170 Micromanufacturing Processes

8.5 Finite Element Analysis of MAF Process

It is important to understand the mechanism of material removal and the modeling of sur-
face finish during MAF at micro/nanolevels. The effects of various process parameters on
MRR and surface quality have been evaluated (Jayswal et al., 2005b). Analysis of the MAF
process is difficult because of the irregular geometry of the working gap and the hetero-
geneous properties of the medium. Numerical analysis techniques are usually employed
to solve problems that are difficult to solve with analytical methods. Among various
numerical techniques available, the finite element method (FEM) and finite difference (FD)
method are normally employed to solve such engineering problems. FEM provides more
accurate solutions to problems with complex geometries and nonhomogeneous material
properties. Therefore, FEM is used to understand the MAF process in depth.
In FEM, the governing equations of the process are solved in terms of primary variables,
namely, magnetic potential, intensity of the magnetic field, and magnetic forces at the inter-
face of the FMAB and the workpiece surface. Figure 8.17 shows a schematic diagram of the
front and top views of the MAF process. An enlarged view of the abrasive–workpiece
interface shows the magnetic force (Fm) acting on the workpiece through the MAP. The
normal component (Fmn) is responsible for the penetration of the abrasive particle into the
workpiece, and the tangential component (Fmt) and the mechanical force due to its (FMAB)
rotation are responsible for removal of material in the form of microchips.
The MAF process is based on the electromagnetic behavior of MAPs. MAPs acquire
magnetic polarization and join each other along the lines of the magnetic force under
the influence of the magnetic field, forming an FMAB (Figure 8.17a). Knowledge of the
distribution of magnetic forces on the workpiece surface is essential to determine the sur-
face quality to be produced. To evaluate the distribution of magnetic forces, the governing
equation of the process is expressed in terms of the magnetic potential.
The electromagnetic field can be described in terms of the electric field vector (E) and the
magnetic field vector (H). These vectors are related to the electric (D) and magnetic (B) flux
densities, as well as the field source and electric current density J. Their interrelationships
are expressed in the classical Maxwell's equations (Jefimenko, 1966):

∂B
= ×E =2
∂t
∂D
= ×H = J+
∂t
= 
B = 0

There is no current source in the working gap. This process is assumed to be steady, and
therefore the intensity of magnetic field H can be expressed as a gradient of the magnetic
scalar potential f:
H = 2=f (8.1)
On the basis of certain assumptions (Jayswal et al., 2005a) and considering the axisymmet-
ric form of the problem, the governing equation of the process becomes

1 ∂  ∂f ∂  ∂f
 r mr + mr =0
r ∂r  ∂ r  ∂ z  ∂ z  (8.2)