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The document discusses lithography techniques including lithography, atomic force microscopy (AFM), and dip-pen nanolithography (DPN). It provides details on:
1) How AFM works by measuring local properties like height, optical absorption or magnetism using a small probe or tip placed near the sample at a very small probe-sample separation.
2) How DPN uses AFM instrumentation for high-resolution patterning of molecular and biomolecular inks on substrate surfaces.
3) Applications of DPN for nanostructure patterning and its potential use for circuit repair beyond the limits of light-based lithography.
The document discusses lithography techniques including lithography, atomic force microscopy (AFM), and dip-pen nanolithography (DPN). It provides details on:
1) How AFM works by measuring local properties like height, optical absorption or magnetism using a small probe or tip placed near the sample at a very small probe-sample separation.
2) How DPN uses AFM instrumentation for high-resolution patterning of molecular and biomolecular inks on substrate surfaces.
3) Applications of DPN for nanostructure patterning and its potential use for circuit repair beyond the limits of light-based lithography.
The document discusses lithography techniques including lithography, atomic force microscopy (AFM), and dip-pen nanolithography (DPN). It provides details on:
1) How AFM works by measuring local properties like height, optical absorption or magnetism using a small probe or tip placed near the sample at a very small probe-sample separation.
2) How DPN uses AFM instrumentation for high-resolution patterning of molecular and biomolecular inks on substrate surfaces.
3) Applications of DPN for nanostructure patterning and its potential use for circuit repair beyond the limits of light-based lithography.
INTRODUCTION Invented by Alois Senefelder in Germany in 1798 Fundamentally new printing technology Mechanical Plano graphic process in which the printing and non-printing areas of the plate are all at the same level Dip-Pen Nanolithography
DPN is a unique modification of atomic force microscope (AFM) instrumentation. High-resolution patterning capabilities for a number of molecular and biomolecular inks on a variety of substrate types such as metals, semiconductors, and monolayer functionalized surfaces. Atomic Force Microscope (AFM)
Techniques in AFM DC mode AFM AC mode AFM Characteristics of AFM Works by measuring local properties - such as height, optical absorption, or magnetism - with a probe or "tip" placed very close to the sample. The small probe-sample separation makes it possible to take measurements over a small area Measurement of topography with a force probe
AFM operates by measuring attractive or repulsive forces between a tip and the sample. Concept of AFM In principle, AFM resembles the record player as well as the stylus profilometer. However, AFM incorporates a number of refinements that enable it to achieve atomic-scale resolution: Sensitive detection Flexible cantilevers Sharp tips High-resolution tip-sample positioning Force feedback Types of AFM tips Normal tip (3 m tall) supertip (3 m tall)
Ultralever (3 m tall).
Working of DPN
Illustration of molecular deposit of DPN tip Images of dots and lines of magnetic nanoparticles created using DPN
AFM image showing lattice-resolved monolayer of octadecanethiol patterned on gold via DPN.
A)Ultra-high resolution pattern of mercaptohexadecanoic acid on atomically flat gold surface. B) DPN generated multi-component nanostructure with two aligned alkanethiol patterns.
Applications of DPN
Limitations Slow process Cannot be used in Vaccum A Multipen Plotter for Parallel Patterning
Schematic of two-pen DPN plotter Conclusion Dozens of research groups worldwide are working on DPN applications to develop even better techniques The tDPN technique, an improvement to DPN could be used to produce features too small to be formed with light-based lithography, and as a nanoscale soldering iron for repairing circuitry on semiconductor chips