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Performance evaluation of 6T, 7T & 8T SRAM at 180 nm technology

Conference Paper · July 2017


DOI: 10.1109/ICCCNT.2017.8204092

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Performance Evaluation of 6T, 7T & 8T SRAM at
180 nm Technology
1 2
Mukesh Kumar Jagpal Singh Ubhi
mu keshrai131985@g mail.co m js_ubhi@yahoo.com
1, 2
SLIET, Longowal, Pun jab

Abstract: The high-speed system and shrinkage in technology dynamic power, current, rise time, fall time and area reduces
lead to more complexity with higher power dissipation. This [4]. It is found that leakage of a transistor is responsible for
paper presents the design, simulation and analysis of 6T, 7T more than 40% of power dissipation occurs in the circuit.
and 8T S RAM cells. The analysis has been done for dynamic Various power reduction techniques like Self -Vo ltage
power, static power, rise time, fall time, delay, and bandwidth Controller circu it, Transistor Stacking, and Supply Vo ltage
measurements for S RAM cells at gdpk180 technology. The Reduction, have been imp lemented. It has been observed that
Cadence Virtuoso tool is used for drawing schematic, layout as voltage increases, the proportionate increase in leakage
editing, design rule checking (DRC), layout versus schematic current occurs [5]. A 16 Kbit memory has been designed that
(LVS ) to check whether layout matches the schematic and operates at the frequency of 1.24 GHz. For cell arrays, sleep
RCX. An attempt is also made to find out delay, static power,
controller and power cut-off during standby mode for low
and dynamic power at different supply voltages. Results
leakage current are used. Programmable timing control
illustrate the static power dissipation is almost same for all the
S RAM cells whereas dynamic power has the least value of 5.45 circuit is used to mitigate the delay variation [6]. It also
µw for 7T S RAM cell and 10.26 µw, the most for 8T S RAM focused on energy analysis of SRAM with multi-threshold to
cell. All the simulation results are carried out at fixed 270C reduce power dissipation and improve performance. For
temperature. reducing leakage current high threshold is required for cross
coupled latch and access transistor. With optimu m device
Keywords: SRAM, DRC, LVS, RCX, Delay, Rise time, Fall combination energy efficiency improved by 6.24 times
time, Power dissipation. whereas, optimu m device co mbination along with
performance boosting and power reduction technique shows
I. INTRODUCTION 33 times improvement of energy efficiency [7]. Transistor
sizing has the very crucial role for a read or write operation
It is very challenging to design electronic gadgets with to be stable [8]. Dual threshold 7T SRAM cell is proposed
very efficient working and consume the least power. Major and compared with the standard 6T SRAM cell. It analyses
issues that persuade the necessity of low power design are the basis of read delay, write delay, leakage power
the increase of different kind of electronic gadgets viz. smart consumption and Static Noise Margin in all the three (hold,
card, audio video supported multimedia products, wireless read and write) mode of operation. Single bit line is used to
device etc. These devices and systems need high density, reduce the access time for read and write operation. The
high speed and low power design [1]. S RAM plays an leakage power consumption and write delay are reduced by
important role in cache memory of co mputer, laptop, analog 61.50% and 66.67% respectively [9].
to digital converter, high speed registers, electronic toys, The detailed analysis of 6T, 7T, and 8T SRAM cell with
mobile phone, camera etc. The SRAM is advantageous as it respect to various electrical parameters is carried out. It
does not require refreshing data until the power is ON. The observes the variation of dynamic power, static power
maximu m attainable data storage capacity of a memory chip dissipation and delay with supply voltage. Also an effort has
approximately doubles in every two years [2]. Consistent been made to analyse the variation of temperature on
scaling leads to the need of very high density, high dynamic and static power dissipation. Full custom layout
performance, low leakage current, less power dissipation design has been done successfully for the said SRAM cells
with lo w cost. and RCX co mpleted successfully.
An attempt to analyze the performance of NAND This paper has been organized into following steps:
and NOR gate based on CMOS technology is done. Result Section I enlists a brief introduction of previous work done.
shows NAND gate dissipates 55.73% lesser static power, Section II has a discussion on the operation of various
less area and less access time [3]. A 6T SRAM has been schematic of SRAM cells. Section III shows the Layout and
designed for low power application in 180 n m and 90 n m its Av-Extracted view that may be used for post layout
technologies. It is observed as scaling down occurs the simulation. In Section IV simu lated results are discussed
along with tables and graphs. Section V has the conclusion of simu lation and parameters measurement has been carried
the paper. out. Layout of schematic is drawn and DRC is checked then
LVS matching occurs. Thereafter, RCX test is run for Av-
Flowchart of Proposed work Extracted view for parasitic ext raction.
The flowchart in Fig.1 shows the brief description
II. DISCUSS ION ON VARIOUS DES IGNS
of the work carried out in this paper. 6T, 7T & 8T SRAM
OF SRAM CELLS
cell schematic is designed in Cadence virtuoso. Further
A. Operation of 6T SRAM
Start
A conventional 6T SRAM memory cell consists of
two inverters cross-coupled to each other along with two
Selection of Various access transistors as shown in Fig.2 [3]. The information is
SRAM cells stored at the two internal nodes P & Q fo r read and write
operation through access transistor.
For the read operation, first precharge bit line (BL)
Schemat ic draw using and bit line bar (BLB) to VDD and then turn “ON” word line
virtuoso (WL) to activate NM3 & NM4 so that internal node P & Q
make connections with BL and BLB. During write operation
WL should become high and depend on the initial condition
Simu lation with Spectre of nodes P and Q, bit “0 or 1” can be written. At hold state,
& measure parameters WL remains OFF and BL & BLB are left floating.
Failure in read operation is sometimes observed,
caused due to increase in voltage at any of nodes (P or Q) of
Layout using cadence an inverter which leads to tripping of another inverter means
the voltage at another node (Q or P) starts falling resulting
loss of information.
NO
Is DRC Go to
RUN Layout to
Clear? correct

YES

NO
Is LVS Check log
file to
RUN
correct
Matched?
Mismatch

YES

NO
Is RCX Check log
RUN file to
successful? correct

YES Fig.2 Schemat ic of 6T SRAM [3]

The output waveform shown in Fig.3 d ictates the


End
transient analysis and DC analysis of 6T SRAM cell. The
analysis result shows dynamic power and static power 8.69
Fig. 1 Flowchart of the proposed work µW and 18.15 pW respectively.
Fig.3 Transient and DC response of 6T SRAM Fig.5 Transient and DC response of 7T SRAM

B. 7T SRAM cell The simu lations are carried at 1.8 V and the operating
temperature is 27 0 C.
The 7T SRAM cell schemat ic as shown in Fig. 4 [9] is
like 6T SRAM cell, the only difference is having an extra C. 8T SRAM memory cell
NM4 transistor connected in series with PM0 & NM1. NM 4
transistor prevents the leakage of voltage from node P to The schematic of 8T SRAM memory cell, shown in
ground by making itself OFF during the read operation. It Fig. 6 [1], consists of two inverters connected back to back,
has an extra word line (W LB) that is complement to the two access transistors (NM2 & NM3) and a read buffer, that
main word line (W L). At the time of write operation, both consists of two transistors (NM4 & NM 5). During write
WL and WWL are turned ON and WLB is kept low. operation word line WWL, bit line WBL and WBLB are
used and RWL & RBL are used during read operation.

Fig.4 Schemat ic of 7T SRAM [10] Fig.6 Schemat ic of 8T SRAM [1]

The waveform shown in Fig. 5 represents the The RBL p recharged to VDD and the current flows
transient and DC simu lation for 7T SRAM memory cell. through the transistor of read buffer, not through the internal
Input waveform and output waveform are shown along with nodes. So the internal nodes remain at the same status as
power dissipated during transient and DC analysis. Dynamic they are. The output waveform in Fig.7 depicts the transient
power and static power dissipation are measured with the and DC simu lation for 8T SRAM cell along with dissipated
help of Cadence Virtuoso calculator. For 7T SRAM cell the power at roo m temperature. The result shows that it
dynamic power dissipated is 5.45 µW whereas for static dissipates 10.55 µW dynamic power and 18.15 pW static
power 18.15 pW. power at the supply voltage of 1.8 V.
Fig.7 Transient and DC response of 8T SRAM cell Fig. 10 Layout of 8T SRAM cell

III. LAYOUT ALONG WITH EXTRACTED Substrate connection is also made for PMOS & NMOS
VIEW FOR DIFFERENT SRAM of each SRAM cells. As discussed in Table.1, width, length,
& total area are measured for each SRAM cells. It is
The layout of 6T, 7T & 8T SRAM is designed using
observed that as number of transistors in SRAM increase
virtuoso layout editor & virtuoso XL with Virtuoso gpdk180
fro m 6T to 8T, the total area occupied also increases from
nm technology as shown in Fig. 8, Fig. 9 and Fig. 10. DRC
40.18 µ𝑚2 to 59.98 µ𝑚2 .
is checked to assure there is no design error in layout. The
aspect ratio taken is same as considered in the schematic for
Table.1 Area occupied by SRAM cells
layout design to be matched.
SRAM Width Length Total Area
Structures (𝜇𝑚) ( 𝜇𝑚) (𝜇𝑚2 )
6T 7.72 5.20 40.18
7T 7.84 5.34 40.88
8T 7.78 7.71 59.98

Once the LVS is matched, it can be guaranteed that


there is no discrepancy between schematic and layout and
our LVS is ready for RCX test. RCX test is used to get the
Av-Ext racted view o f layout that shows the details of
resistors and capacitors associated with it. Av-Extracted
view of 6T, 7T & 8T SRAM is shown in Fig.11, Fig.12 &
Fig.13 respectively. Th is view can be used further for the
post-layout simulation to compare it with schematic
Fig. 8 Layout of 6T SRAM cell simu lated results.

Fig. 9 Layout of 7T SRAM cell Fig.11 Av-Ext racted Layout of 6T SRAM


30.50

6T SRAM
7T SRAM
8T SRAM
30.45

Delay (nsec)
30.40

30.35

30.30
0.8 1.2 1.6 2.0
Supply voltage (volts)

Fig.15 Delay Vs Supply voltage


Fig.12 Av-Ext racted Layout of 7T SRAM
Delay variations with respect to supply voltage for
different SRAM cells are shown in Fig.15. It is observed
that as supply voltage decreases, by keeping other
parameters constant, delay increases. 7T SRAM cell has the
least delay and for 8T SRAM it is the most.

6T SRAM
20
7T SRAM
8T SRAM
Static Power Dissipation (pW)

15

10

Fig.13 Av-Ext racted Layout of 8T SRAM 5


0.8 1.0 1.2 1.4 1.6 1.8 2.0
Supply Voltage (volts)
IV. SIMULATED RES ULTS
Fig.16 Static power d issipation Vs Supply voltage
All the SRAM cells are designed and simulated to get
various parameter measurements. Fig.14 shows variation of The variation of static power with variation of
dynamic power dissipation with the variation of supply supply voltage is shown in Fig.16 shows as supply voltage
voltage (VDD ). The plot reveals that the dynamic power increases the static power dissipation for SRAM cells
dissipation for 7T SRAM is least and for 8T SRAM is most. increases. Delay variation with threshold voltage variation is
The dynamic power increases with increase of supply shown in Fig.17, indicates the increase of delay with
voltage. threshold voltage in each of SRAM cells increas es.

42 6T SRAM
12 6T SRAM
39 7T SRAM
7T SRAM
8T SRAM
8T SRAM 36
10
Dynamic Power Dissipation (uW)

33

30
8
27
Delay (nsec)

24
6
21

18
4
15

2 12

0 6
1.0 1.1 1.2 1.3 1.4 1.5 1.6 1.7 1.8 1.9 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1.0

Power Supply (volts) Threshold voltage (volts)

Fig.14 Dynamic power dissipation Vs Supply voltage Fig.17 Delay Vs Threshold voltage
The various parameters enlisted in Table.2 are V. CONCLUS ION
measured for 6T, 7T & 8T SRAM cells at 1.8 V o f power
supply and 0.9 V o f threshold voltage. Schemat ic and Layout of various topologies 6T, 7T, &
8T of SRAM cells along with RCX for parametric
Table.2 Co mparison of various parameters for 6T, 7T & 8T extraction have been carried out very meticulously and in
SRAM cells optimized way. The effort has been made to find out area,
delay, fall t ime, rise time, dynamic power, s tatic power, 3
Parameters 6T 7T 8T dB bandwidth for different SRAM cells as shown in
SRAM SRAM SRAM Table.2. The measured results show that static power
3dB Bandwidth(n) 20.80 40 10.77 dissipation is same for all the SRAM cells considered but
dynamic power is least for 7T SRAM it is highest for 8T
Delay (ns) 30.37 30.34 30.41 SRAM cell with 1.8 V supply voltage and 0.9 V threshold
Frequency(MHz) 24.95 24.77 25.00 voltage. The variation of power dissipation and delay has
Fall time (ns) 266.3 359.4 252.1 also been observed as a function of supply voltage. The
Rise time (ns) 228.6 349.3 197.2 effect of temperature variation on power dissipation has also
Dynamic power 8.69 5.45 10.26 been observed. As observed from Layout, the area occupied
(µW) by 6T SRAM cell is min imu m and for 8T SRAM cell it is
Static power (pw) 18.15 18.15 18.15 maximu m..
Temperature (0 C) 27 27 27
Supply voltage 1.8 1.8 1.8 REFERENCES
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Fig. 19 Static power dissipation Vs Temperature

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Fig.19 respectively.

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