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C-Th MVLSI Advanced Engg Maths 101 C-Th MVLSI VLSI Device & Modelling 102 C-Th MVLSI Digital IC Design 103 C-Th MVLSI Microelectronic Technology & IC 104 Fabrication E-Th MVLSI 105A 105B 105C 105D Elective I: 1. Bioelectronic System 2. Embedded System Fundamentals 3. AI & Neural Networks 4. Advanced Digital Communication Total of Theory C-Pr MVLSI CAD Tools for VLSI Design 191 E-Pr MVLSI 192A 1. Microelectronic Technology 192B 2. Embedded Systems Total of Practical S MVLSI Seminar 181 Total
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Paper Type C-Th C-Th C-Th E-Th Paper Code MVLSI 201 MVLSI 202 MVLSI 203 MVLSI 204A 204B 204C 204D MVLSI 205A 205B 205C 205D 205E Paper Name L Processor Architecture for VLSI Digital Signal Processing & Aplications Analog IC Design Elective II: 1. Quantum & Nano-science 2. Error Control & Coding 3. Sensors 4. Physical Design & Testing Elective III: 1. RF Circuits & Systems 2. Low Power VLSI Design 3. Mobile Communication 4. Advanced Micro & Nano Devices 5. Advanced FET Technology Total of Theory E-Pr MVLSI 291A 291B 1. Microelectronic Technology 2. Embedded Systems Total of Practical S V MVLSI 281 MVLSI 282 Term paper leading to Thesis Comprehensive Viva Voce Total credit Semester 3: Paper Paper Type Code C-Th MVLSI 381A 381B MVLSI 302/392 20 1 3 0 0 0 1 3 0 2 1 4 27 4 4 4 4 Instruction Hours T 0 0 0 0 P 0 0 0 0 4 4 4 4 Credit
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Paper Name L 4 1. Project Management or 2. Teaching & Reseach Methodologies Elective Theory or Practical Papers to be suggested by College. Total of Theory 4 8 0
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MVLSI 383
Paper Name L Dissertation Part II (Completion) Post submission defence of dissertation Total of Credit 24
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Details: VL SI De vi c e s & M o del l in g [ Se m - 1] 3 ( L ) ( 4 0 l ect ure s ) P r e- r e q ui si te : K n ow l e d g e of ba si c p h ys ic s of di o de s, B J Ts, FE Ts, MO S st r uc t ur e s. Se m ic o n d u c t or s, J u nc ti o n s a n d MO S FE T O ve r vi e w: I n tr od u c ti on , S e mi c on d u c t or s, C on d u c ti on , C on t ac t P ot e n ti al s, P- N J u nc ti on , O ver vi e w of t he MO S Tr a nsi st or. B a si c De vi c e P h ys ic s: Tw o Ter m i na l MO S Str u ct ur e : Flat - ba n d v ol ta g e, P ote nt ia l bal a nce & c ha rge ba la n c e, E ff e c t of Ga t e- su bs tr a te v ol ta ge o n s ur fa ce c on d i ti on , In v e r si on , Sma ll si gn a l ca p aci ta nc e; T hr ee Te r mi n al MO S Str uc t u re : C on ta c t i n g t he i n ver si on l a ye r, B od y eff ect , Re gi on s o f i n ve r si on , P i nc h- off v ol ta ge ; F ou r Te r m i na l MO S Tr a n sis t or : Tr a n si st o r r e g i on s of op er at i on , ge n e r al c h ar ge s hee t m od e l s , r e gi on s of i n ver s i on i n ter m s of ter m i nal v ol t a ge , st r on g i n ve r si on , wea k i n ver s i on , m od e r a te i n ve r si on , i nt er p ola ti on m od e l s, eff ec ti ve m ob ili t y, te m p er a t ure eff ect s, bre a kd ow n p- c h a n ne l M OS FE T, e n h a nc e m e nt a n d de pl et i on t yp e , mod e l par a me te r va l ue s, m o de l a cc ura c y e tc; S ma ll d i me n si on eff e ct s: c ha n ne l l e n gt h mo d u l ati on , b ar r i er l ow er i n g, tw o di m e n si on a l c h a rge s har i n g a n d t hr e s h ol d v ol ta ge , p u n c h-t hr ou gh , car r ier v e l oc it y sat ur a ti on , h ot ca r r ie r e ff e ct s, sca li n g, eff ec t s of sur f ace a n d dr a i n se ri e s r es is ta nc e , eff ec t s d u e t o t h i n ox i de s a n d hi gh d o p i n g. S u b t hr es h ol d r e gi o n s. C MO S De vic e D esi g n : S cal i n g, Thr e sh ol d v ol ta g e, MOSFE T c h a n ne l l e n gt h ; C MO S Pe rf or m a nce Fa ct or s: B as ic C M OS c ir c u it el e me n ts; pa r a si tic e le m e nt s ; se n si t i vi t y o f C MO S de la y t o de vi c e p ar a me te r s; p er f or m a nce f act or s of a d v a nc e d C MOS d e vi ce s. B i p ol ar De vi ce s, De s i gn & P er f or ma n c e: O ut c ome : St u d e nt w il l be a b le t o m od e l de vi c es a n d st u d y t h eir pe rf or m a nce i n a na l o g a n d d i gi t al, c ir c ui ts . As si gn me nt : Si m ple Cir cu it si m ul at i on u si n g Sp ic e. Text: Fundamentals of Modern VLSI Devices by Yuan Taur & Tak H. Ning (Cambridge) The MOS Transistor (second edition) Yannis Ts i vi di s ( Ox f or d) R ef er e nc e : CM O S An al o g C irc uit De si gn ( se c on d e di ti o n) Phi ll ip E. Al le n a n d D o ugl a s R. H o l be r g ( O xf or d) Di g it al I C D esi gn [ Se m 1] 3 ( L ) 1( T) 2 ( P ) Prerequisite: Overview of CMOS VLSI fabrication, CMOS process steps; fabrication; yield; design rules for custom layout; Layout - hand layout, graphical layout, low-level language; design rule checking; stick diagrams; placement of cells; simulation of design; function generation from masks; test pattern generation; structured design methodology for VLSI; hierarchical design techniques and examples. Concept of Mask design, Mask layout, Stick diagram, Standard cell Vs Custom design, 1. Specification Methods: Language based methods including VHDL/Verilog, hierarchical state machine
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Reading List 1. CAD for VLSI: Author: Russell, G, Kinniment, D.J., Chester, E.G., and McLauchlan, M.R. Notes: Van Norstrand Rheinhold, 1985. 2. Tutorial on High Level Synthesis Author: McFarland, M.C., Parker, A.C and Camposano R Notes: Proc 25th ACM/IEEE Design Automation Conf pp330-336 3. CMOS VLSI Design A Cir c ui t s a n d S ys t e ms Pe rs pe c ti ve ( 3r d E di ti on ) A ut h or Ne il We ste a n d David Harris Microelectronics Technology & IC Fabrication: 3(L) (40 lectures) Cleanroom technology - Clean room concept Growth of single crystal Si, surface contamination, cleaning & etching. (Laboratory Practices : Cleaning of p-type & n-type Si-wafer by solvent method & RCA cleaning) Oxidation Growth mechanism and kinetic oxidation, oxidation techniques and systems, oxide properties, oxide induced defects, charactrisation of oxide films, Use of thermal oxide and CVD oxide; growth and properties of dry and wet oxide, dopant distribution, oxide quality; (Laboratory Practices : Fabrication of MOS capacitor) Solid State Diffusion Fick's equation, atomic diffusion mechanisms, measurement techniques, diffusion in polysilicon and silicon di-oxide diffusion systems. Ion implantation Range theory, Equipments, annealing, shallow junction, high energy implementation. Lithography Optical lithography, Some Advanced lithographic techniques. Physical Vapour Deposition APCVD, Plasma CVD, MOCVD. Metallisation - Different types of metallisation, uses & desired properties.(Laboratory Practices : Metallisation & Schottky diode fabrication) VLSI Process integration. (3+3+3+3+3+3+3+3+3+3+3+3+4 = 40 hrs theory) Reading List 8. Semiconductor Devices Physics and Technology, Author: Sze, S.M.; Notes: Wiley, 1985 9. An Introduction to Semiconductor Microtechnology, Author: Morgan, D.V., and Board, K 10. The National Technology Roadmap for Semiconductors , Notes: Semiconductors Industry Association, SIA, 1994 11. Electrical and Electronic Engineering Series VLSI Technology, Author: Sze, S.M. Notes: Mcgraw-Hill International Editions
Representation of noise in frequency domain. Effect of filtering on the power spectral density of noise Low pass filter, band pass filter, differentiating filter, integrating filter. Quadrature components of noise, their power spectral densities and probability density functions. Representation of noise in orthogonal components.
Band limited channel: o Characteristics of band limited channel, inter symbol interference (ISI) - its mathematical expression. o Niquists theorem for signal design for no ISI in ideal band limited channel, Niquists criteria, raised cosine pulse signals. o Signal design for controlled ISI in ideal band limited channel, partial response signals, duobinary & partial duobinary signals - their methods of generation and detection of data. o Concept of maximum likelihood detection, log likely hood ratio. o Detection of data with controlled ISI by linear transverse filters. o Performance of minimum mean square estimation (MMSE) detection in channels with ISI.
Base band signal receiver and probabilities of bit error: o Peak signal to RMS noise output ration, probability of error. o Optimum filter, its transfer function. o Matched filter, its probability of error. o Probability of error in PSK, effect of imperfect phase synchronization or imperfect bit synchronization. o Probability of error in FSK, QPSK. o Signal space vector approach to calculate probability of error in BPSK, BFSK, QPSK.
Text Books: 1. Digital communication, 4th ed. - J. G. Proakis, MGH International edition. 2. Principle of Communication Systems Taub, Schilling, TMH 3. Digital and Analog Communication Systems, 7th ed. Leon W. Couch, PHI. 4. Principles of Digital Communication Haykin 5. Digital Communication Zeimer, Tranter. 6. Principle of Digital communication - J. Das, S. K. Mallick, P. K Chakraborty, New Age Int. 7. Communication Systems, 4th ed. A. Bruce Carlson, Paul B. Crilly, Janet C. Rutledge, MGH International edition. 8. Digital Communications, 2nd ed. Bernard Sklar, Pearson Education. 9. Electronic Communications, 4th ed. Dennis Roddy, John Coolen, PHI Processor Architecture for VLSI Fundamentals: Components of (an embedded) computer, Architecture organization, Von-Neumann vs Harvard, Microcoded vs hardwired, scalar and vector processors, Flynns taxonomy CISC arch, the RISC movement, ISA arch, basic structure, pipelining, pipeline hazards and solutions, comparison, merging RISC and CISC: the microchip PIC Superscalar arch: parallel computation, Ways of parallelism, the IBM PowerPC The DSP and Its Impact on Technology: Why a DSP is different. The evolving architecture of a DSP VLIW arch: the TI TMS320C6x, advancement to EPIC Coprocessor Approach: Need for accelerators, Accelerators and different types of parallelism, Processor architectures and different approaches to acceleration General-Purpose Embedded Processor Cores: The ARM Processors using course-grain parallelism: utilization of course-grain parallelism, chip-multiprocessors, multithreaded processors, SMT proc Customizable Processors and Processor Customization: A benefits analysis of processor customization, Using microprocessor cores in SOC design, Benefiting from microprocessor extensibility, how microprocessor use differs between SOC and board-level design Run-Time Reconfigurable Processors: Embedded microprocessor trends, Instruction set metamorphosis, Reconfigurable computing, Run-time reconfigurable instruction set processors, Coarse-grained reconfigurable processors Stream Multicore Processors: Introduction, Raw architecture overview Asynchronous and Self-Timed Processor: Motivation for asynchronous design, The development of asynchronous processors,
Electives- II: Sensors UNIT 1 Principles of Physical and Chemical Sensors: Sensor classification, Sensing mechanism of Mechanical, Electrical, Thermal, Magnetic, Optical, Chemical and Biological Sensors. Sensor Characterization and Calibration: Study of Static and Dynamic Characteristics, Sensor reliability, aging test, failure mechanisms and their evaluation and stability study. UNIT 2 Sensor Modeling: Numerical modeling techniques, Model equations, Different effects on modeling (Mechanical, Electrical, Thermal, Magnetic, Optical, Chemical and Biological) and examples of modeling. Sensor Design and Packaging: Partitioning, Layout, technology constraints, scaling. UNIT 3 Sensor Technology: Thick and thin films fabrication process, Micro machining, IOC (Integrated Optical circuit) fabrication process, Ceramic material fabrication process, Wire bonding, and Packaging. Sensor Interfaces: Signal processing, Multi sensor signal processing, Smart Sensors, Interface Systems. Sensor Applications: Process Engineering, Medical Diagnostic and Patient monitoring,
UNIT 2 Introduction, Scaling, MEMS Markets and Applications MEMS materials and fabrication methods, with emphasis on silicon micromachining Process simulation: basic lithography, deposition, and etching processes for mems.
Characterization of materials used for different RF electronic devices. Heterostructure-overview. High frequency transistors- BJT,field effect transistors . Basics of resonant tunneling, RT devices. Introduction to RF/Microwave Concepts .Active and passive RF components , circuit representations of two port RF/MW networks scattering and T parameters , smith chart. Basic Considerations in Active Networks- Stability and noise considerations, Gain Considerations in Amplifiers. Active Networks - Linear and Nonlinear Design, RF/MW Amplifier . RF/MW Oscillators- Basic topologies ,VCO, Quadrature and single sideband generators. Radio frequency Synthesizers- PLLS, Various RF synthesizer architectures and frequency dividers . Overview of RF Filter design, design of rectifier , detector , mixer , RF/MW control circuit. Small RF/MW antenna and array . RF/MW Integrated circuits - design and applications
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