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Vibert, Phil . Chemical Engineering ; New York Vol. 111, Iss. 11, (Oct 2004): 44-51.
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Like water, power, and compressed air, vacuum is a standard utility in many chemical process plants. Commonly
used, for instance, to remove gases or vapors that otherwise would interfere with a reaction, vacuum enhances
reaction efficiency and yield and the recovery of essential compounds. Under vacuum, the boiling point of liquids
is reduced, which is useful for the processing of temperature-sensitive materials and the separation of liquids.
Heat transfer through liquids is more efficient without the presence of air bubbles, while solid end-products
produced under vacuum from a liquid phase are more homogeneous, and are virtually free of voids caused by
unwanted gas bubbles. Of the primary positive-displacement pumps, oil-sealed rotary piston and vane pumps are
most similar in range in terms of pumping capacity and ultimate pressures (vacuum levels). Liquid ring pumps
employ one or two multiblade impellers concentrically mounted to the drive shaft.
Headnote
Liquid ring and dry pumps are best-suited for applications in the chemical process industries
(ProQuest: ... denotes formulae omitted.)
Like water, power, and compressed air, vacuum is a standard utility in many chemical process plants. Commonly
used, for instance, to remove gases or vapors that otherwise would interfere with a reaction, vacuum enhances
reaction efficiency and yield and the recovery of essential compounds.
Under vacuum, the boiling point of liquids is reduced, which is useful for the processing of temperature-sensitive
materials and the separation of liquids. Heat transfer through liquids is more efficient without the presence of air
bubbles, while solid end-products produced under vacuum from a liquid phase are more homogeneous, and are
virtually free of voids caused by unwanted gas bubbles. Also, aggressive compounds that must be contained can
be better and more safely handled and transferred using vacuum. In particular, vacuum is used to:
* Remove air and its constituents, such as oxygen and water vapor, which, if they are combined with a process
constituent, could alter a chemical reaction
* Remove excess reactants or unwanted byproducts that can compromise efficiency and yield
* Reduce the boiling point for distillation of mixtures
* Dry solute material by removing the solvent
* Create a pressure differential for initiating transport of material from one section to another or through filtration
media
Vacuum is generated by vacuum pumps. The spectrum of vacuum pumps is large, and it can include multiple
stages of pumps in combination to provide systems that either operate at lower pressures or accommodate larger
pumping capacities.
The main building block for any vacuum system is a primary-stage or atmospheric-stage vacuum pump, which
exhausts directly to the atmosphere. Primary pumping devices are categorized based on the method by which they
pump gas:
References
1. Van Atta, C.M., Vacuum Science and Engineering, McGraw-Hill, New York, N.Y., 1965.
2. Vibert, P.D., Dry versus Oil Sealed Vacuum Pumps for Vacuum Coaters, Soc. of Vacuum Coaters 41st Annual
Technical Conference Proceedings, ISSN 0737-5921, pp. 7-8,1998.
3. Vibert, P.D., Mechanical Booster Vacuum Pumps, Society of Vacuum Coaters 42nd Annual Technical Conference
Proceedings, ISSN 0737-5921, pp. 11-12, 1999.
AuthorAffiliation
Phil Vibert
Tuthill Vacuum &Blower Systems
AuthorAffiliation
Author
Phil Vibert is a senior engineer for Tuthill Vacuum &Blower Systems (4840 West Kearney Street, Springfield, MO
65801; Phone: 417-8658715; Email: pvibert@tuthill.com). His career with the company, including Kinney Vacuum,
spans more than 33 years. Involved in the design, application, operation, and troubleshooting of all types of
vacuum pumps and systems, he has sized, selected, and designed thousands of vacuum systems for the chemical
process industries. Vibert, who holds a B.S. in physics from Northeastern University (Boston, Mass.), has authored
several papers and technical publications in the field of vacuum pumps and systems.
: United States--US
: Vibert, Phil
: 111
: 11
: 44-51
: 8
: 2004
: Oct 2004
: New York
ISSN: 00092460
: Trade Journals
: English
: Feature
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: 2016-11-19
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