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The
hole
QFL
is
essentially
where
the
equilibrium
Fermi
level
was,
because
the
hole
concentration
is
virtually
unchanged
(low-‐level
injection).
But
the
electron
QFL
is
much
closer
to
the
conduction
band
because
there
are
orders
of
magnitude
more
electrons.
⎛ Δn ( t ) + n0 ⎞
For
the
electron
QFL:
Fn ( t ) = Ei + kBT ln ⎜ ⎟⎠
⎝ ni
Initially,
Δn ( t ) >> n0
and
Δn ( t ) = Δn ( 0 ) e−t /τ n ,
so
Fn ( t )
initially
drops
linearly
with
time
towards
E F .
3)
The
sample
is
uniformly
illuminated
with
light,
resulting
in
an
optical
generation
rate
GL = 1020 cm-‐3
sec-‐1.
The
minority
carrier
lifetime
is
1
μsec,
except
for
a
thin
layer
(10
nm
wide
near
x
=
0
where
the
lifetime
is
0.1
nsec.
Find
the
steady
state
excess
minority
carrier
concentration
and
QFL’s
vs.
position.
You
may
assume
that
the
sample
extends
to
x = +∞ .
HINT:
treat
the
thin
layer
at
the
surface
as
a
boundary
condition
–
do
not
try
to
resolve
Δn ( x )
inside
this
thin
layer.
Approach
the
problem
as
follows.
3a)
Simplify
the
Minority
Carrier
Diffusion
Equation
for
this
problem.
Solution:
∂ Δn d 2 Δn Δn
Begin
with:
= Dn − + GL
∂t dx 2 τn
d 2 Δn Δn
Simplify
for
steady-‐state
conditions:
0 = Dn − + GL
dx 2 τn
The
simplified
MCDE
equation
is:
d 2 Δn Δn d 2 Δn Δn GL
Dn − + G = 0
− 2 + = 0
Ln = Dnτ n
dx 2 τ n
L
dx 2 Ln Dn
The
surface
recombination
velocity
is
simply
a
way
to
specify
the
strength
of
the
recombination
rate
(in
cm-‐2-‐s-‐1)
at
the
surface:
Δx
RS = Δn ( 0 ) = S F Δn ( 0 ) cm -2 -s-1
τS
⎡ − x/ L
e n ⎤
()
Δn x = GLτ n ⎢1−
( )
⎥
⎢⎣ 1+ Dn Ln S F ⎥⎦
Check
some
limits.
i)
SF
=
0
cm/s,
which
implies
that
there
is
no
recombination
at
the
surface.
Then
we
find:
Δn ( x ) = GLτ n ,
which
make
sense,
since
we
have
spatial
uniformity.
ii)
S F → ∞ .
Strong
recombination
at
the
surface
should
force
Δn x = 0 = 0 ,
( )
but
in
the
bulk
we
should
still
have
Δn ( x ) = GLτ n .
The
transition
from
0
to
a
finite
value
in
the
bulk
should
take
a
diffusion
length
or
two.
From
the
solution:
⎡ − x/ L
e n ⎤
()
Δn x = GLτ n ⎢1−
( )
⎥
⎢⎣ 1+ Dn Ln S F ⎥⎦
For
S F → ∞ ,
we
find
Δn ( x ) → GLτ n ⎡⎣1− e− x/ Ln ⎤⎦
which
behaves
as
expected.
The
concentration
is
GLτ n
in
the
bulk,
but
less
at
the
surface,
because
of
surface
recombination.
The
transition
from
the
surface
to
the
bulk
takes
place
over
a
distance
that
is
a
few
diffusion
lengths
long.
The
hole
QFL
is
constant
and
almost
exactly
where
the
equilibrium
Fermi
level
was,
because
we
are
in
low
level
injection
(the
hole
concentration
is
very,
very
near
its
equilibrium
value).
But
the
electron
QFL
is
much
closer
to
the
conduction
band
edge.
It
moves
away
from
EC
near
the
surface,
because
surface
recombination
reduces
Δn ( x )
near
the
surface.
The
variation
with
position
is
linear,
because
Δn ( x )
varies
exponentially
with
position.
Note:
Typically,
in
semiconductor
work,
these
kinds
of
problems
are
stated
directly
in
terms
of
surface
recombination
velocities
and
not
in
terms
of
very
thin
layers
with
low
lifetime.
The
way
problem
3)
would
usually
be
stated
is
as
follows:
( )
Δn ( x ) = Δn ( 0 ) e− x/ Ln = 1012 e− x/ Ln
4d)
Provide
a
sketch
of
the
solution,
and
explain
it
in
words.
Solution:
6)
The
sample
is
in
the
dark,
and
the
excess
carrier
concentration
at
x
=
0
is
held
constant
at
Δn ( 0 ) = 1012 cm-‐3.
Find
the
steady
state
excess
minority
carrier
concentration
and
QFL’s
vs.
position.
Assume
that
the
semiconductor
is
30
μm
long.
You
may
also
assume
that
there
is
an
“ideal
ohmic
contact”
at x = L = 30 μm,
which
enforces
equilibrium
conditions
at
all
times.
Make
reasonable
approximations,
and
approach
the
problem
as
follows.
6a)
Simplify
the
Minority
Carrier
Diffusion
Equation
for
this
problem.
Solution:
∂ Δn d 2 Δn Δn
Begin
with:
= Dn − + GL
∂t dx 2 τn
Simplify
for
steady-‐state
and
no
generation:
d 2 Δn Δn d 2 Δn Δn d 2 Δn Δn
Dn − = 0
− = 0
− 2 = 0
Ln = Dnτ n
dx 2 τn dx 2 Dnτ n dx 2 Ln
d 2 Δn Δn
− 2 = 0
where
Ln = Dnτ n
is
the
minority
carrier
diffusion
length.
dx 2 Ln
Δn ( 30 µm ) = 0
6c)
Solve
the
problem.
Solution:
Δn ( x ) = Ae− x/Ln + Be+ x/Ln
Because
the
region
is
about
one
diffusion
length
long,
we
need
to
retain
both
solutions.
Δn ( 0 ) = A + B
Δn ( L = 30 µm ) = Ae− L / Ln + Be+ L / Ln = 0
Solve
for
A
and
B
to
find:
−Δn ( 0 ) e+ L/Ln
A = − L/Ln
( e − e+ L/Ln )
Δn ( 0 ) e− L/Ln
B=
( e− L/Ln − e+ L/Ln )
So
the
solution
is:
Δn ( 0 )
Δn ( x ) = − L/Ln ⎡ −e−( x−L )/Ln + e+( x−L )/Ln ⎤
(e − e ) + L/Ln ⎣ ⎦
sinh ⎡⎣( x − L ) / Ln ⎤⎦
Δn ( x ) = Δn ( 0 )
sinh ( L / Ln )
The
short
base
result
is
linear,
but
in
this
case,
the
slope
in
a
little
steeper
initially
and
a
little
shallower
at
the
end.
Since
the
diffusion
current
is
proportional
to
the
slope,
this
means
that
inflow
greater
than
outflow.
This
occurs
because
some
of
the
electrons
that
flow
in,
recombine
in
the
structure,
so
the
same
number
cannot
flow
out.