire and using air-shower, the number of Environmental Related 1 3%
people on the line at any given time should be strictly Total 33 100%
controlled. Humans are organic particle generators and
fewer people in the line and less direct handling of the Table 11. EDX analysis result summary for particle related
device is best. Continuous particle reduction effort is also a defect.
part of the discipline of line engineers as well as operators.
At a basic level, this discipline is no more than a total Figure 12 shows examples of particle found on the die
awareness of the required line cleanliness and its surface. EDX analysis was done to identify the type of
continuous improvement. particles and their sources. Table 11 shows the summary of
the findings. It can be seen that 87% of the particle
Continuous Particle Reduction Effort generated came from laminate substrate, IR filter, sticky
Continuous particle reduction has to be an integral part tape (used for wafer saw), and Si dust. Out of these 75% is
of the assembly process. To improve yield, the particle from substrate, IR filter and sticky tape. These are shown in
related failure analysis must be performed on a regular red in Table 11. The steps taken to reduce particles from
basis. Particles should be analyzed using EDX or similar these 3 sources are described below.
methodology and equipment with the objective of finding Fibers generated from the routing process of the
the source of each particle. Once the source is identified, laminate substrate were the main cause of the substrate
steps must be taken to reduce the particle related failure. related particle. Figure 13 shows the routing areas on a
For image sensor modules, it is imperative that failure laminate substrate. Ultrasonic cleaning of substrate was
analysis lab is an integral part of the assembly line. introduced before die attach. Figure 14 shows a ultrasonic
Example of this continuous particle reduction methodology cleaning equipment. Additionally, the orientation of the
is described in the section below. magazines that hold the substrates was changed. Originally,
Example Of Particle Reduction Methodology the magazines was handled vertically and the substrates
Lower yield was observed during a production ramp were stacked one on top of the other separated by rails. In
phase. First pass analysis showed particle related defect. A this configuration the susceptibility of particle falling on a
detailed failure analysis was done. Objective was to device from the substrate above was higher. So the
identify the particles, find the sources of the particles and magazine handling was changed from vertical to horizontal.
take action to eliminate or reduce them to improve overall This is illustrated in Figure 15.
production yield. Particles related to IR glass were found to be generated
during the IR glass pick and place process. The IR glasses
typically come in rectangular or square sheets. The glass

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Before

IR Filter IR Filter
Tape.

Ejector Pin.
After

Figure 13. Routing area of laminate substrate can IR Filter IR Filter


potentially generate particles. Tape.

Ejector Pin.
Figure 16a. Tape is stretched to ensure gap between IR
filters.

Around 2.5mil

Figure 14. Ultrasonic cleaning equipment for laminate


substrates. Figure 16b. Resultant gap of 2.5 mils between adjacent IR
glass after tape stretch.

Figure 15. Magazine handling was changed from vertical to


horizontal for improving particle on die.

sheets are mounted on to saw tape and then sawn into


individual sizes. Then the sawn IR filters are attached into
the mount or lens holder. It was observed that even though
the glass piece parts were completely sawn, they were
still touching the adjacent IR glass piece parts and were
generating particles during the pick-up operation. The
corrective action was to expand the tape after the saw
operation to ensure gap between adjacent IR glass filters.
This is illustrated in Figures 16a and 16b. A second step
taken was to reverse the IR glass attach (on mount)
sequence as shown in figure 17. The purpose is to ensure
that no particle falls on the IR glass that is already attached.

Figure 17. IR glass attach sequence was reversed to reduce


the potential of particle on die.
To reduce particle caused by sticky tape, 2 steps were
taken as follows.
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a) spin-rinse-dry process was implemented before Example of a auto focus and zoom lens is shown in Figure
wafer backgrind. 19.
b) wafer cleaning process was optimized.
Test
The majority of megapixel camera modules in mobile
To see the effectiveness of implementing these changes,
phones today are fixed focus. The lenses are in a fixed
similar particle analysis was done again. The contribution
position with respect to the image sensor. In the focus test
of particle related to substrate was reduced from 45% to
operation, the lens barrel assembly is set to the proper
14%. The contribution of particle due to IR glass attach
position above the image sensor surface. The goal is to
process went down from 15% to 7%. The overall assembly
achieve the “optimum” focus for the module. This
yield was significantly increased.
optimum position can be defined in several ways, and is
Similar methodology must be applied on a continuous generally a compromise between seeing the best image at
basis to reduce particle related defects for megapxiel image
close range versus far away.
sensor assembly.
Zoom Zoom
Optics Selection For Megapixel In Out
A detailed discussion on optical criteria and
requirements that drives the selection of multi element
hybrid lens system for megapixel camera module is beyond
the scope of this paper. However, a brief discussion on
optics for megapixel is in order.
Megapixel camera modules require a higher
performance lens system which translates to a higher
number of lens elements. To keep the module cost low, Drive Gear
plastic lens elements are widely used. However, some of Worm Screw
the megapixel lens performance requirements push the Actuator
system to a hybrid of plastic and glass elements. 3 plastic
element lens and 1 glass/2 plastic hybrid lens systems are Motor Control
Circuit
common for 1.3 and 2.0 megapixel module respectively.
Figure 18 shows a cross section of a 3 plastic lens system.
The number of elements will increase further for above 2
megapixel module. Glass Lens

Three Plastic
Lenses

Figure 18. Cross-section of a 3 plastic element lens system.


Figure 19. Example of a 3 element zoom lens system.
Geometry is key factor on designing a lens system for a Source: Prismark
particular camera module. Limited space in the shrinking
mobile phones dictates the height of the module. The latest As mentioned in the previous section, for camera
lens systems for the 1.3 and 2 megapixel modules are being module resolution of 2 mega pixel and above, fixed focus
constantly pushed for reduced height which greatly impacts lens will no longer provide an adequate image. Auto focus
the optical performance. There is a trade off between the kens system will be required. In this case, the focus test
height of the lens system and the optical performance. will be a dynamic test.
Within given constraints the performance of the lens system For megapixel modules, the challenge on test comes
depends on the design and manufacturing capability of lens due to two primary factors. First, the test time is longer due
manufacturer. to more data processing requirement. Table 12 shows an
Beyond 2 megapixel camera module, auto focus and estimation of test time for 1.3 and 2.0 megapixel compared
zoom function will be required to deliver the true capability to a VGA. For this comparison, it is assumed that the test
of these image sensors. Several technologies to obtain auto algorithm and CPU speed of tester is equal for all three
focus and zoom are now available in the market. There is resolutions. It can be seen that 1.3 and 2.0 megapixel image
research going on for new technology solutions as well. sensor test can take 4 to 7 times longer respectively
compared to that of VGA. Higher data transmission rate

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and processing speed will be necessary to keep the test time summarizes the passing criteria and test results showing
short, especially for very high megapixel that all samples passed the reliability requirements.

Total number Test Time Reliability SampleS


Resolution Pixel Array
of pixels Factor Condition Result
VGA 640x480 307200 1 item ize
1.3 megapixel 1280x1024 1310720 4 -40℃ -> 85℃( each
2.0 megapixel 1600x1200 1920000 6 Temp Cycle 45 ea PASS
30 min, 24 cycles)
Table 12. Test time factors for 1.3 and 2.0 megapixel
compared to VGA camera modules. High Temp. &
Humidity 80 ℃ / 80% / 72 Hr 45 ea PASS
modules. Secondly, due to the smaller pixel size and higher Storage
number of pixels, the test pass-fail criteria is more stringent. Low Temp. & -40 ℃ / 96 Hr
This issue goes back to the particle control criteria. The test Humidity (natural dry, for 3 45 ea PASS
yield can be improved by tighter control of particle. Storage hours)
There is no industry standard for focus and test method. 1.5m drop, 1 X 6
Drop Test 5 ea PASS
Details of the basics of focus and test methodology has plane
been described in the paper published in 2004 SMTA 20 ~ 2000 Hz, 3 axis
conference [2]. Vibration 5 ea PASS
(X,Y,Z)
Reliability FPC & PCB
There are no industry standards for reliability test Adhesive Peeling Test: 0.8 Kg 5 ea PASS
requirements for camera module in general. The passing Strength
criteria is also defined by each image sensor manufacturer. Holder
These are discussed in detail in the SMTA conference
Adhesive 3 Kg 5 ea PASS
paper [2].
Strength
Lens Torque 0.4 Kg 5 ea PASS
Items Materail Description
Table 14. Reliability test conditions, passing criteria and
Substrate Laminate PCB results.
Flexible Circuit Propriteary
Die attach Conclusions
Ablstik 2035SC 1) Cross-section of a typical megapixel camera module
adhesive
Glass attach & with 3 element lens was shown. The design can vary
depending on types of modules required by end market.
mount attach Ablstik 8387B
2) The need for improved particle control for megapixel
adhesive
camera module was identified.
UV adhesive Loctite 190024 (3106) 3) It is critical to monitor and control actual cleanliness of
Mount and lens class 100 clean room. The layout of the clean room is
LCP also important. Inside of equipment must also be kept
barrel
IR glass Propriteary clean and methods for doing this were described.
4) Equipment design and selection is key for improved
Wire 1.0 MIL(25.40UM) GOLD WIRE
particle control.
Solder paste F10 SN63-90M4 (TYPE 4) 5) Material selection criteria to reduce particle generation
Capacitor 4 pieces were discussed.
6) Need for wet and dry cleaning and inspection during
Flux CHEMICAL, RMA 615 PEN FLUX the assembly process was described.
Connector Propriteary 7) Engineering discipline is a key element to maintain and
control low particle in the clean room.
8) Continuous particle reduction effort must be an integral
Table 13. Material description for 1.3 megapixel camera
part of the assembly process.
module.
9) Example of a methodology of particle source
identification, and process modification to reduce these
A reliability test was done to qualify a 1.3 megapixel
defects was shown.
camera module. The camera module shown in Figure 3 was
10) Optical selection for megapixel module was briefly
manufactured (but one die was used instead of 2 die) using
discussed.
the process shown in Figure 10. The module was a 32 pin
11) Test for megapixel module may follow similar
8mm x 8mm package. Materials for the 1.3 megapixel
methodology as that of VGA module but test time can
camera module are listed in Table 13. Table 14
1400 2005 Electronic Components and Technology Conference
be longer. Pass/fail criteria is also more stringent for
megapixel image sensors.
12) There is no industry standard for reliability
requirements for megapixel camera module.
13) Reliability results of a 1.3 megapixel camera module
were provided.
Acknowlegement
The authors would like to acknowledge all the members
of the Amkor Technology Korea and Amkor Technology
Taiwan teams for contributing to this paper.
References
[1] Shellcase, IC Packaging Technology Expo, January,
2003.
[2] Robert Darveaux, et al , “Camera Module Packaging
Technology”, Proceedings of 2004 SMTA International
Conference, pp. 27-38.

1401 2005 Electronic Components and Technology Conference

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