Microfabrication Techniques

MICROFABRICATION TECHNIQUES
ABHILASH MANJUL P A ROLL NO : 2 SEMESTER-III M-Tech PROCESS CONTROL

Microfabrication Techniques 21-07-2013 1
OBJECTIVES
Upon completion of this presentation, you will be able to: State different types of microfabrication methods Explain the basic principles of various microfabrication techniques Describe the applications of microfabrication
Microfabrication Techniques
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MICROFABRICATION TECHNIQUES
Photolithography Soft lithography Film deposition
Etching
Bonding
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PHOTOLITHOGRAPHY
Photolithography is used to transfer a user generated shape onto a material through the selective exposure of a light sensitive polymer
High resolution & variety of pattern attributes that

are possible to obtain are the advantages This technique has the limitation of requiring clean room processing
PHOTOLITHOGRAPHY(Contd..)
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PHOTOLITHOGRAPHY PROCESS
1. Surface preparation
Because of the extreme delicacy of the lithographic process, all surface contaminants such as dust, lint,
bacteria, water & oil must be cleaned to perfection

The surface is soaked and rinsed in a number of different chemicals Then primed with more chemicals to aid in the resist adhesion
PHOTOLITHOGRAPHY PROCESS(Contd..)
2. Resist coating
The photoresist is applied by spin coating The surface is spun rapidly inside a vacuum, while
being coated with the photoresist

The photoresist bonds uniformly to the surface, with the excess flying off during spinning A coating solvent is then used to dissolve the build up along the edge of the surface
3. Pre-bake
The surface is heated in a convection oven or through a heated plate placed below the surface
The purpose of pre-bake is to evaporate the excess

coating solvent and to compact & harden the photoresist
4. Mask alignment
Photomask is a desired pattern that can be transferred onto a surface by means of light waves
The mask creates a sort of shadow between the light & the surface Less light passes through sections blocked by the mask
Masks can be of different shapes & can be created by

several different ways The mask must be aligned correctly in reference to the surface Masks can be aligned in different ways including:
Contact: The mask is in contact with the surface during exposure Proximity: The mask is close but not touching the surface during exposure Projection: The mask is not close to the surface, and the light passing between them is subject to imaging optics
5. Exposure
The photoresist, surface & mask are subjected to UV light via UV lamp
6. Development
During the development stage, chemicals are applied to the surface causing either a positive photoresist reaction or a negative photoresist reaction Negative: The molecules in the resist that are subjected to the most UV rays are bonded strongly together in long chains (polymerization). After the subsequent development process, the non-polymerized sections of the resist decompose & only the polymerized resist remains
Positive: Opposite of a negative photoresist. Sections of the resist are chemically altered to decompose when exposed to UV light; therefore after the development,
only the sections not exposed to UV light remains
7. Post Bake
The post bake is used to stabilize & harden the photoresist It also removes any trace of development chemicals
8. Photoresist Removal/Processing
To remove excess photoresist, simple solvents are used The following cases are the results when the photoresist is applied on top or bottom of the desired surface Etch-back: The photoresist is applied overtop the layer that is wanted to be patterned. The unwanted material is etched away Lift-off: A layer is deposited over top of the photoresist. When the resist is removed, the unwanted layer is also removed
SOFT LITHOGRAPHY
Soft lithography is a method used to transfer a pattern onto a surface It utilizes a microstructure replica produced by,
moulding a polymer such as poly(dimethyl siloxane)

(PDMS) onto a master Master is manufactured through microfabrication techniques such as photolithography
SOFT LITHOGRAPHY(Contd..)
PDMS is used in the biomedical and pharmaceutical fields because of its biocompatibility, and good thermal, mechanical & optical properties
The main advantage of soft lithography is that once

the reusable mould is made, none of the other steps require clean room manipulation It is a less expensive technique that provides great resolution through a simpler process
SOFT LITHOGRAPHY PROCESSES
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There are three main soft lithography processes: micro stamping, stencil patterning, and micro fluidic patterning Microstamping also known as microcontact printing, is based on the construction of a stamp that has the desired pattern with the PDMS mold Molecules to be transferred are placed on the surface of the stamp and printed on a receiving surface upon stamping, thus forming a self assembled monolayer (SAM)
Depending on the application, peptides, proteins, polysaccharides and other molecules can be stamped
The stamped layer can protect the substrate during

etching or deposition procedures Advantage: the stamp can be reused to make pattern replicas
Stencil patterning creates templates by preventing PDMS from covering the master template The end result of this process is a PDMS model with holes in the pattern of the master Different methods can be used to prevent PDMS from covering the master features, such as placing plates against the master following PDMS addition, or adding the PDMS to a thickness smaller than that of the master features
Microfluidic patterning utilizes a PDMS mold to create microchannels against a substrate These microchannels can then be used to pattern fluid
materials onto a substrate

This technique has been utilized for the patterning of cells in tissue engineering applications They have the ability to maintain separate fluid streams through a single channel because of laminar flow
FILM DEPOSITION
Film deposition consists of the formation of micronthick films on the surface of a substrate Films can play a structural or functional role in the
design
Structural Role: Films may be used during
microfabrication as sacrificial or masking layers that

protect the base material from etching
FILM DEPOSITION(Contd..)
Functional Role: Films may be used as electrical components for a microfabricated device Numerous types of materials are used for the
generation of films
The most commonly used are plastics, silicon
containing compounds, metals, and bio molecules
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ETCHING
Etching selectively removes materials from the surface of the micro device by either chemical or physical processes
Etching can be isotropic if it proceeds equally in all

directions or anisotropic if it proceeds in one specified direction
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ETCHING(Contd..)
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ETCHING(Contd..)
Isotropic etching occurs not only in the direction of depth, but also laterally, and results in a curved profile
Anisotropic etching occurs only in one direction,

usually selectively increasing the depth of the cavity The mechanisms used for etching utilize liquid chemicals (Wet etching) or gaseous physicochemical processes (Dry etching)
ETCHING(Contd..)
Dry anisotropic etching results in a flat profile, while wet anisotropic etching results in cavities with inclined sidewalls
The characteristic slanted profile of wet anisotropic

etching is a result of the interaction of the etching reagent with the crystalline structure of the material being etched
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ETCHING(Contd..)
The crystal structure determines the rate of etching that occurs at each crystal plane For most applications, the flat profile of dry
anisotropic etching is adequate

Reactive ion etching, which utilizes oxygen or
fluorine plasma, has also been extensively used
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BONDING
Bonding adheres substrates together with or without the use of intermediary layers Reversible and irreversible bonds can be formed between microstructures to form tight seals or to obtain desired structures Bonding methods are specific for the material of interest Irreversible anodic bonding is possible between a silicone substrate and a non-pure glass film (400C, high pressure and an electric field needed)
BONDING(Contd..)
Fusion bonding consists of the annealing of two surfaces at high temperatures (~1000C) Bonding of polymers can be carried out through
heating above the glass transition temperature and

applying pressure to seal the structures, through laser welding, or ultrasonic welding Adhesives can also be used to bind two materials
APPLICATIONS OF MICROFABRICATION
Helps in studying the interactions of biomaterials with biological systems at the cellular and molecular scale
Micro devices are used in the medical and

pharmaceutical field such as drug & gene delivery devices, Microfabricated bio- and muco-adhesive systems & Microfabricated biosensors MEMS
REVIEW AND SUMMARY

In this presentation, we have discussed: Microfabrication techniques such as photolithography, soft lithography, film deposition, etching & bonding Applications of microfabrication
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THANK YOU
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Microfabrication Techniques

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Microfabrication Techniques

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MICROFABRICATION TECHNIQUES

ABHILASH MANJUL P A ROLL NO : 2 SEMESTER-III M-Tech PROCESS CONTROL

High resolution & variety of pattern attributes that

bacteria, water & oil must be cleaned to perfection

being coated with the photoresist

The purpose of pre-bake is to evaporate the excess

Masks can be of different shapes & can be created by

only the sections not exposed to UV light remains

moulding a polymer such as poly(dimethyl siloxane)

The main advantage of soft lithography is that once

SOFT LITHOGRAPHY PROCESSES

The stamped layer can protect the substrate during

materials onto a substrate

microfabrication as sacrificial or masking layers that

containing compounds, metals, and bio molecules

Etching can be isotropic if it proceeds equally in all

Anisotropic etching occurs only in one direction,

The characteristic slanted profile of wet anisotropic

anisotropic etching is adequate

fluorine plasma, has also been extensively used

heating above the glass transition temperature and

Micro devices are used in the medical and

REVIEW AND SUMMARY

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