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MOSFET dc analysis
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Teaching Methodology Detailing
Lecture Topic Books Page No.
No.
1. Basics of MOS Transistor Operation, 120-123
Construction of n-channel E-MOSFET
2. E-MOSFET characteristics & parameters 124-128
Non-ideal voltage current characteristics
viz. T2:
3. 1. Finite output resistance,
2. Body effect Donald Neaman, 136-139
4. 3. Sub-threshold conduction “Electronic Circuit
4. Breakdown effects Analysis and
5. Temperature effects. Design”,3rd Edition,
Tata Mc Graw Hill.
5. Common source circuit, Load Line & 140-142
Modes of operation 149-150
6. Common MOSFET configurations: DC 151-153
7. Analysis
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Transistor
JFET MOSFET
DMOSFET EMOSFET
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Construction of n-channel E-MOSFET
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The MOS Transistor
Gate Oxide
Gate
Polysilicon Field-Oxide
Source Drain
(SiO2)
n+ n+
p+ stopper
p-substrate
Bulk Contact
Symbol
L = 0.5-10 mm
W = 0.5-500 mm
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n-channel MOSFET Basic Operation
Operation in the Cutoff region
pn junction:
reverse bias
iD=0
for vGS<Vt0
Schematic
For vDS<vGS-Vt0 and vGS>Vt0 the NMOS is operating in the triode region
i D K 2v GS Vt 0 v DS v DS
2
W Kn'
Kn
L 2
Device parameter Kn’ for
NMOSFET is 50 mA/V2
n-channel MOSFET Basic Operation
Operation in the Saturation Region (vDS is increased)
Tapering
of the
channel
- increments
of iD are
smaller
when
vDS is
larger When vGD=Vt0 then the channel
thickness is 0 and
i D K vGS Vt 0
2
n-channel MOSFET Basic Operation
Example 12.1
An nMOS has W=160 mm, L=2 mm, KP= 50 mA/V2 and Vto=2 V.
for vGS=3 V.
i D K 2v GS Vt 0 v DS v DS
2
W KP
i D K vGS Vt 0 K
2
L 2
n-channel MOSFET Basic Operation
Example 12.1
Characteristic
Channel length i D Kv DS
2
modulation
id depends on vDS in
saturation region
(approx: iD =const in
saturation region)
p-channel MOSFET Basic Operation
It is constructed by interchanging the n and p regions of n-
channel MOSFET.
Symbol
Characteristic
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Symbols for n-Channel Enhancement-Mode
MOSFET
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Symbols for P-Channel Enhancement-Mode
MOSFET
Symbols
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E-MOSFET characteristics & parameters
MOSFET
Non Saturation or triode region:
VDS< VDS(sat)
iD K n [2(VGS VTN )VGS VDS ]
2
k ,n W
K n ConductionParameter
2 L
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Non-ideal voltage current characteristics
2. Body effect
3.Sub-threshold conduction
4. Breakdown effects
5.Temperature effects.
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Non-ideal voltage current characteristics
1. Finite output resistance ( in Saturation Region):
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Non-ideal voltage current characteristics
1. Finite output resistance ( in Saturation Region):
1 V
ro [I DQ ] 1 A .................(2)
I DQ I DQ
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2. Body Effect
When two transistors are conducting, None zero drain-to- source voltage on M1
Source M2 is not at same potential as the substrate
These bias condition means that a reverse – bias voltage exits across source –
Substrate PN junction
Change in Source –Substrate junction voltage that change in Threshold voltage
This is called the body effect.
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3. Subthreshold Condition
iD K n Vgs VTN
2
id Kn (VGS VTN )
id Is linear function of VGS
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4. Break down Effects
Drain to Substrate PN junction may break down if applied voltage is
too High.( Avalanche Breakdown)
Punch Through Effect – When drain voltage is large enough for the
depletion region.
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5. Temperature Effects
VTN and KN are function of temperature
As temp. increase the charge carrier starts vibrating which reduces their mobility.
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Common source circuit, Voltage divider
biasing
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Common MOSFET configurations: DC
Analysis
Vgs is the voltage that falls across the gate and
the source of the mosfet transistor. It is crucial
to calculate because in order to solve for Ids,
the current from the drain to the source,Vgs
must be known.
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Kn and Vtn are normally givens that you just plug into the
equation.
Once you solve for Ids, you will get two currents from solving that
quadratic equation. The current that produces a Vgs which is
greater than Vtn is the real current of the circuit and the other
should be eliminated.
Now we calculate Vds and the Q-point:
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