Basic Techniques

DC (diode)
RF (radio frequency)
magnetron
DC sputtering: simplest

The main difference is that the power used in RF

sputtering is AC, while that in DC sputtering is
DC.
Basically, during DC sputtering, the working gas
will be ionized.
As a result, many positiveionswill be produced
within the chamber and accumulate on the surface
of target If the conductivity of target you sputtering
is not very good.
In order to avoid this problem, we can use AC
power instead of DC.
During the positive electric field, the positive ions
are accelerated to the surface of target and sputter
it.
while the nagitive field, the charging positive ions
on the surface of target can be removed.

DC sputtering uses DC volts (in the KV

range), and can be used for sputtering
metals alone, and will be almost
ineffective for sputtering insulators.
RF sputtering can be used for metals,
semiconducltors,, and insulators, and
utilises RF power at a specific frequency of
13.56 MHz, which has been allotted
internationally for RF power supply
equipment.
DC power supplies are cheap, and RF
power supplies are more expensive,
and need impedance matching
equipment.

RF Sputter Deposition
DC sputter deposition is not suitable for
insulator deposition, because the positive
charge on the target surface rejects the ion
flux and stop the sputtering process.
RF voltages can be coupled capacitively
through the insulating target to the plasma,
so conducting electrodes are not necessary.
The RF frequency is high enough to maintain
the plasma discharge.

PVD is general term used to describe the

deposition of thin film onto various surfaces
such
as
semiconductor
wafer,
by
condensation of vaporized forms of materials.
PVD is a purely physical process, for example
high-temperature vacuum evaporation.
Deposition of thin films by PVD techniques has
found wide use in various industrial sectors
because it allows the coating of metals, alloys,
ceramics, polymer thin films onto a wide
range of surfaces.

For attaining thin-film coatings compliant with

the highest quality standards the process gas
system must be capable of providing superior
layer uniformities.
The PVD process is common in large industries
and is used in semiconductors, optics,
solar cells, cutting tools, decorative
consumer goods, etc. We are also seeing
increasing use across other industries,
especially automotive and electronics.
The car industry, for instance, uses PVD for a
variety of different applications, including
tribological coatings in engines,
reflectors and decorative coatings
internally and externally on the vehicle.

Thin Film Coatings in Aerospace

PVD coatings are applied on blades for

protection against erosion in LPC and HPC
Modern solution for increase of reliability and
lifetime of mechanical components;
Environmentally friendly alternative to other
coating technologies (e.g. electroplating);
Ability to boost performance while reducing
weight, use of less expensive materials;
Indirect impact: Improving efficiency of
manufacturing technology cutting, forming,
casting;

Aerosospace

Thin Film Coatings

PVD coatings are applied on
blades for protection against
erosion in LPC and HPC
Modern solution for increase of
reliability and lifetime of
mechanical components;
Environmentally friendly
alternative to other coating
technologies (e.g.
electroplating);
Ability to boost performance
while reducing weight, use of
less expensive materials;
Indirect impact: Improving
efficiency of manufacturing
technology cutting, forming,
casting;

More and more watch

industriesfrom rugged
sports watches to high-end
designer watchesare
utilizing PVD coating to
protect and strengthen
the watch for a lifetime.
Originally used in military
applications to reduce
friction and glare, PVD is
the most durable finish
option for your watch.