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Kazuhiro Sayama,*,† Atsushi Nomura,‡ Takeo Arai,† Tsuyoshi Sugita,‡ Ryu Abe,†
Masatoshi Yanagida,† Takashi Oi,§ Yasukazu Iwasaki,§ Yoshimoto Abe,‡ and Hideki Sugihara†
Energy Technology Research Institute, National Institute of AdVanced Industrial Science and Technology
(AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan, Faculty of Science and Technology,
Science UniVersity of Tokyo, Yamazaki 2641, Noda, Chiba 278-8514, Japan, and Nissan Research Center,
Nissan Motor Co., Ltd., 1 Natsushima, Yokosuka, Kanagawa 237-8523, Japan
ReceiVed: December 28, 2005; In Final Form: April 1, 2006
The photoelectrochemical properties of porous BiVO4 thin-film electrodes on conducting glass for H2 production
from water under visible light were investigated. BiVO4 films were prepared by the metal-organic
decomposition method, and particles were 90-150 nm in diameter. Under visible-light irradiation, H2 and O2
evolved in a stoichiometric ratio (H2/O2 ) 2) from an aqueous solution of Na2SO4 with an external bias. The
photocurrent increased with addition of methanol. The band structure of BiVO4 was investigated by open-
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circuit potential, flat-band potential, X-ray photoelectron spectroscopy, and calculations based on density
functional theory. The top of the valence-band potential of BiVO4 was shifted negatively compared to the
potentials of the conventional oxide semiconductors without Bi. We surmise that hybridization between the
O-2p and Bi-6s orbitals might contribute to the negative shift of the BiVO4 valence band. Treatment with an
from https://pubs.acs.org/doi/10.1021/jp057539+.
aqueous solution of AgNO3 improved the photocurrent of the BiVO4 electrode significantly. The maximum
incident photon-to-current conversion efficiency at 420 nm was 44%. This value was the highest among
mixed-oxide semiconductor electrodes under visible light irradiation. AgNO3 treatment also improved the
stability of the photocurrent. The Ag+ ion in/on the BiVO4 catalyzed the intrinsic photogeneration of oxygen
with the holes.
1. Introduction the conducting glass and then firing it. Moreover, relatively high
Since the publication of the Honda-Fujishima effect on TiO2 IPCEs (ca. 25%) were also reported for porous Fe2O3 thin-film
electrodes under UV light,1 photoelectrochemical water splitting electrodes on conducting glass prepared by spraying the glass
with semiconductor photoelectrodes has been regarded as an with a solution containing iron salts.10,15,16 It is worth mentioning
ideal means of converting solar energy directly into clean fuel, that high IPCEs were obtained with this simple wet process,
namely, hydrogen energy.2-22 The energy density of solar light although many defects in the porous film electrodes may have
is relatively low; therefore, many featuresssuch as high energy- been present.
conversion efficiency, high stability, low-cost production, and To effectively absorb visible light from solar light, utilization
simple structure for large-area utilizationsare required for of semiconductors having a narrower band gap is essential. In
semiconductor photoelectrodes. To increase the solar energy studies of multijunction hybrid photoelectrodes, which were
conversion efficiency, effective utilization of visible light over designed to decompose water directly with no external bias,20-22
a wide wavelength region is indispensable. It should be noted development of effective oxide semiconductors for O2 evolution
that oxide semiconductors have many advantages, for example, has been important. However, oxide semiconductor materials
they are generally stable, are suitable for O2 evolution, and are that have efficient O2 evolution ability and a band gap that is
produced easily compared to non-oxide semiconductors. How- narrower than that of WO3 are limited. Some porous thin-film
ever, the efficiencies of various oxide semiconductor electrodes electrodes of various oxide semiconductorsssuch as metal-ion-
with conventional types, such as single crystal or sintered pellet, doped oxides and mixed oxides on conducting glassshave been
are low in the visible-light region, even when a high external investigated;7-10,13-17 however, their IPCEs are not satisfactory.
bias was applied. We have studied new oxide semiconductors for their water-
It was recently reported that a nanocrystalline WO3 thin film
splitting ability under visible light. In the field of photocatalysis,
on a conducting glass electrode showed an excellent incident
BiVO4 semiconductor powder was reported to show high O2
photon-to-current conversion efficiency (IPCE > 75%) for water
evolution when Ag+ or Fe3+ ions were used as electron
decomposition under visible light.5,6 The nanocrystalline WO3
acceptors under visible light, but this semiconductor had no H2
film was prepared by spreading a colloidal solution of WO3 on
evolution ability.19,23,24 The band gap of BiVO4 (2.4 eV) was
* Address correspondence to this author. Phone: +81-(0)298-61-6234. smaller than that of WO3 (2.7 eV). It is speculated that the top
Fax: +81-(0)298-61-4760. E-mail: k.sayama@aist.go.jp. of the valence band consists of Bi-6s and O-2p orbitals;23
† National Institute of Advanced Industrial Science and Technology
therefore, such physical properties as mobility of charge and
(AIST).
‡ Science University of Tokyo. band potentials of BiVO4 are probably different from those of
§ Nissan Motor Co., Ltd. simple oxide semiconductors. In an earlier work, we reported
10.1021/jp057539+ CCC: $33.50 © 2006 American Chemical Society
Published on Web 05/19/2006
Photoelectrochemical Decomposition of Water J. Phys. Chem. B, Vol. 110, No. 23, 2006 11353
briefly that a nanocrystalline BiVO4 film electrode on conduct- 1240 × photocurrent density [µA/cm2]
ing glass showed an excellent IPCE for the decomposition of IPCE ) (2)
water.12 wavelength [nm] × photon flux [W/m2]
In this study, the physical and photoelectrochemical properties The monochromatic photon flux through the band-pass filter
of BiVO4 films, the effect of sacrificial reagent addition, and (Nihon Shinku Kogaku Co.) was measured by an optical
the band structure of BiVO4 were investigated in detail. photodiode power meter (Advantest Co., TQ8210), and it was
Moreover, surface modifications of the semiconductor photo- corrected for the reflection loss at the Pyrex glass cell and the
electrodes,18,25 as well as semiconductor photocatalysts, were FTO glass. The electrodes were characterized by X-ray diffrac-
important for improving efficiency and stability. We report tometry (XRD, Mac Science, MX-Labo), using Cu KR radiation
herein that surface modification of a BiVO4 electrode by at 40 mA, 40 kV, and by Raman spectroscopy (Jasco, NRS-
treatment with an aqueous solution of AgNO3 substantially 1000, 532 nm). Scanning electron microscopy (SEM) was
improved both efficiency and stability under visible-light performed on a Hitachi S-800 instrument. The composition of
irradiation. the semiconductors was measured with an X-ray fluorescence
analyzer (XRF, Rigaku Co., ZSX-mini, 40 kV, 1.2 mA). In the
2. Experimental Section case of X-ray photoelectron spectroscopy (XPS) (Ulvac-Phi,
XPS-1800), an Al anode with a monochromator was used to
2.1. Preparation of BiVO4 Electrode. The BiVO4 films were significantly reduce the background signal. To completely
prepared by a modified metal-organic decomposition (MOD) prevent the charge-up effect, many techniques were used. Both
method.12,26 Bi(NO3)3‚5H2O (Kanto Chemical Co.) in acetic acid a low-energy electron (<2 eV) and a low-energy Ar+ ion (<10
(0.2 mol/L) and vanadium(IV) (oxy)acetylacetonate (Azmax eV) were emitted to neutralize the charges at the same time to
Co.) in acetylacetone (0.03 mol/L) were mixed with a 1:1 the BiVO4/FTO electrode, which was grounded to the sample
stoichiometric ratio of Bi to V. The solution was coated by holder by a Cu wire. The measurement area was relatively large
means of a spin coater (Mikasa Co., 1H-D7, 1000 rpm, 10 s) (2.0-0.8 mm2). The binding energy was referenced to the C-1s
on a conducting glass (FTO glass, Nippon Sheet Glass Co., peak taken at 284.8 eV or the O-1s peak at 531.0 eV. The band
F-doped SnO2, 10 Ω/sq) and fired at 500 °C in air for 30 min. structure and the partial density of states of BiVO4 were
The spin coatings and the calcinations were repeated 6 times. calculated based on density functional theory (DFT), using
The average thickness of the rough film, as measured by a step CASTEP package software (Accelrys Co.). The generalized
meter (Tencor, Alpha step), was ca. 0.5 µm for 6 layers. gradient approximation (GGA-PBE) was applied.
In the case of the surface modifications, the BiVO4/FTO Measurement of H2 and O2 evolution was performed in a
electrode was immersed in various aqueous solutions (0.01 mol/ Pyrex glass cell connected to a closed gas-circulating system.
L) in the dark for 12 h and was then thoroughly washed with The BiVO4/FTO electrode was connected with Cu wire by
distilled water. indium solder, and the connecting part was covered with an
2.2. Photoelectrochemical Measurement and Character- epoxy resin. The light source was a Xe lamp (300 W, Cermax
ization. The photoelectrochemical and capacitance measure- lamp), and the BiVO4 electrode area was ca. 2 cm2. A Pt wire
ments were conducted with a potentiostat (BAS, 612A) and a was used as the counter electrode, and a reference electrode
Pyrex glass cell. A Pt wire and a Ag/AgCl electrode (0.21 V vs was not used. The electrode wires were connected tightly to
NHE, pH 0) were used as the counter and reference electrodes, the Pyrex glass cell with silicone rubber to prevent any air
respectively. For stability testing (the photocurrent-time mea- leakage. An aqueous solution of Na2SO4 (0.5 mol/L, 80 mL)
surement), the photocurrent was measured by a two-electrode was introduced into the cell and was degassed completely, and
system without a reference electrode. An aqueous solution of then argon gas (100 Torr) was introduced into the system. The
0.5 mol/L of Na2SO4 (pH 5.8) was used most often as the cell was preirradiated for few hours to prevent contamination.
electrolyte solution because the stability of the BiVO4 film in Evolved H2 and O2 gases were detected by on-line gas
Na2SO4 (aq sol) was good compared to that in other solutions. chromatography (Shimadzu Co., TCD, 5 Å molecular sieves,
It should be noted, however, that because the Na2SO4 solution argon carrier gas).
was unbuffered, the applied potential was probably overesti-
mated owing to the pH change around the electrode surface 3. Results and Discussion
during the photoreaction. The light source was a Xe lamp (500 3.1. Structure of BiVO4 Film and Photoelectrochemical
W, Ushio Denki Co.) with/without UV cutoff (HOYA, L-42) Properties. Figure 1 shows the SEM photographs of the BiVO4
or band-pass filters. The unfiltered light intensity was measured electrodes prepared by the MOD method. A porous structure
by a spectroradiometer (Yamashita Denso Co., YSR-1100M) was observed; therefore, the electrolyte solution will penetrate
between 350 and 500 nm, corresponding to the active wave- into the pores of the BiVO4 film. The BiVO4 particles were
length of BiVO4, to be 450 W/m2. The light intensity of AM- 90-150 nm in diameter. The BiVO4 electrodes prepared by the
1.5G (Japan Industrial Standard, JIS-C8911) between 350 and MOD method were strong mechanically, and the film was not
500 nm was 175 W/m2; therefore, the unfiltered Xe light removed by a hard scratch with a Teflon plate and a nail,
intensity was nearly equivalent to a condition of 2.6 Sun. The suggesting good adhesion properties of the film due to the strong
semiconductor electrodes were irradiated through the FTO connection between particles and between particles and the
conducting glass. The masked-off irradiated area was 0.28 cm2. conducting glass.
The light-harvesting efficiency (LHE) of the electrode was Three crystalline phases have been reported for synthetic
calculated from the transmittance (T) and reflectance (R) with BiVO4: the monoclinic sheelite type, the tetragonal sheelite
use of an integrating sphere (Jasco, V-570): type, and the tetragonal zircon type.23,24,27-29 The crystalline
phase depends on the synthetic method used for its preparation.
LHE ) 1 - R - T (1) The tetragonal and monoclinic phases have been reported to be
selectively obtained depending on the Bi/V stoichiometric ratio
The IPCE was then calculated from the following equation: in solution, with excess Bi(III) leading to the tetragonal zircon-
11354 J. Phys. Chem. B, Vol. 110, No. 23, 2006 Sayama et al.
Figure 2. (a) XRD pattern of the BiVO4/FTO electrode prepared by the MOD method at 500 °C: (V) monoclinic sheelite-type BiVO4; (*) FTO
conducting glass. (b) XRD pattern of BiVO4 powder prepared by calcination of the same MOD solution at 500 °C.
Figure 7. Time course of H2 and O2 evolution under visible-light to the bottom of the Ecb and is considered to be located just
irradiation (>420 nm). The applied bias was 1.6 V to the Pt counter under the Ecb for n-type semiconductors. According to the small
electrode. band gap of BiVO4, the top of Evb of BiVO4 was calculated to
be more negative than those of TiO2 and WO3.
Absolute values of Ecb and Evb of semiconductors are very
important but are controversial in each method mentioned above.
The comparison method for Voc was simple; however, Voc was
sensitive to light intensity, electrolyte solution, and quality of
film preparation. In the case of XPS measurement, complete
neutralization for the charge-up effect and precise correction
of the binding energy are essential. The Efb from the Mott-
Schottky analysis was affected by the Helmholtz capacitance
for dielectric semiconductors.32 It is considered that the dielectric
property of BiVO4 might cause the upward deviation of the plots
below -0.5 V in Figure 10.32,33 However, it should be
emphasized that all results from these three methodss
comparison of Voc, XPS measurement, and Mott-Schottky
analysissindicated that the top of Evb of BiVO4 was shifted to
less positive potentials in comparison with the values for the
conventional semiconductors without Bi. The negative shift of
the valence band is beneficial because it decreases the band
Figure 8. Density of state (DOS) of monoclinic sheelite-type BiVO4
calculated by the DFT method. Note that the x axis is inverted compared gap of oxide semiconductors without the positive shift of the
to the Figure 9 XPS and that “zero energy” refers to the occupied level. conduction band, leading to the decrease of applied bias.
According to the DFT calculation in Figure 8, the Bi-6s orbital
was mainly located -10 eV apart from the valence band made
mainly of O-2p. However, we also found that the top of the
valence band contained a slight amount of the Bi-6s component
(O-2p, 97%; Bi-6s, 2%; V-3d, 1%) and the Bi-6s peak at -10
eV also contained an O-2p component (O-2p, 15%; Bi-6s, 84%;
V-3d, 1%), suggesting hybridization between the O-2p and Bi-
6s orbitals.34 This hybridization may have contributed to the
upper shift of the BiVO4 valence band. Similar behavior about
the shift of valence band was also suggested in the Bi-6s, the
Pb-6s, or Ag-4d hybrid orbitals of PbBi2Nb2O9 and (AgBi)0.5-
MO4 (M ) W and Mo).35,36 We suggest that the transfer of
holes on the valence band becomes easy with the formation of
a hybrid Bi-6s-O-2p orbital. We also investigated other MVO4
Figure 9. XPS spectra of various semiconductors on FTO conducting (M ) Y, In) electrodes; however, high efficiencies were not
glass. The binding energy was referenced to the C-1s at 284.8 eV: (a) obtained. These results suggest that the Bi orbital probably
BiVO4, (b) Bi2O3, (c) V2O5, (d) WO3, and (e) TiO2. played an important role in the high efficiency of the BiVO4
electrode.
tors easily discharged the electron and that the top of Evb of 3.3. Stability of the BiVO4 Electrode and the Ag Treat-
BiVO4 and Bi2O3 was shifted negatively toward those of ment Effect. Figure 11a shows the time course of the photo-
conventional Bi-free oxide semiconductors. current for the BiVO4 electrode. The photocurrent decreased
The flat-band potential (Efb) of semiconductor electrodes is gradually, but it remained constant at ca. 0.5 mA/cm2 for more
usually measured by Mott-Schottky analysis.10,17 Figure 10 than 10 h. The turnover number of observed photoelectrons to
shows the Mott-Schottky plot of the BiVO4 electrode. The Efb the BiVO4 unit was ca. 60 for 1 h. No change in the BiVO4
of the BiVO4 was -0.6 ( 0.1 V (vs Ag/AgCl). Values of Efb electrode after a 10-h photoreaction was observed in the XRD,
for the WO3 and TiO2 electrodes in the same electrolyte solution XRF, and UV-vis spectra, suggesting that the bulk of BiVO4
were ca. -0.6 and -0.8 V, respectively. Efb is strongly related was intrinsically stable for the photoelectrochemical reaction.
Photoelectrochemical Decomposition of Water J. Phys. Chem. B, Vol. 110, No. 23, 2006 11357
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