GAS-LIQUID REACTORS Prepared by Devika A S Athulya S Balakrishnan METHODS TO CONTROL TEMPERATURE
COLD SHOT & HOT SHOT
• The injection of cold fresh feed directly into reactor at intermediate points known as cold shot. • If reaction is endothermic , then fresh feed has been preheated can be injected at intermediate points called as hot shot. • Temperature control is through a combination of direct heat transfer and control of concentration INDIRECT HEAT TRANSFER WITH THE REACTOR • Indirect heating/cooling can be considered • This is done by a heat transfer surface inside a reactor , such as carrying out the reaction inside a tube and providing a heating/cooling medium outside of tube HEAT CARRIER • An inert material can be introduced with reactor feed to increase its heat capacity flow rate • Where ever possible one of the existing process fluids should be used as heat carrier • Product or byproduct could be recycled to reactor to limit the temperature change CATALYST PROFILES • Temperature of a highly exothermic reaction needs to be controlled by packing the catalyst inside the tubes and passing a cooling medium outside of the tubes • Alternatively ,mixture of catalyst pellets and inert pellets can be used to effectively dilute the catalyst • By doing so rate of reaction in different parts of the bed to be controlled more easily • Using zones with decreasing amounts of inert pellets through the reactor would control the rate of reaction to a more even profile through the reactor, allowing better temperature control GAS –LIQUID REACTORS • Gas liquid reactors are quite common • Consider the interface between a gas and a liquid • Assumptions Flow pattern giving a stagnant film in the liquid and gas on each side of the interface The bulk of the gas and liquid have uniform concentration Reactant transfer from gas to liquid There is diffusional resistance in liquid and gas film • Rate of transfer of component i from gas to liquid through gas film per unit volume of reaction mixture is given by;
• Rate of transfer of component i through the liquid film, per unit
volume of reaction mixture is given by; • If equilibrium conditions at the interface are assumed to be described by Henrys law
• If steady state is assumed then equations can be combined to obtain
• The solubility of gases varies widely • Gases with low solubility have large values of Henrys law coefficient • Then liquid film resistance is large relative to gas film resistance • Thus liquid film resistance controls for gases with low solubility • Gas film resistance controls for gases with high solubility CONTACTING PATTERNS FOR GAS- LIQUID REACTORS THANK YOU