Академический Документы
Профессиональный Документы
Культура Документы
Agenda
Definition and brief history of spin coating Uses of spin coating technology Common spin coating defects Basic physics behind spin coating The Spinning Disk Problem
A process in which solution is spread evenly over a surface using centripetal force. Spin coating will result in a relatively uniform thin film of a specific thickness. Spin coating is an important way of creating thin films in the microelectronics industry.
Spin coating was first used to apply coatings of paint and pitch around seventy years ago. In 1958 Emslie et. al. developed the first spin coating model. This model has been used as a basis for future more specific or complicated models.
Wafer Basin Vacuum Chuck
Wafer is held to chuck with vacuum pump. Lid is placed over spinning basin before spin is initiated.
Photoresist for patterning wafers in microcircuit production. Insulating layers for microcircuit fabrication such as polymers. Flat screen display coatings. Antireflection coatings and conductive oxide. DVD and CD ROM Television tube antireflection coatings.
Bubbles on the surface of the coated wafer. This occurs when fluid is deposited A swirling pattern may be observed. Causes: Fluid deposited off center Acceleration too high Spin time to short Exhaust rate too high
http://www.cise.columbia.edu/clean/process/spintheory.pdf
A mark or circle in the center of the wafer could indicate a chuck mark. If a chuck mark occurs the type of
chuck should be changed.
Streaks can occur on the wafer for a number of reasons including: Acceleration too high Fluid deposited off center Particles on surface prior to spin
http://www.cise.columbia.edu/clean/process/spintheory.pdf
Uncoated areas on wafer occur Pinhole defects can be caused by: Air bubbles Particles in fluid Particles on substrate.
http://www.cise.columbia.edu/clean/process/spintheory.pdf
Agenda
Definition and brief history of spin coating Uses of spin coating technology Common spin coating defects Basic physics behind spin coating Derivations of common spin coating models
http://www.mse.arizona.edu/faculty/birnie/Coatings/
Step 3: The coating thins at a rate that depends on the velocity at which the wafer is spinning and the viscosity of the fluid. Step 4: Solvent is evaporated from the film, resulting in further thinning.
http://www.mse.arizona.edu/faculty/birnie/Coatings/
Problem:
Consider unsteady behavior of liquid film thickness under centripetal force. Develop relationship between film thickness and time.
Goal:
Assumptions
Axisymmetric flow of fluid across the wafer Laminar flow of the thinning film Film thickness decreases slowly with time Angular velocity of fluid is equivalent to the angular velocity of the disk Film is thin and has uniform thickness over the wafer Newtonian and incompressible fluid Liquid is not volatile
xuU !0 xU
1 x (ru r ) xu z 1 x (ru r ) 0! } r xr xz r xr
Momentum Equation:
uU2 xu r xp x 2u r Vur V ! Q 2 xr xr xz r
Vr[ 2
xu r x 2u r Vu r V r[ 2 ! Q 2 xr xz
Middleman, Introduction to Fluid Dynamics
Boundary Conditions:
x ur Vr[ ! Q 2 xz
2 2
du r ! 0 at z ! h(r ) dz ur ! 0 at z ! 0
Middleman, Introduction to Fluid Dynamics
Q ! 2Tr
HR
dH ur ( z , R)dz ! TR dt
2
1 1 4 V[ 2 2 ! t H2 H0 3Q H (t ) 4 V[ H @ ! 1 t H0 3Q
2 2 0 1 2
Model Limitations
This model is limited by the assumptions used to derive equations so it only applies to:
H (t ) 4 V[ H ! 1 @ t H0 3Q
2 2 0
1
When developing a model for non-Newtonian flow it must be considered that the viscosity changes with shear force.
Agenda
Definition and brief history of spin coating Uses of spin coating technology Common spin coating defects Basic physics behind spin coating Derivations of common spin coating models
Model flow of spin coated Newtonian fluid using FEMLab, a finite element modeling program. Extend the FEMLab model to flow of non-Newtonian and viscoelastic fluids on spin coated wafer. Verify experimentally that the model is valid by spin coating fluids with relevant properties on 6 in silicon wafers and comparing the resultant film thickness with the predicted film thickness.
References
Lawrence, C.J, Zhou, W. Spin coating of non-Newtonian Fluids. Journal of Non-Newtonian Fluid Mechanics, 39 (1991) 137-187 Middleman, S. An Introduction To Fluid Dynamics. John Wiley and Sons. New York. 1998 http://www.cise.columbia.edu/clean/process/spintheory.pdf http://www.mse.arizona.edu/faculty/birnie/Coatings
Questions?